公开(公告)号：US20140254838A1

公开(公告)日：2014-09-11

申请号：US14196113

申请日：2014-03-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Hyun LEE

IPC: H04R3/00

CPC classification number: H04R3/00 ,  H04R3/007 ,  H04R2400/01 ,  H04R2420/01 ,  H04R2499/11

Abstract: An apparatus for controlling an audio output in a terminal includes: a speaker; an audio processor which demodulates an audio signal via a first path and a second path having different impedances from each other, the audio processor selectively transmits the demodulated audio signal to the speaker via one of the first path and the second path; and a controller which determines an audio output mode and controls a path selection of the audio processor according to the determined audio output mode.

Abstract translation: 用于控制终端中的音频输出的装置包括：扬声器; 音频处理器经由第一路径和具有彼此不同阻抗的第二路径对音频信号进行解调，音频处理器经由第一路径和第二路径之一选择性地将解调的音频信号发送到扬声器; 以及控制器，其根据确定的音频输出模式确定音频输出模式并控制音频处理器的路径选择。

公开(公告)号：US20190330741A1

公开(公告)日：2019-10-31

申请号：US16212036

申请日：2018-12-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Hyun LEE ,  Young-Kwon KIM ,  Woo-Jae KIM ,  Seung-Min RYU ,  Ji-Ho UH

IPC: C23C16/52 ,  C23C16/455 ,  H01L21/67 ,  H01L21/673 ,  C23C16/02

Abstract: A gas injector includes first and second gas introduction passages extending in a first direction toward a central axis of a process chamber respectively, a first bypass passage extending from the first gas introduction passage in a second direction that is substantially perpendicular to the first direction, a second bypass passage extending from the second gas introduction passage in a reverse direction to the second direction, a first distribution passage isolated from the first bypass passage in the first direction and extending from an outlet of the first bypass passage in the reverse direction to the second direction, a second distribution passage isolated from the second bypass passage in the first direction and extending from an outlet of the second bypass passage in the second direction, and a plurality of spray holes in an outer surface of the first and second distribution passages and configured to spray the process gas.

公开(公告)号：US20170162434A1

公开(公告)日：2017-06-08

申请号：US15250199

申请日：2016-08-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： In-Wook OH ,  Jong-Hyun LEE ,  Sung-Wook HWANG

IPC: H01L21/768 ,  H01L21/66 ,  H01L21/033

CPC classification number: H01L21/76811 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/76813 ,  H01L21/76816 ,  H01L22/20 ,  H01L23/522 ,  H01L23/528

Abstract: A method of forming a mask layout includes forming a layout of a first mask including a lower wiring structure pattern and a dummy lower wiring structure pattern. A layout of a second mask overlapping the first mask and including an upper wiring structure pattern and a dummy upper wiring structure pattern is formed. A layout of a third mask including a first via structure pattern and a first dummy via structure pattern is formed. A layout of a fourth mask including a second via structure pattern and a second dummy via structure pattern is formed. The second via structure pattern may commonly overlap the lower wiring structure pattern and the upper wiring structure pattern, and the second dummy via structure pattern may commonly overlap the dummy lower wiring structure pattern and the dummy upper wiring structure pattern. The fourth mask may overlap the third mask.

公开(公告)号：US20160144392A1

公开(公告)日：2016-05-26

申请号：US14809548

申请日：2015-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Bo-Kyung JUNG ,  Kwang-Hyuk CHOI ,  Nam-Hoon LEE ,  Jong-Hyun LEE ,  Jin SHIN ,  Kyeong-Min YEO ,  Jong-Han OH

IPC: B05B15/04 ,  B05B12/00

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/50 ,  C23C14/54

Abstract: An apparatus for organic layer deposition is provided that can improve precision of a gap between a substrate and a mask by correcting a position of a mask stage having a mask mounted thereon based on a substrate shape, and that can reduce a measurement error of a mask surface by pre-measuring a position of a mask and determining an initial position of the mask based on the measured position. The apparatus includes a shape measuring sensor, a substrate carrier, a deposition material discharge source, a mask including a plurality of pattern slits, a camera measuring an alignment error between the substrate and the mask, a distance measuring sensor measuring an alignment error between the substrate and the mask, and a mask stage controlling a position of the mask.

Abstract translation: 提供一种有机层沉积装置，其可以通过基于衬底形状校正其上安装有掩模的掩模台的位置来提高基板和掩模之间的间隙的精度，并且可以减少掩模的测量误差 通过预先测量掩模的位置并基于所测量的位置确定掩模的初始位置。 该装置包括形状测量传感器，衬底载体，沉积材料放电源，包括多个图案狭缝的掩模，测量衬底和掩模之间的对准误差的照相机，测量在衬底和掩模之间的对准误差的距离测量传感器 衬底和掩模，以及控制掩模位置的掩模台。