Thermal treatment device for display apparatus and thermal treatment method using the same
    1.
    发明授权
    Thermal treatment device for display apparatus and thermal treatment method using the same 有权
    显示装置用热处理装置及使用其的热处理方法

    公开(公告)号:US09560696B2

    公开(公告)日:2017-01-31

    申请号:US14534432

    申请日:2014-11-06

    CPC classification number: H05B3/0047 H01L27/1262 H01L27/1266 H01L51/0013

    Abstract: A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.

    Abstract translation: 一种用于显示装置的热处理方法,包括在基板台上设置受主基板,在受主基板上设置包括转印层的图案掩模,将闪光束从多个闪光灯照射到图案掩模上,并将 转移层到受体底物。 多个闪光灯相对于受主基板对称设置,并且被配置为照射闪光束。

    Thin film transistor substrates, display devices and methods of manufacturing display devices
    2.
    发明授权
    Thin film transistor substrates, display devices and methods of manufacturing display devices 有权
    薄膜晶体管基板,显示装置和制造显示装置的方法

    公开(公告)号:US09245937B2

    公开(公告)日:2016-01-26

    申请号:US14461669

    申请日:2014-08-18

    Inventor: Jae-Sik Kim

    Abstract: A thin film transistor substrate may include a gate electrode on a base substrate, a gate insulation layer covering the gate electrode on the base substrate, an active pattern on the gate insulation layer, an etch-stop layer pattern partially exposing the active pattern, a source electrode and a drain electrode in contact with a portion of the exposed active pattern, and an inorganic barrier layer on the source electrode, the drain electrode, and the etch-stop layer pattern. The active pattern may be superimposed over the gate electrode. The source electrode and the drain electrode may be superimposed over both ends of the gate electrode. The inorganic barrier layer may be in contact with a remaining portion of the exposed active pattern.

    Abstract translation: 薄膜晶体管衬底可以包括在基底衬底上的栅电极,覆盖基底衬底上的栅电极的栅极绝缘层,栅绝缘层上的有源图案,部分地暴露活性图案的蚀刻停止层图案, 源极电极和漏极电极,其与所述暴露的有源图案的一部分接触,以及在所述源电极,所述漏电极和所述蚀刻停止层图案上的无机阻挡层。 有源图案可以叠加在栅电极上。 源电极和漏电极可以叠加在栅电极的两端。 无机阻挡层可以与暴露的活性图案的剩余部分接触。

    THERMAL TREATMENT DEVICE FOR DISPLAY APPARATUS AND THERMAL TREATMENT METHOD USING THE SAME
    3.
    发明申请
    THERMAL TREATMENT DEVICE FOR DISPLAY APPARATUS AND THERMAL TREATMENT METHOD USING THE SAME 有权
    用于显示装置的热处理装置和使用其的热处理方法

    公开(公告)号:US20150372259A1

    公开(公告)日:2015-12-24

    申请号:US14534432

    申请日:2014-11-06

    CPC classification number: H05B3/0047 H01L27/1262 H01L27/1266 H01L51/0013

    Abstract: A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.

    Abstract translation: 一种用于显示装置的热处理方法,包括在基板台上设置受主基板,在受主基板上设置包括转印层的图案掩模,将闪光束从多个闪光灯照射到图案掩模上,并将 转移层到受体底物。 多个闪光灯相对于受主基板对称设置,并且被配置为照射闪光束。

Patent Agency Ranking