中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

8 records (took 0.014 seconds)

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明公开
    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开

    公开(公告)号：US20230276611A1

    公开(公告)日：2023-08-31

    申请号：US18102897

    申请日：2023-01-30

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Sanggyo CHUNG ,  Chanmi LEE ,  Hayoung YI ,  Kwanghee CHEON ,  Seunghee HAN

    IPC: H10B12/00

    CPC classification number: H10B12/09 ,  H10B12/02 ,  H10B12/488

    Abstract: A method of manufacturing a semiconductor device includes forming a plurality of reference patterns and a peripheral pattern on a feature layer by using a first material such that the peripheral pattern is connected to end portions of the plurality of reference patterns; forming a plurality of first spacers on both sidewalls of each of the plurality of reference patterns by using a second material; removing the plurality of reference patterns; forming a plurality of second spacers on both sidewalls of each of the plurality of first spacers by using the first material; removing the plurality of first spacers so that the plurality of second spacers and the peripheral pattern remain on the feature layer; and patterning the feature layer by using the plurality of second spacers and the peripheral pattern as an etch mask.

    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    5.
    发明公开
    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开

    公开(公告)号：US20240297051A1

    公开(公告)日：2024-09-05

    申请号：US18407536

    申请日：2024-01-09

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Sanggyo CHUNG ,  Seunghee HAN ,  Seulgi LEE ,  Chanmi LEE

    IPC: H01L21/311 ,  H01L21/033

    CPC classification number: H01L21/31144 ,  H01L21/0332 ,  H01L21/31116

    Abstract: A method for manufacturing a semiconductor device includes stacking an etch target layer and an etching mask layer on a substrate having first through third regions, forming first photoresist patterns on the etching mask layer in the first and second regions and a second photoresist pattern to completely cover the third mask layer in the third region, etching the etching mask layer using the first and second photoresist patterns as etching masks to form first mask patterns on the first and second regions and a second mask pattern on the third region, forming a filling pattern in a first opening between first mask patterns on the second region, etching the etch target layer using the first and second mask patterns and the filling pattern as etching masks to form first patterns including second openings on the first region and a bulk pattern covering second and third regions of the substrate.

    METHOD AND APPARATUS FOR APPLYING RESOURCES IN HETEROGENEOUS NETWORK SYSTEM
    6.
    发明申请
    METHOD AND APPARATUS FOR APPLYING RESOURCES IN HETEROGENEOUS NETWORK SYSTEM 审中-公开
    在异构网络系统中应用资源的方法和装置

    公开(公告)号：US20160345338A1

    公开(公告)日：2016-11-24

    申请号：US15114596

    申请日：2015-01-28

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Eunyong KIM ,  Byungwook JUN ,  Jaewon KANG ,  Seungjoo MAENG ,  Seunghee HAN

    IPC: H04W72/08 ,  H04W68/00 ,  H04W72/04 ,  H04W74/08 ,  H04W28/02 ,  H04L1/18

    Abstract: The present invention relates to a method and an apparatus for applying wireless resources in order to control inter-cell interference in a heterogeneous network system. The method for applying wireless resources provided by the present invention generates an almost blank subframe (ABS) pattern on the basis of the type of data transmitted from at least one of a first base station and a second base station, applies a non-ABS or an ABS to wireless resources of the first base station according to the generated ABS pattern, and performs data communication by using the wireless resources to which the ABS has been applied.

    Abstract translation: 本发明涉及一种用于应用无线资源以便控制异构网络系统中的小区间干扰的方法和装置。 本发明提供的应用无线资源的方法基于从第一基站和第二基站中的至少一个发送的数据的类型生成几乎空白的子帧（ABS）模式，应用非ABS或 根据生成的ABS模式对第一基站的无线资源进行ABS，并且通过使用已经应用了ABS的无线资源来执行数据通信。

    METHOD AND APPARATUS FOR SELECTING CARRIER IN MOBILE COMMUNICATION SYSTEM
    7.
    发明申请
    METHOD AND APPARATUS FOR SELECTING CARRIER IN MOBILE COMMUNICATION SYSTEM 有权

    公开(公告)号：US20210282051A1

    公开(公告)日：2021-09-09

    申请号：US16489643

    申请日：2018-02-28

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Jaeyun KO ,  Seungjoo MAENG ,  Joseph JEON ,  Dongwook CHOI ,  Jungmin CHOI ,  Seunghee HAN

    IPC: H04W28/02 ,  H04W28/08

    Abstract: The present disclosure relates to a communication method and system for converging a 5th-Generation (5G) communication system for supporting higher data rates beyond a 4th-Generation (4G) system with a technology for Internet of Things (IoT). The present disclosure may be applied to intelligent services based on the 5G communication technology and the IoT-related technology, such as smart home, smart building, smart city, smart car, connected car, health care, digital education, smart retail, security and safety services. A method for controlling a terminal in a base station of a mobile communication system, according to an embodiment of the present application, comprises the steps of: selecting at least one candidate terminal for offloading; obtaining information on a neighbor cell of at least one of the candidate terminals; obtaining throughput improvement information according to offloading on the basis of information on the candidate terminal and load information of the neighbor cell of the candidate terminal; obtaining information on a target cell corresponding to the candidate terminal on the basis of the throughput improvement information; selecting a target terminal to be offloaded from the candidate terminals on the basis of the throughput improvement information corresponding to the target cell; and transmitting, to the target terminal, a message instructing offloading to the target cell corresponding to the target terminal.

Patent Agency Ranking