OXIDE SINTERED BODY, METHOD FOR PRODUCING SAME AND SPUTTERING TARGET

    公开(公告)号:US20190016638A1

    公开(公告)日:2019-01-17

    申请号:US16068596

    申请日:2016-12-28

    Abstract: An oxide sintered body is provided which does not splash from the target surface even at the time of high power film formation, has a high film formation rate, and is used in a sputtering target capable of providing a high-refractive-index film.An oxide sintered body is used which contains zinc, niobium, aluminum and oxygen as constituent elements and in which Nb/(Zn+Nb+Al)=0.076 to 0.289 and Al/(Zn+Nb+Al)=0.006 to 0.031, where Zn, Nb and Al denote contents of zinc, niobium and aluminum, respectively.

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