公开(公告)号：US20150177745A1

公开(公告)日：2015-06-25

申请号：US14203788

申请日：2014-03-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd

Inventor： Yung-Long CHEN ,  Chun-Feng HSU ,  Heng-Yi TSENG ,  Chieh-Jan HUANG ,  Chin-Hsing SU ,  Yung-Ching CHEN

IPC: G05D16/20 ,  H01L21/67

CPC classification number: G05D16/204 ,  H01L21/67017 ,  Y10T137/0379 ,  Y10T137/2567 ,  Y10T137/2569 ,  Y10T137/7761

Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.

Abstract translation: 气体供给系统包括填充有气体的气体容器，连接到气体容器的气体流量控制器以及与气体流量控制器电连接的操作装置。 气体供应系统还包括连接到气体流量控制器并被配置为经由气体流量控制器从气体容器接收气体的缓冲罐。 此外，压力传感器设置在缓冲罐上，并被配置为根据缓冲罐中的气体的压力向操作装置产生压力信号。 操作装置被配置为根据压力信号向气体流量控制器生成控制信号，并且气体流量控制器被配置为根据控制信号调节气体的流量，以将气体的压力保持在缓冲器 罐在预定的压力范围内。

公开(公告)号：US20150176153A1

公开(公告)日：2015-06-25

申请号：US14510488

申请日：2014-10-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yi-Chao CHANG ,  Pang-Ping LO ,  Yi-Chen WANG ,  Yung-Long CHEN ,  Chun-Feng HSU

IPC: C30B23/00 ,  C30B25/16 ,  C30B25/14

CPC classification number: C30B25/165 ,  C23C16/448 ,  C23C16/45561 ,  C30B25/14 ,  Y10T137/776 ,  Y10T137/7761

Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container via a first tube, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a pressure transducer installed on a second tube connected to the gas flow controller and configured to generate a pressure signal to the operation device according to the pressure of the gas in the second tube. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas in the second tube according to the control signal.

Abstract translation: 气体供给系统包括填充有气体的气体容器，经由第一管连接到气体容器的气体流量控制器，以及与气体流量控制器电连接的操作装置。 气体供给系统还包括安装在与气体流量控制器连接的第二管上的压力传感器，其构造成根据第二管中的气体的压力向操作装置产生压力信号。 操作装置被配置为根据压力信号向气体流量控制器产生控制信号，并且气体流量控制器被配置为根据控制信号调节第二管中的气体的流量。