公开(公告)号：US20220120662A1

公开(公告)日：2022-04-21

申请号：US17215185

申请日：2021-03-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sangwoo BAE ,  Boris AFINOGENOV ,  Maksim RIABKO ,  Anton MEDVEDEV ,  Aleksandr SHOROKHOV ,  Anton SOFRONOV ,  Ingi KIM ,  Jungwook KIM ,  Youngjoo LEE ,  Kyunghun HAN

IPC: G01N15/14

Abstract: A particle inspection method includes irradiating a spatially modulated modulation beam onto a surface of a substrate and detecting an absorption light signal from a reflection beam generated through reflection of the spatially modulated modulation beam by the substrate.

公开(公告)号：US20200088649A1

公开(公告)日：2020-03-19

申请号：US16364251

申请日：2019-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-Hee JEANG ,  Aleksandr SHOROKHOV ,  Anton MEDVEDEV ,  Maksim RIABKO ,  Sang-Woo BAE ,  Akinori OKUBO ,  Sang-Min LEE ,  Seong-Keun CHO ,  Won-Don JOO

IPC: G01N21/88 ,  G01N21/21

Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.