公开(公告)号：US10731247B2

公开(公告)日：2020-08-04

申请号：US15683399

申请日：2017-08-22

Applicant: SILCOTEK CORP.

Inventor： David A. Smith ,  James B. Mattzela ,  Paul H. Silvis ,  Gary A. Barone

IPC: C23C16/32 ,  C23C16/56 ,  C23C8/10 ,  B05D1/00

Abstract: The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.

公开(公告)号：US11807777B2

公开(公告)日：2023-11-07

申请号：US16801230

申请日：2020-02-26

Applicant: SILCOTEK CORP.

Inventor： David A. Smith ,  James B. Mattzela ,  Paul H. Silvis ,  Gary A. Barone ,  Martin E. Higgins

IPC: B32B7/02 ,  C09D5/00 ,  C23C16/30 ,  C23C16/56 ,  C23C16/40 ,  C23C30/00 ,  C23C16/02 ,  C23C16/18

CPC classification number: C09D5/00 ,  C23C16/0272 ,  C23C16/18 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  C23C30/00 ,  Y10T428/265 ,  Y10T428/31612 ,  Y10T428/31663

Abstract: Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.

公开(公告)号：US10323321B1

公开(公告)日：2019-06-18

申请号：US14990889

申请日：2016-01-08

Applicant: SILCOTEK CORP.

Inventor： Min Yuan ,  Paul H. Silvis ,  James B. Mattzela

IPC: C23C16/24 ,  C23C16/44

Abstract: Thermal chemical vapor deposition processes and coated articles are disclosed. The coated article includes a surface having a surface impurity and a coating on the surface formed by thermally reacting a gas. In comparison to a comparable coating without the surface impurity, the coating on the surface has substantially the same level of adhesion, corrosion resistance over 24 hours in 6M HCl, corrosion resistance over 72 hours in NaClO, and electrochemical impedance spectroscopy results. Additionally or alternatively, the surface impurity has properties that reduce or eliminate adhesion of a comparative coating produced by decomposition of silane on a comparative surface following exposure of the surface to a temperature.

公开(公告)号：US11292924B2

公开(公告)日：2022-04-05

申请号：US14680669

申请日：2015-04-07

Applicant: SILCOTEK CORP.

Inventor： David A. Smith ,  Min Yuan ,  James B. Mattzela ,  Paul H. Silvis

IPC: C09D5/16 ,  C23C16/44 ,  C23C16/56 ,  C23C16/02 ,  C23C16/30

Abstract: A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features.

公开(公告)号：US09975143B2

公开(公告)日：2018-05-22

申请号：US14784731

申请日：2014-05-14

Applicant: SILCOTEK CORP.

Inventor： David A. Smith ,  Paul H. Silvis

IPC: B05D1/00 ,  B05D5/08 ,  C09D5/08

CPC classification number: B05D1/60 ,  B05D5/083 ,  C09D5/08

Abstract: Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

公开(公告)号：US09915001B2

公开(公告)日：2018-03-13

申请号：US14821949

申请日：2015-08-10

Applicant: SILCOTEK CORP.

Inventor： Min Yuan ,  David A. Smith ,  Paul H. Silvis ,  James B. Mattzela

IPC: C23C16/30 ,  C23C16/46 ,  C23C16/56 ,  C23C16/52 ,  C23C16/22

CPC classification number: C23C16/52 ,  C23C16/22 ,  C23C16/30 ,  C23C16/46 ,  C23C16/56

Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.