公开(公告)号：US20230415191A1

公开(公告)日：2023-12-28

申请号：US18097408

申请日：2023-01-16

Applicant: SEMES CO., LTD.

Inventor： JUN YOUNG CHOI ,  GUI SU PARK ,  YOUNG HUN LEE ,  YOUNG JIN JANG ,  JUN HYUN LIM

IPC: B05C3/10 ,  B08B3/04 ,  B08B3/10 ,  B08B3/08

CPC classification number: B05C3/10 ,  B08B3/041 ,  B08B3/10 ,  B08B3/08

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a batch-type treating bath for treating a substrate in a batch-type manner; a single-type treating chamber for treating the substrate in a single-type manner; and a buffer chamber positioned on a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and supplying a liquid for maintaining a wetting state of the substrate.

公开(公告)号：US20190189471A1

公开(公告)日：2019-06-20

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： BUYOUNG JUNG ,  JONGHAN KIM ,  YOUNG JIN JANG ,  JIN TACK YU ,  YOUNGJUN CHOI ,  DAEHUN KIM ,  BYUNGSUN BANG ,  JONGHYEON WOO ,  HEEHWAN KIM ,  CHEOL-YONG SHIN ,  GUI SU PARK

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.