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公开(公告)号:US11915905B2
公开(公告)日:2024-02-27
申请号:US16918299
申请日:2020-07-01
Applicant: SEMES CO., LTD.
Inventor: Hyoungkyu Son , Yu Dong Han , Hyeon Gyu Kim , Seon Ok Kim
IPC: H01J37/32 , H01L21/683 , H01J37/20
CPC classification number: H01J37/20 , H01J37/32082 , H01J37/32532 , H01J37/32715 , H01L21/683 , H01J2237/334
Abstract: A support unit provided in an apparatus for treating a substrate using plasma includes a dielectric plate on which the substrate is placed, an electrode plate disposed under the dielectric plate, a power supply rod that applies power to the electrode plate, and a flange that has a shape surrounding the power supply rod and that is spaced apart from the power supply rod.
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公开(公告)号:US20210005424A1
公开(公告)日:2021-01-07
申请号:US16914860
申请日:2020-06-29
Applicant: SEMES CO., LTD.
Inventor: Hyoungkyu Son , Hyeon Gyu Kim , Seon Ok Kim , Yu Dong Han
IPC: H01J37/32 , B05B1/18 , B05B1/24 , H01L21/67 , H01L21/683
Abstract: Provided is a shower head unit for control temperature for each area using a planar heating element and a substrate treating system having the same. The substrate treating system includes a housing, a shower head unit installed on an inner upper side of the housing and for entering a process gas for etching a substrate into the housing, and an electrostatic chuck installed on an inner lower side of the housing and for seating the substrate, wherein the shower head unit is installed as a planar heating element in a plurality of areas to control temperature for each area.
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