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公开(公告)号:US20210087070A1
公开(公告)日:2021-03-25
申请号:US16968668
申请日:2019-02-01
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroki NAKAYAMA , Hiroshi KOBAYASHI , Kenji FUKUDA
Abstract: A near-infrared absorbing material fine particle dispersion, a near-infrared absorber laminate, and a laminated structure for near-infrared absorption can exhibit higher near-infrared absorption property, compared to near-infrared fine particle dispersions, near-infrared absorber laminates, and laminated structures for near-infrared absorption, containing tungsten oxides or composite tungsten oxides according to the conventional art. Also, a near-infrared absorbing material fine particle dispersion in which composite tungsten oxide fine particles, each particle containing a hexagonal crystal structure, and a polymer compound with maleic anhydride introduced therein are contained in the polypropylene resin, and the near-infrared absorber laminate and the laminated structure for near-infrared absorption using the dispersion.
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公开(公告)号:US20210039011A1
公开(公告)日:2021-02-11
申请号:US16979607
申请日:2018-11-21
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hideki OHARA , Satoshi ASANO , Hiroshi KOBAYASHI , Masatoshi TAKANO , Shota SANJO
Abstract: Provided is a solvent extraction method that allows selectively separating magnesium from an acidic aqueous solution of sulfuric acid. The solvent extraction method includes: bringing an acidic aqueous solution of sulfuric acid containing nickel, cobalt, and magnesium in contact with an organic solvent to extract the magnesium into the organic solvent; and using the organic solvent produced by diluting an extractant made of alkylphosphonic acid ester with a diluent. A concentration of the extractant is set to 40 volume % or more and 60 volume % or less and a pH of the acidic aqueous solution of sulfuric acid is set to 1.5 or more and 2.0 or less, or the concentration of the extractant is set to 20 volume % or more and 50 volume % or less and the pH of the acidic aqueous solution of sulfuric acid is set to 2.0 or more and 2.5 or less.
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公开(公告)号:US20170100802A1
公开(公告)日:2017-04-13
申请号:US15128181
申请日:2015-03-24
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroshi KOBAYASHI , Hidetoshi YAMABE , Kyoko MIYAUCHI
Abstract: The present invention provides a coated solder material that is capable of preventing the advancement of oxidation of the surface during long-term storage and when melted, and that has excellent wetting extendability and bondability, without the occurrence of gaps in the bonded areas. A coating film is formed on the surface of a solder material; the coating film including a carbon compound that is formed by introducing an organic compound having a carbon number of 8 or less together with a carrier gas into a reaction gas that has been plasmatized under atmospheric pressure, and after a radicalized organic compound has been formed by radicalizing the organic compound, causing the radicalized organic compound to react with the metal on the surface of the solder material; the thickness of the coating film is 4 nm to 200 nm, and when heated at 150° C. to 300° C. and melted, the mass-reduction rate is 60% or greater.
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公开(公告)号:US20210230755A1
公开(公告)日:2021-07-29
申请号:US16965423
申请日:2019-04-19
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroto WATANABE , Itsumi MATSUOKA , Yusuke SENBA , Hiroshi KOBAYASHI
IPC: C25B1/22 , C25B1/50 , C25B13/02 , C25B9/00 , C25B15/08 , C25B15/02 , H01M4/525 , C01G53/10 , C01G51/10
Abstract: A method for manufacturing a sulfuric acid solution includes supplying a chloride ion-containing sulfuric acid solution as an initial electrolyte in an electrolyzer inside of which is divided into an anode chamber and a cathode chamber by a diaphragm; and subsequently taking out a metal dissolved electrolyte in which a metal constituting the anode is dissolved from the anode chamber while supplying a current to an anode and a cathode disposed in the electrolyzer.
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公开(公告)号:US20200270401A1
公开(公告)日:2020-08-27
申请号:US16616600
申请日:2018-05-17
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroshi KOBAYASHI , Kennichi FUJITA , Hirofumi TSUNEMATSU , Takeshi CHONAN
Abstract: A near-infrared shielding ultrafine particle dispersion body, and others, having excellent near-infrared shielding function, low haze value and excellent design, with suppressed change in color tone during outdoor use and blue haze phenomenon, using near-infrared shielding ultrafine particles transparent in visible light range, having excellent near-infrared shielding properties, and produced with high productivity, and a near-infrared shielding ultrafine particle dispersion body in which ultra-fine particles having near-infrared shielding properties are dispersed in solid medium, wherein the ultrafine particles are composite tungsten oxide ultrafine particles represented by general formula MxWyOz, and have XRD peak top intensity ratio value of 0.13 or more based on XRD peak intensity ratio value of 1 on plane of silicon powder standard sample, and solid medium contains resin binder and weather resistance improver, and weather resistance improver includes at least one selected from benzotriazole-based UV absorber, triazine-based UV absorber, and benzophenone-based UV absorber.
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6.
公开(公告)号:US20190040251A1
公开(公告)日:2019-02-07
申请号:US16073938
申请日:2016-10-27
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroshi KOBAYASHI , Kenichi FUJITA
Abstract: A polycarbonate resin composition capable of suppressing the deterioration of the weather resistance of the infrared shielding material fine particles, including: a composite tungsten oxide fine particle (A), a weather resistance improver (B), and a polycarbonate resin (C), wherein (A) is expressed by a general formula MxWOy, and (B) is any one of those containing a phosphite compound (B1), or containing the phosphite compound and one or more kinds selected from a hindered phenol-based stabilizer, phosphoric acid-based stabilizer and sulfur-based stabilizer (B2), or containing a hindered phenol-based stabilizer and one or more kinds selected from a phosphoric acid-based stabilizer and sulfur-based stabilizer (B3), and an addition amount of (B) is 0.1 parts by weight or more and 20 parts by weight or less, based on 1 parts by weight of (A), and provides a heat ray shielding molded body and a heat ray shielding lamination body produced using the composition.
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公开(公告)号:US20210070961A1
公开(公告)日:2021-03-11
申请号:US16968714
申请日:2019-02-01
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroki NAKAYAMA , Hiroshi KOBAYASHI , Kenji FUKUDA
IPC: C08K3/22 , C07F7/18 , C08K5/5419 , C01G41/02 , G02B5/20
Abstract: Provided are a near-infrared absorbing material fine particle dispersion, a near-infrared absorber, and a laminated structure for near-infrared absorption, which can exhibit higher near-infrared absorption property, compared to near-infrared fine particle dispersions, near-infrared absorber, and laminated structures for near-infrared absorption, containing tungsten oxides or composite tungsten oxides according to the conventional art. Also provided is a near-infrared absorbing material fine particle dispersion, wherein composite tungsten oxide fine particles, each particle containing a hexagonal crystal structure, and a silane compound are contained in an acrylic resin.
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公开(公告)号:US20210063621A1
公开(公告)日:2021-03-04
申请号:US16762266
申请日:2018-11-09
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Kenji FUKUDA , Hiroshi KOBAYASHI , Hiroki NAKAYAMA
Abstract: Provided is an infrared absorber object which comprises a resin medium and, disposed therein, agglomerates of composite tungsten oxide particles, wherein the agglomerates of composite tungsten oxide particles have one or more shapes selected from among strips, flakes, and rods.
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9.
公开(公告)号:US20190232618A1
公开(公告)日:2019-08-01
申请号:US16381381
申请日:2019-04-11
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Kenichi FUJITA , Hiroshi KOBAYASHI
IPC: B32B17/10
CPC classification number: B32B17/10633 , B32B17/10688 , B32B17/10761
Abstract: To provide a heat-ray shielding film mainly composed of polyvinyl acetal resin and a method for manufacturing the same capable of exhibiting excellent optical characteristics and high weather resistance by using composite tungsten oxide fine particles having a high heat-ray shielding effect, and a heat-ray shielding laminated transparent base material using the heat-ray shielding film, the heat-ray shielding film containing fine particles having a heat-ray shielding function, polyvinyl acetal resin, and a plasticizer, wherein the fine particles having the heat-ray shielding function is expressed by a general formula MyWOz (wherein N is one kind or more elements selected from a group consisting of Cs, Rb, K, Tl, In, Ba, Li, Sr, Fe, Sn, Al, and Cu, satisfying 0.1≤y≤0.5, 2.2≤z≤3.0), which are composite tungsten oxide fine particles having a hexagonal crystal structure, the heat-ray shielding film further containing metal carboxylate.
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公开(公告)号:US20170348807A1
公开(公告)日:2017-12-07
申请号:US15536330
申请日:2015-12-16
Applicant: SUMITOMO METAL MINING CO., LTD.
Inventor: Hiroshi KOBAYASHI , Hidetoshi YAMABE
IPC: B23K35/40 , C23C26/00 , B23K35/26 , B23K35/365
CPC classification number: B23K35/40 , B05D1/62 , B05D7/20 , B05D2202/00 , B05D2518/10 , B23K35/0227 , B23K35/262 , B23K35/268 , B23K35/365 , C22C11/00 , C22C11/06 , C22C13/00 , C23C26/00 , C23C2222/00 , H05K3/34
Abstract: Provided is a manufacturing method in which a coated solder wire having a dense polysiloxane coating film that is uniformly provided over the entire surface of the solder wire can be efficiently obtained in a single process. A coated solder wire is obtained by a manufacturing method that includes; a radicalization step for forming a radicalized organic silicon compound by mixing a reaction gas that has been plasmatized under atmospheric pressure and an organic silicon compound that is introduced by way of a carrier gas, and radicalizing that organic silicon compound; a reaction area formation step for forming a reaction area that is defined by a helical gas flow and in which the radicalized organic silicon compound is uniformly dispersed; and a coating step for forming a 4 nm to 200 nm thick polysiloxane coating film on the surface of a solder wire by transporting a solder wire inside the reaction area and causing the radicalized organic silicon compound to react with metal on the surface of that solder wire.
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