公开(公告)号：US09964358B2

公开(公告)日：2018-05-08

申请号：US15141946

申请日：2016-04-29

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Jun Matsushita ,  Takashi Miyamoto ,  Konosuke Hayashi ,  Osamu Yamazaki

IPC: F26B3/30 ,  H01L21/67

CPC classification number: F26B3/30 ,  F26B5/08 ,  H01L21/67115

Abstract: The substrate processing unit 1 comprises the rotating table 31 configured to hold substrate W, the processing chamber 37 which accommodates the rotating table 31, a lamp 61 is provided above the processing chamber 37 and configured to heat the surface of substrate W, the lamp chamber 60 which accommodates that lamp 61, a transmission window 62 disposed below the lamp chamber 60, and a plurality of nozzle 64 which supply cooling fluid G to the transmission window 62. Then the substrate processing unit 1 can suppress generating of a water mark or pattern collapse, and can perform good substrate processing.

公开(公告)号：US20180284603A1

公开(公告)日：2018-10-04

申请号：US15941174

申请日：2018-03-30

Applicant: Shibaura Mechatronics Corporation

Inventor： Yoshinori Iino ,  Takashi Miyamoto

IPC: G03F1/80 ,  H01J37/32 ,  G03F1/26 ,  G03F1/76 ,  B23K10/00

Abstract: An outer mask used when manufacturing a photo mask by etching an object to be processed, the object having a surface on which a pattern portion is provided, the outer mask includes: a base portion exhibiting a plate shape and including an opening in a central region, and a frame portion exhibiting a frame shape and provided along a periphery of the base portion. The frame portion has a surface which contacts the surface of the object at four corners of the surface of the object.