公开(公告)号：US20160089765A1

公开(公告)日：2016-03-31

申请号：US14502917

申请日：2014-09-30

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： I-Chen CHIANG ,  Hwai-Te CHIU ,  Yi-Tsang CHEN ,  Chih-Chiang TSENG ,  Yung-Long CHEN

IPC: B24B57/04

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Abstract translation: 提供了浆料分散系统，包括浆料源系统，在线分析仪和控制器。 浆料源系统提供用于化学机械抛光（CMP）工艺的浆料。 在线分析仪测量从浆料分散系统取样的采样浆料的至少一个参数，并且基于参数产生指示信号，其中指示信号至少表示浆料的一个特征。 控制器接收指示信号，并根据指示信号产生一个控制信号，用于对泥浆分散系统进行实时控制，以控制浆料的质量。

公开(公告)号：US20240009803A1

公开(公告)日：2024-01-11

申请号：US18474165

申请日：2023-09-25

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： I-Chen CHIANG ,  Hwai-Te CHIU ,  Yi-Tsang CHEN ,  Chih-Chiang TSENG ,  Yung-Long CHEN

IPC: B24B57/04

CPC classification number: B24B57/04 ,  Y02P70/10

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least large particle count (LPC) value of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the LPC value, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

公开(公告)号：US20130019954A1

公开(公告)日：2013-01-24

申请号：US13628134

申请日：2012-09-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang TSENG ,  Yung-Long CHEN ,  Liang-Chieh HUANG ,  Yi-Wen HUANG

IPC: F17D1/00

CPC classification number: B24B37/04 ,  B24B57/02 ,  G01F11/28 ,  Y10T137/0318 ,  Y10T137/0324 ,  Y10T137/0363 ,  Y10T137/8593 ,  Y10T137/86131

Abstract: A slurry feed system suitable for chemical mechanical planarization (CMP) processes in a semiconductor fabrication facility and related method. The slurry feed system includes a valve manifold box having a discharge piping header fluidly connected to at least one CMP station and a first slurry supply train. The first slurry supply train may include a slurry mixing tank, day tank, and at least two slurry feed pumps arranged in series pumping relationship. The first slurry supply train defines a first slurry piping loop. In one embodiment, a second slurry supply train defining a second slurry piping loop is provided. The valve manifold box is operable to supply slurry from either or both of the first and second slurry piping loops to the CMP station.

Abstract translation: 一种适用于半导体制造设备中化学机械平面化（CMP）工艺的浆料进料系统及相关方法。 浆料进料系统包括具有流体连接到至少一个CMP站和第一浆料供应列的排放管道集管的阀歧管箱。 第一浆料供应系统可以包括浆料混合罐，日间罐和串联泵送关系中布置的至少两个浆料进料泵。 第一浆料供应列车定义了第一浆料管道回路。 在一个实施例中，提供了限定第二浆料管道回路的第二浆料供给列。 阀歧管箱可操作以从第一和第二浆料管道回路中的一个或两个供应浆料到CMP站。

公开(公告)号：US20150177745A1

公开(公告)日：2015-06-25

申请号：US14203788

申请日：2014-03-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd

Inventor： Yung-Long CHEN ,  Chun-Feng HSU ,  Heng-Yi TSENG ,  Chieh-Jan HUANG ,  Chin-Hsing SU ,  Yung-Ching CHEN

IPC: G05D16/20 ,  H01L21/67

CPC classification number: G05D16/204 ,  H01L21/67017 ,  Y10T137/0379 ,  Y10T137/2567 ,  Y10T137/2569 ,  Y10T137/7761

Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.

Abstract translation: 气体供给系统包括填充有气体的气体容器，连接到气体容器的气体流量控制器以及与气体流量控制器电连接的操作装置。 气体供应系统还包括连接到气体流量控制器并被配置为经由气体流量控制器从气体容器接收气体的缓冲罐。 此外，压力传感器设置在缓冲罐上，并被配置为根据缓冲罐中的气体的压力向操作装置产生压力信号。 操作装置被配置为根据压力信号向气体流量控制器生成控制信号，并且气体流量控制器被配置为根据控制信号调节气体的流量，以将气体的压力保持在缓冲器 罐在预定的压力范围内。

公开(公告)号：US20200298371A1

公开(公告)日：2020-09-24

申请号：US16894649

申请日：2020-06-05

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： I-Chen CHIANG ,  Hwai-Te CHIU ,  Yi-Tsang CHEN ,  Chih-Chiang TSENG ,  Yung-Long CHEN

IPC: B24B57/04

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

公开(公告)号：US20150176153A1

公开(公告)日：2015-06-25

申请号：US14510488

申请日：2014-10-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yi-Chao CHANG ,  Pang-Ping LO ,  Yi-Chen WANG ,  Yung-Long CHEN ,  Chun-Feng HSU

IPC: C30B23/00 ,  C30B25/16 ,  C30B25/14

CPC classification number: C30B25/165 ,  C23C16/448 ,  C23C16/45561 ,  C30B25/14 ,  Y10T137/776 ,  Y10T137/7761

Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container via a first tube, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a pressure transducer installed on a second tube connected to the gas flow controller and configured to generate a pressure signal to the operation device according to the pressure of the gas in the second tube. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas in the second tube according to the control signal.

Abstract translation: 气体供给系统包括填充有气体的气体容器，经由第一管连接到气体容器的气体流量控制器，以及与气体流量控制器电连接的操作装置。 气体供给系统还包括安装在与气体流量控制器连接的第二管上的压力传感器，其构造成根据第二管中的气体的压力向操作装置产生压力信号。 操作装置被配置为根据压力信号向气体流量控制器产生控制信号，并且气体流量控制器被配置为根据控制信号调节第二管中的气体的流量。