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公开(公告)号：US20190134974A1
公开(公告)日：2019-05-09
申请号：US15982146
申请日：2018-05-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ho YU , Dong Wook KIM , Byeong Sang KIM , Kyung Bin PARK , Ki Ju SOHN , Ju Hyun LEE
Abstract: An ultraviolet curing apparatus includes a housing, a plurality of ultraviolet light emitting diodes (LEDs) arranged in a length direction of the housing, and at least one shutter part coupled to the housing to be movable in the length direction, to cover at least a portion of the plurality of ultraviolet LEDs to limit an irradiation region of ultraviolet light emitted by the plurality of ultraviolet LEDs.
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公开(公告)号：US20190131164A1
公开(公告)日：2019-05-02
申请号：US15996848
申请日：2018-06-04
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Byeong Sang KIM , Ki Ju SOHN , Ju Hyun LEE , Dong Wook KIM , Kyung Bin PARK , Woo Sub SHIM , Jung Wook KIM , Ho YU , Myoung Soo CHOI , Eun Soo HWANG
IPC: H01L21/687 , H01J37/32 , H01L21/67
Abstract: A substrate processing apparatus includes an exhaust unit including a lower surface in which an outlet is formed and four side walls extended from the lower surface, the exhaust unit having exhaust wings protruding from two opposing side walls, a shower head located in the exhaust unit and having distribution holes, and an adjuster disposed on each of side walls of the exhaust unit between the exhaust wings.
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3.发明公开公开(公告)号：US20230185207A1
公开(公告)日：2023-06-15
申请号：US18164835
申请日：2023-02-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
CPC classification number: G03F7/70916 , G03F7/70033 , H05G2/008 , G21K1/06 , H05G2/005 , G03F7/70891
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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4.发明申请公开(公告)号：US20210059035A1
公开(公告)日：2021-02-25
申请号：US16835708
申请日：2020-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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Patent Agency Ranking
公开(公告)号：US20190099938A1
公开(公告)日：2019-04-04
申请号：US15946790
申请日：2018-04-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ho YU , Byeong Sang KIM , Jung Wook KIM , Kyung Bin PARK , Ki Ju SOHN , Eun Soo HWANG
Abstract: An imprinting apparatus includes a first frame, a pressure roller rotatably supported on a first end of the first frame, a second frame including a support portion coupled to a second end of the first frame, and at least one guide portion coupled to the support portion to be laterally movable, and at least one load roller supported by the at least one guide portion, the at least one load roller being movable in a vertical direction while being rotatable and contacting a surface of the pressure roller on an upper portion of the pressure roller according to a lateral movement of the guide portion, the at least one load roller to press the pressure roller by force exerted by a load of the at least one load roller.
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公开(公告)号：US20190086794A1
公开(公告)日：2019-03-21
申请号：US15942795
申请日：2018-04-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ho YU , Myoung-soo CHOI , Dong-wook KIM , Jung-wook KIM , Ki-ju SOHN , Sung-kyu LEE , Eun-soo HWANG
Abstract: An imprint apparatus including a stage supporting a stamp master on which a master pattern for forming a stamping pattern on a flexible substrate is formed, or a substrate on which a pattern corresponding to the stamping pattern is formed by contact with the stamping pattern; a roll-to-roll mover to move the flexible substrate along a path adjacent to the stage; a clamp including a front clamp that secures a first portion of the flexible substrate, and a rear clamp that secures a second portion of the flexible substrate spaced apart from the first portion; a pressure roller to press the flexible substrate so that the flexible substrate secured by the clamp is brought into contact with the substrate or the stamp master; and a clamp driving controller to drive the clamp to adjust tension between the first portion and the second portion.
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7.发明申请公开(公告)号：US20220113642A1
公开(公告)日：2022-04-14
申请号：US17555985
申请日：2021-12-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup KIM , Ho YU , Jeonggil KIM , Minseok CHOI
Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
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公开(公告)号：US20210153333A1
公开(公告)日：2021-05-20
申请号：US17158380
申请日：2021-01-26
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ho YU , Chae-mook LIM , Sung-ho JANG , Min-seok CHOI
Abstract: An extreme ultraviolet (EUV) light concentrating apparatus including a main body having a concave inner portion and configured to rotate, a tin generator configured to generate tin drops and spray the tin drops, a tin catcher configured to process the sprayed tin drops, a protective cover configured to block the tin drops from falling into the main body, and a rotation guide configured to rotate the main body may be provided.
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9.发明申请公开(公告)号：US20190049837A1
公开(公告)日：2019-02-14
申请号：US15869976
申请日：2018-01-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dong-wook KIM , Ju-hyun LEE , Byeong-sang KIM , Kyung-bin PARK , Ki-ju SOHN , Ho YU
IPC: G03F7/00
Abstract: A film frame, a system for manufacturing a display substrate, and a method of manufacturing a display substrate, the film frame including a pair of frame edges extending lengthwise in a first direction and arranged opposite to each other; a fixed end clamp connected to the pair of frame edges and extending lengthwise in a second direction perpendicular to the first direction; and a free end clamp between the pair of frame edges, the free end clamp extending lengthwise in the second direction and configured to be detachably coupled with the pair of frame edges, wherein the fixed end clamp includes a first magnetic fixer extending lengthwise in the second direction and a second magnetic fixer on the first magnetic fixer, and the free end clamp includes a third magnetic fixer extending lengthwise in the second direction and a fourth magnetic fixer on the third magnetic fixer.
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