Method and apparatus for manufacturing electron source, and method manufacturing image forming apparatus
    1.
    发明授权
    Method and apparatus for manufacturing electron source, and method manufacturing image forming apparatus 失效
    用于制造电子源的方法和装置,以及制造图像形成装置的方法

    公开(公告)号:US06534924B1

    公开(公告)日:2003-03-18

    申请号:US09328804

    申请日:1999-06-09

    IPC分类号: G09G322

    摘要: This invention discloses an electron source manufacturing method including the step of applying a voltage to a plurality of conductive members by applying a potential to first portions of the plurality of conductive members serving as at least part of electron-emitting devices via a wiring commonly connected to the plurality of conductive members, and applying a potential to second portions of the plurality of conductive members, wherein the potential applied to the second portions of the plurality of conductive members is set to relax the difference in voltage applied to the plurality of conductive members owing to the difference between potentials at portions respectively connected to the first portions of the plurality of conductive members in the wiring commonly connected to the plurality of conductive members.

    摘要翻译: 本发明公开了一种电子源制造方法,该方法包括以下步骤:向多个导电构件施加电压,通过将多个导电构件的至少一部分电子发射器件的第一部分经由通常连接到 多个导电构件,并且对多个导电构件的第二部分施加电位,其中施加到多个导电构件的第二部分的电位被设定为松弛施加到多个导电构件的电压差, 分别连接到共同连接到多个导电构件的布线中的多个导电构件的第一部分的电位之间的差异。

    Characteristics adjustment method of image forming apparatus, manufacturing method of image forming apparatus and characteristics adjustment apparatus of image forming apparatus
    2.
    发明申请
    Characteristics adjustment method of image forming apparatus, manufacturing method of image forming apparatus and characteristics adjustment apparatus of image forming apparatus 失效
    图像形成装置的特征调整方法,图像形成装置的制造方法以及图像形成装置的特性调整装置

    公开(公告)号:US20050148272A1

    公开(公告)日:2005-07-07

    申请号:US11049996

    申请日:2005-02-04

    摘要: There is provided a characteristic adjustment method for an image forming apparatus that is provided with a multi-electron source in which a plurality of electron-emitting devices are electrically connected by wiring and arranged on a substrate and a fluorescent member for emitting light by irradiation of an electron beam, the method including: a measurement step of dividing a display portion of the image forming apparatus into a plurality of areas and measuring light emitting characteristics of at least one or more of the electron-emitting devices in the respective divided areas, and a shifting step of shifting the light emitting characteristics of the electron-emitting devices in the divided areas to individual characteristic target values by applying a characteristic shift voltage to the electron-emitting devices.

    摘要翻译: 提供了一种用于图像形成装置的特征调整方法,该图像形成装置具有多个电子发射装置通过布线电连接并布置在基板上的多电子源和用于通过照射发射光的荧光部件 电子束,所述方法包括:测量步骤,将所述图像形成装置的显示部分分割成多个区域并测量各个分割区域中的至少一个或多个电子发射器件的发光特性;以及 移位步骤,通过向电子发射器件施加特征移位电压,将划分区域中的电子发射器件的发光特性转移到各个特征目标值。

    Characteristics adjustment method of image forming apparatus, manufacturing method of image forming apparatus and characteristics adjustment apparatus of image forming apparatus
    3.
    发明授权
    Characteristics adjustment method of image forming apparatus, manufacturing method of image forming apparatus and characteristics adjustment apparatus of image forming apparatus 失效
    图像形成装置的特征调整方法,图像形成装置的制造方法以及图像形成装置的特性调整装置

    公开(公告)号:US07388561B2

    公开(公告)日:2008-06-17

    申请号:US11049996

    申请日:2005-02-04

    IPC分类号: G09G3/22

    摘要: There is provided a characteristic adjustment method for an image forming apparatus that is provided with a multi-electron source in which a plurality of electron-emitting devices are electrically connected by wiring and arranged on a substrate and a fluorescent member for emitting light by irradiation of an electron beam, the method including: a measurement step of dividing a display portion of the image forming apparatus into a plurality of areas and measuring light emitting characteristics of at least one or more of the electron-emitting devices in the respective divided areas, and a shifting step of shifting the light emitting characteristics of the electron-emitting devices in the divided areas to individual characteristic target values by applying a characteristic shift voltage to the electron-emitting devices.

    摘要翻译: 提供了一种用于图像形成装置的特征调整方法,该图像形成装置具有多个电子发射装置通过布线电连接并布置在基板上的多电子源和用于通过照射发射光的荧光部件 电子束,所述方法包括:测量步骤,将所述图像形成装置的显示部分分割成多个区域并测量各个分割区域中的至少一个或多个电子发射器件的发光特性;以及 移位步骤,通过向电子发射器件施加特征移位电压,将划分区域中的电子发射器件的发光特性转移到各个特征目标值。

    Substrate holding system and exposure apparatus having the same
    6.
    发明授权
    Substrate holding system and exposure apparatus having the same 失效
    基板保持系统和具有该基板保持系统的曝光装置

    公开(公告)号:US5586159A

    公开(公告)日:1996-12-17

    申请号:US411966

    申请日:1995-03-28

    CPC分类号: G03F7/707

    摘要: A substrate holding system includes a holding mechanism for holding a substrate through vacuum attraction, a vacuum evacuating device for supplying a vacuum to the holding mechanism, a first voltage source for supplying electric power to the vacuum evacuating device, a second voltage source, separate from the first voltage source, for supplying electric power to the vacuum evacuating device, and a controller for energizing the vacuum evacuating device at a higher evacuation capacity level, when the first voltage source is in operable order, and for energizing the vacuum evacuating device at a lower evacuation capacity level, when the second voltage source supplies electric power to the vacuum evacuating device, and the first voltage source is not in operable order.

    摘要翻译: 基板保持系统包括用于通过真空吸引保持基板的保持机构,用于向保持机构供给真空的真空抽气装置,用于向真空排气装置供给电力的第一电压源,与 用于向真空排气装置供给电力的第一电压源,以及当第一电压源处于可操作的顺序时,以更高的排气容量水平激励真空排气装置的控制器,以及用于在真空排气装置 当所述第二电压源向所述真空排气装置供电时,所述第一电压源为不可操作的顺序,所述抽真空容量水平降低。

    Optical modulation apparatus
    7.
    发明授权
    Optical modulation apparatus 失效
    光调制装置

    公开(公告)号:US4802744A

    公开(公告)日:1989-02-07

    申请号:US36873

    申请日:1987-04-10

    IPC分类号: G02F1/1343 G02F1/13

    CPC分类号: G02F1/13439

    摘要: An optical modulation device includes: a first substrate having thereon a high-resistivity film having a sheet resistivity of 10.sup.3 .OMEGA./.quadrature. or above and a plurality of scanning electrode lines having a sheet resistivity of 10.sup.2 .OMEGA./.quadrature. or below and electrically connected to the high-resistivity film; a second substrate having thereon a plurality of data electrodes; and an optical modulation material disposed between the first and second substrates. At least one of the first and second substrates has thereon a pair of color filters of the same color disposed on both sides of at least one of the scanning electrode lines. The difference in height betwen the high-resistivity film and the scanning electrode lines is less than 1000 .ANG..

    摘要翻译: 光调制装置包括:第一基板,其上具有薄膜电阻率为103Ω/□以上的高电阻率薄膜和多个电阻率为102Ω/□以下的扫描电极线,并电连接到 高电阻膜; 第二基板,其上具有多个数据电极; 以及设置在第一和第二基板之间的光调制材料。 第一和第二基板中的至少一个在其上具有布置在至少一个扫描电极线的两侧上的一对相同颜色的滤色器。 高电阻率薄膜和扫描电极线之间的高度差小于1000安培。

    Compensation of warping in display apparatus substrate
    8.
    发明授权
    Compensation of warping in display apparatus substrate 失效
    显示装置基板翘曲补偿

    公开(公告)号:US07592743B2

    公开(公告)日:2009-09-22

    申请号:US11302239

    申请日:2005-12-14

    IPC分类号: H01J1/62 H01J63/04

    摘要: A miss landing measure on a face plate of electrons emitted from electron-emitting devices by the warping of a rear plate and the face plate accompanying heat processes, such as seal bonding, is provided. Initial velocity vectors of electrons emitted from an electron-emitting area of an electron-emitting device formed on the rear plate has a distributed tendency according to an in-plane distribution of normal line directions of the rear plate so that the electrons emitted from each of the plurality of electron-emitting devices may irradiate each of the plurality of light emitting portions, corresponding to each of the electron-emitting devices, formed on the face plate.

    摘要翻译: 提供了通过后板的翘曲和伴随热处理的面板(例如密封接合)从电子发射器件发射的电子的面板上的错落地测量。 从形成在后板上的电子发射器件的电子发射区发射的电子的初始速度矢量具有根据后板的法线方向的面内分布的分布趋势,使得从每个 多个电子发射器件可以照射形成在面板上的每个电子发射器件的多个发光部分中的每一个。