公开(公告)号：US11967585B2

公开(公告)日：2024-04-23

申请号：US17088427

申请日：2020-11-03

Applicant: Samsung Display Co., Ltd.

Inventor： Bum Soo Kam ,  Eui Kang Heo

IPC: H01L25/075 ,  H01L23/00 ,  H01L25/16 ,  H01L33/62

CPC classification number: H01L25/0753 ,  H01L24/24 ,  H01L25/167 ,  H01L33/62 ,  H01L2224/24011

Abstract: A display device includes a substrate, a first electrode, and a second electrode spaced from each other on the substrate, a first insulating layer on the first electrode, a first light emitting element between the first electrode and the second electrode, a second light emitting element on the first insulating layer and spaced from the first light emitting element, and a second insulating layer on the first insulating layer and covering at least a portion of the second light emitting element, wherein the first insulating layer includes at least one first opening penetrating the first insulating layer to expose a portion of the first electrode, the second insulating layer includes at least one second opening penetrating the second insulating layer to expose a portion of the first insulating layer, the at least one first opening and the at least one second opening do not overlap each other.

公开(公告)号：US10185174B2

公开(公告)日：2019-01-22

申请号：US15078426

申请日：2016-03-23

Applicant: Samsung Display Co., Ltd.

Inventor： Hoon Kang ,  Bum Soo Kam ,  Sung Won Doh ,  Chong Sup Chang

IPC: H01L21/00 ,  G02F1/1335 ,  H01L27/12

Abstract: A thin film transistor substrate, a display device including the same, and a method of manufacturing a thin film transistor substrate. The thin film transistor substrate includes: a base plate including a first area and a second area; a nano uneven pattern formed on one side of the base plate in the first area; a wire grid pattern formed on the ne side of the base plate in the second area; a gate electrode disposed on and overlapping the wire grid pattern; and one of a source electrode and a drain electrode disposed on the gate electrode and overlapping the wire grid pattern.

公开(公告)号：US09841676B2

公开(公告)日：2017-12-12

申请号：US15139037

申请日：2016-04-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hoon Kang ,  Bum Soo Kam ,  Se Yoon Oh ,  Chong Sup Chang

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/302 ,  H01L21/461 ,  G03F7/00 ,  G03F7/20 ,  G03F7/32 ,  H01L31/18 ,  H01L29/41 ,  H01L51/44 ,  C23F1/02 ,  H01L21/3213

CPC classification number: G03F7/0007 ,  C23F1/02 ,  G02F1/133512 ,  G02F1/13439 ,  G03F7/2002 ,  G03F7/32 ,  H01L21/32134 ,  H01L21/467 ,  H01L29/413 ,  H01L31/1884 ,  H01L31/1888 ,  H01L51/442

Abstract: A method for manufacturing a display device includes forming a plurality of light blocking patterns on a first surface of a transparent substrate, wherein a first light blocking pattern of the plurality of light blocking patterns has a different line width than a second light blocking pattern of the plurality of light blocking patterns. An insulating layer is formed on the first surface of the transparent substrate and the light blocking patterns. A conductive layer is formed on the insulating layer. A photo-resist layer is formed on the conductive layer. The photo-resist layer is exposed with ultraviolet rays through a second surface of the transparent substrate, wherein the first and second surfaces of the transparent substrate are opposite to each other. The photo-resist layer is developed. The conductive layer is etched using the photo-resist layer as a mask. The photo-resist layer is removed.

公开(公告)号：US20180095362A1

公开(公告)日：2018-04-05

申请号：US15831547

申请日：2017-12-05

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hoon Kang ,  Bum Soo Kam ,  Se Yoon Oh ,  Chong Sup Chang

IPC: G03F7/00 ,  H01L51/44 ,  H01L31/18 ,  H01L29/41 ,  H01L21/3213 ,  G02F1/1343 ,  C23F1/02 ,  G03F7/32 ,  G03F7/20 ,  G02F1/1335 ,  H01L21/467

Abstract: A method for manufacturing a display device includes forming a plurality of light blocking patterns on a first surface of a transparent substrate, wherein a first light blocking pattern of the plurality of light blocking patterns has a different line width than a second light blocking pattern of the plurality of light blocking patterns. An insulating layer is formed on the first surface of the transparent substrate and the light blocking patterns. A conductive layer is formed on the insulating layer. A photo-resist layer is formed on the conductive layer. The photo-resist layer is exposed with ultraviolet rays through a second surface of the transparent substrate, wherein the first and second surfaces of the transparent substrate are opposite to each other. The photo-resist layer is developed. The conductive layer is etched using the photo-resist layer as a mask. The photo-resist layer is removed.