公开(公告)号：US20230068426A1

公开(公告)日：2023-03-02

申请号：US17879012

申请日：2022-08-02

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa LEE ,  Dai Geon Yoon ,  Soo Hong Lee ,  Ji Hyeon Kim ,  Dae Sung Kim

IPC: H01L21/67 ,  B41J2/16

Abstract: A unit for supplying a substrate-treating liquid is provided with a first reservoir and a second reservoir between which a differential pressure is constantly maintained to establish a flow rate, along with a substrate-treating apparatus having the unit for supplying the substrate-treating liquid. The unit for supplying the substrate-treating liquid includes a supply reservoir module and a buffer reservoir module. The supply reservoir module includes a first reservoir for supplying the substrate-treating liquid to an inkjet head unit for jetting the substrate-treating liquid onto a substrate, and a second reservoir for recovering the substrate-treating liquid that remains unused in the inkjet head unit. The buffer reservoir module is configured to provide the substrate-treating liquid to the first reservoir. Differential pressure is constantly maintained between the first reservoir and the second reservoir.

公开(公告)号：US12119241B2

公开(公告)日：2024-10-15

申请号：US17879012

申请日：2022-08-02

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa Lee ,  Dai Geon Yoon ,  Soo Hong Lee ,  Ji Hyeon Kim ,  Dae Sung Kim

IPC: B41J2/165 ,  H01L21/67

CPC classification number: H01L21/67051 ,  B41J2/16517 ,  H01L21/67253

Abstract: A unit for supplying a substrate-treating liquid is provided with a first reservoir and a second reservoir between which a differential pressure is constantly maintained to establish a flow rate, along with a substrate-treating apparatus having the unit for supplying the substrate-treating liquid. The unit for supplying the substrate-treating liquid includes a supply reservoir module and a buffer reservoir module. The supply reservoir module includes a first reservoir for supplying the substrate-treating liquid to an inkjet head unit for jetting the substrate-treating liquid onto a substrate, and a second reservoir for recovering the substrate-treating liquid that remains unused in the inkjet head unit. The buffer reservoir module is configured to provide the substrate-treating liquid to the first reservoir. Differential pressure is constantly maintained between the first reservoir and the second reservoir.

公开(公告)号：US20240217243A1

公开(公告)日：2024-07-04

申请号：US18302323

申请日：2023-04-18

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa LEE ,  Dai Geon Yoon ,  Soo Hong Lee ,  Bong Man Choi ,  Dae Sung Kim

IPC: B41J2/175 ,  B41J29/393

CPC classification number: B41J2/17596 ,  B41J29/393

Abstract: An ink treatment apparatus and method are provided. The ink treatment apparatus includes: a reservoir storing ink; a head module ejecting the ink; a first control valve controlling a flow of the ink; a plurality of fluid transfer lines installed between the reservoir and the head module and having the ink flow therein; a pump installed in the fluid transfer lines to pump the ink; a flow rate measurement module installed in the fluid transfer line, the flow rate measurement module measuring a flow rate of the ink in accordance with the flow of the ink and providing ink flow rate information that is information regarding the flow rate of the ink; and a control module controlling a circulation ratio of the ink between the fluid transfer lines by controlling the pump and the first control valve based on the ink flow rate information.

公开(公告)号：US12269273B2

公开(公告)日：2025-04-08

申请号：US17851029

申请日：2022-06-28

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa Lee ,  Dai Geon Yoon ,  Soo Hong Lee ,  Ji Hyeon Kim ,  Dae Sung Kim

IPC: B41J2/175

Abstract: Provided are a substrate treating liquid supply unit for constantly maintaining a liquid level of a nozzle of an inkjet head unit through real-time water level measurement, and a substrate treating apparatus including the same. The substrate treating liquid supply unit includes: a first reservoir connected to an inkjet head unit for jetting a substrate treating liquid onto a substrate and providing the substrate treating liquid to the inkjet head unit; a water level sensor measuring a water level of the substrate treating liquid stored in the first reservoir; and a pressure control module compensating for a pressure provided to the first reservoir based on an amount variation in the water level of the substrate treating liquid, wherein a liquid level of a nozzle of the inkjet head unit is constantly maintained.

公开(公告)号：US20230031300A1

公开(公告)日：2023-02-02

申请号：US17851029

申请日：2022-06-28

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa Lee ,  Dai Geon Yoon ,  Soo Hong Lee ,  Ji Hyeon Kim ,  Dae Sung Kim

IPC: B41J2/175

Abstract: Provided are a substrate treating liquid supply unit for constantly maintaining a liquid level of a nozzle of an inkjet head unit through real-time water level measurement, and a substrate treating apparatus including the same. The substrate treating liquid supply unit includes: a first reservoir connected to an inkjet head unit for jetting a substrate treating liquid onto a substrate and providing the substrate treating liquid to the inkjet head unit; a water level sensor measuring a water level of the substrate treating liquid stored in the first reservoir; and a pressure control module compensating for a pressure provided to the first reservoir based on an amount variation in the water level of the substrate treating liquid, wherein a liquid level of a nozzle of the inkjet head unit is constantly maintained.