公开(公告)号：US09597704B2

公开(公告)日：2017-03-21

申请号：US13779992

申请日：2013-02-28

Applicant: Semes Co., Ltd.

Inventor： Il Gyo Koo ,  Hyun Jong Shim

IPC: H01J37/32 ,  H01L21/67 ,  B05C11/00

CPC classification number: B05C11/00 ,  H01J37/32623 ,  H01J37/32633 ,  H01J37/32651 ,  H01L21/67126

Abstract: Provided is an apparatus for treating a substrate. The apparatus comprises a plasma boundary limiter unit disposed within a process chamber to surround a discharge space defined above a support unit. The plasma boundary limiter unit comprises a plurality of plates disposed along a circumference of the discharge space, and the plurality of plates are spaced apart from each other along the circumference of the discharge space so that a gas within the discharge space flows to the outside of the discharge space through passages provided between the adjacent plates.

公开(公告)号：US12278088B2

公开(公告)日：2025-04-15

申请号：US17092757

申请日：2020-11-09

Applicant: SEMES CO., LTD.

Inventor： Il Gyo Koo ,  Harutyun Melikyan ,  Hyo Seong Seong ,  Soojin Lee

IPC: H01L21/3065 ,  H01J37/32

Abstract: Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.