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1.
公开(公告)号:US20250142835A1
公开(公告)日:2025-05-01
申请号:US18927200
申请日:2024-10-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yunseong LEE , Sijung YOO , Seunggeol NAM , Kihong KIM , Yoonsang PARK , Sanghyun JO
Abstract: A semiconductor device, a memory device, and a method of manufacturing the semiconductor device are disclosed. The semiconductor device includes a semiconductor substrate, a ferroelectric layer provided on the semiconductor substrate, an aluminum oxide layer provided on the ferroelectric layer, and a gate electrode provided on the aluminum oxide layer, wherein the aluminum oxide layer includes aluminum, oxygen, and hydrogen, and wherein a content of oxygen in the aluminum oxide layer is more than about 1.5 times and about 2 times or less a content of aluminum in the aluminum oxide layer.
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公开(公告)号:US20240260274A1
公开(公告)日:2024-08-01
申请号:US18414933
申请日:2024-01-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dukhyun CHOE , Jinseong HEO , Hyunjae LEE , Seunggeol NAM , Yoonsang PARK , Sijung YOO
CPC classification number: H10B51/20 , H01L29/40111 , H01L29/516 , H01L29/78391 , H10B53/20
Abstract: Provided are a memory device implementing multi-bit functionality and a memory apparatus including the memory device. The memory device includes a semiconductor substrate, a gate electrode on the semiconductor substrate, and a plurality of ferroelectric layers laminated between the semiconductor substrate and the gate electrode in a first direction perpendicular to a surface of the semiconductor substrate and including at least one first ferroelectric layer and at least one second ferroelectric layer. The first ferroelectric layer has a doping concentration gradient in which a doping concentration increases in the first direction, and the second ferroelectric layer has a doping concentration gradient in which a doping concentration decreases in the first direction. The memory device is configured to implement multi-bit functionality according to an operating voltage.
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