公开(公告)号：US20150070690A1

公开(公告)日：2015-03-12

申请号：US14316173

申请日：2014-06-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Min-Ho Rim ,  Yu-Sin Yang ,  Sang-Kil Lee ,  Yong-Deok Jeong ,  Hyung-Suk Cho

IPC: G01N21/88

CPC classification number: G01N21/956 ,  G01N21/9501 ,  G01N2021/8835

Abstract: In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

Abstract translation: 在检测衬底的缺陷的方法中，具有第一强度的第一光可以通过第一孔照射到衬底的第一区域。 可以使用来自第一区域的第一反射光检测第一区域中的缺陷。 具有第二强度的第二光可以通过第二孔照射到衬底的第二区域。 可以使用来自第二区域的第二反射光检测第二区域中的缺陷。 因此，可以精确地检测由基板的区域的缺陷。

公开(公告)号：US10527556B2

公开(公告)日：2020-01-07

申请号：US15795592

申请日：2017-10-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Min-Ho Rim ,  Jung-Soo Kim ,  Young-Hoon Sohn ,  Yu-Sin Yang ,  Chung-Sam Jun ,  Yun-Jung Jee

IPC: G01N21/88 ,  H01L21/28 ,  G01N21/95 ,  G06T7/00 ,  H01L27/11556 ,  H01L21/66 ,  G02B27/09 ,  H01L27/11582 ,  G02B5/00

Abstract: An optical measuring method includes generating a Bessel beam, filtering the Bessel beam to generate a focused Bessel beam, vertically irradiating the focused Bessel beam onto a substrate in which an opening is formed, and detecting light reflected from the substrate to obtain an image of a bottom surface of the opening.

公开(公告)号：US09194816B2

公开(公告)日：2015-11-24

申请号：US14316173

申请日：2014-06-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Min-Ho Rim ,  Yu-Sin Yang ,  Sang-Kil Lee ,  Yong-Deok Jeong ,  Hyung-Suk Cho

IPC: G01N21/00 ,  G01N21/956 ,  G01N21/95 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01N21/9501 ,  G01N2021/8835

Abstract: In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

Abstract translation: 在检测衬底的缺陷的方法中，具有第一强度的第一光可以通过第一孔照射到衬底的第一区域。 可以使用来自第一区域的第一反射光检测第一区域中的缺陷。 具有第二强度的第二光可以通过第二孔照射到衬底的第二区域。 可以使用来自第二区域的第二反射光检测第二区域中的缺陷。 因此，可以精确地检测由基板的区域的缺陷。