公开(公告)号：US20200177934A1

公开(公告)日：2020-06-04

申请号：US16780356

申请日：2020-02-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Han-jin PARK ,  Su-min KIM ,  Seock-young Shim ,  Ji-eun Lee ,  Sung-min Lim

IPC: H04N21/2343 ,  H04N21/41 ,  H04N21/81 ,  H04N21/431 ,  H04N21/422 ,  H04N21/462 ,  H04L12/26 ,  G06F1/16

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

公开(公告)号：US20180146224A1

公开(公告)日：2018-05-24

申请号：US15813837

申请日：2017-11-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Han-jin PARK ,  Su-min KIM ,  Seock-young SHIM ,  Ji-eun LEE ,  Sung-min LIM

IPC: H04N21/2343 ,  G06F1/16 ,  H04L12/26 ,  H04N21/431 ,  H04N21/462

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

公开(公告)号：US20160233083A1

公开(公告)日：2016-08-11

申请号：US15016309

申请日：2016-02-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Su-min KIM ,  Hyun-woo KIM ,  Hyo-jin YUN ,  Kyoung-seon KIM ,  Hai-sub NA ,  Su-min PARK ,  So-ra HAN

IPC: H01L21/027

CPC classification number: H01L21/0276 ,  G03F7/091 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02326 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/28273 ,  H01L21/31058 ,  H01L21/31144 ,  H01L21/32139

Abstract: A method of manufacturing a semiconductor device, including forming an etching target film on a substrate; forming an anti-reflection film on the etching target film; forming a photoresist film on the anti-reflection film; exposing the photoresist film; performing heat treatment on the anti-reflection film and the photoresist film to form a covalent bond between the anti-reflection film and the photoresist film; and developing the photoresist film.

Abstract translation: 一种制造半导体器件的方法，包括在衬底上形成蚀刻靶膜; 在蚀刻靶膜上形成抗反射膜; 在抗反射膜上形成光致抗蚀剂膜; 曝光光刻胶膜; 对抗反射膜和光致抗蚀剂膜进行热处理，以在防反射膜和光致抗蚀剂膜之间形成共价键; 并显影光致抗蚀剂膜。