公开(公告)号：US20070231511A1

公开(公告)日：2007-10-04

申请号：US11693064

申请日：2007-03-29

申请人： Teruaki Okuda ,  Yoshiyuki Nagase ,  Nobuo Tokutake ,  Asako Watanabe

发明人： Teruaki Okuda ,  Yoshiyuki Nagase ,  Nobuo Tokutake ,  Asako Watanabe

IPC分类号： B41M5/40

CPC分类号： B41M5/52 ,  B41M5/5218

摘要： A high quality ink jet recording medium with a printed image non-vulnerable and excellent in scratch resistance is obtained with an ink jet recording using a water pigment ink. An ink jet recording medium having a substrate and an ink receiving layer including an inorganic particle and a binder on the substrate is provided. A surface of the ink receiving layer has (a) a projected valley portion depth (Rvk) of not less than 20 nm and not more than 100, (b) an arithmetic average roughness (Ra) of not less than 5 nm and not more than 100 nm, and (c) an average spacing (S) of local peaks of not more than 1.0 μm.

摘要翻译： 通过使用水性颜料墨水的喷墨记录，获得具有非脆弱性和耐擦伤性优异的印刷图像的高质量喷墨记录介质。 提供一种喷墨记录介质，其具有基板和在基板上包括无机颗粒和粘合剂的油墨接收层。 墨水接收层的表面具有（a）不小于20nm且不大于100的投影谷部深度（Rvk），（b）不小于5nm的算术平均粗糙度（Ra）不小于5nm 超过100nm，（c）局部峰的平均间隔（S）不大于1.0μm。

公开(公告)号：US07935397B2

公开(公告)日：2011-05-03

申请号：US11693064

申请日：2007-03-29

申请人： Teruaki Okuda ,  Yoshiyuki Nagase ,  Nobuo Tokutake ,  Asako Watanabe

发明人： Teruaki Okuda ,  Yoshiyuki Nagase ,  Nobuo Tokutake ,  Asako Watanabe

IPC分类号： B41M5/00

CPC分类号： B41M5/52 ,  B41M5/5218

摘要： A high quality ink jet recording medium with a printed image non-vulnerable and excellent in scratch resistance is obtained with an ink jet recording using a water pigment ink. An ink jet recording medium having a substrate and an ink receiving layer including an inorganic particle and a binder on the substrate is provided. A surface of the ink receiving layer has (a) a projected valley portion depth (Rvk) of not less than 20 nm and not more than 100, (b) an arithmetic average roughness (Ra) of not less than 5 nm and not more than 100 nm, and (c) an average spacing (S) of local peaks of not more than 1.0 μm.

摘要翻译： 通过使用水性颜料墨水的喷墨记录，获得具有非脆弱性和耐擦伤性优异的印刷图像的高质量喷墨记录介质。 提供一种喷墨记录介质，其具有基板和在基板上包括无机颗粒和粘合剂的油墨接收层。 墨水接收层的表面具有（a）不小于20nm且不大于100的投影谷部深度（Rvk），（b）不小于5nm的算术平均粗糙度（Ra）不小于5nm 超过100nm，（c）局部峰的平均间隔（S）不大于1.0μm。

公开(公告)号：US5434031A

公开(公告)日：1995-07-18

申请号：US153100

申请日：1993-11-17

申请人： Taku Nakao ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Taku Nakao ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03C1/61 ,  G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0226 ,  G03C1/61

摘要： Disclosed is a positive-working photoresist composition suitable for use in the photolithographic fine patterning work in the manufacture of electronic devices such as VLSIs. The composition comprises, in addition to an alkali-soluble novolac resin as a film-forming ingredient and an esterification product of naphthoquinone-1,2-diazide sulfonic acid as a photosensitive ingredient, a unique additive compound which is an alkyl or aralkyl ester of 2-hydroxy benzoic acid, such as benzyl salicylate, or a phenol compound substituted at least one alkyl group such as 2-tert-butyl-4-methyl phenol. By virtue of the addition of this unique additive, the inventive photoresist composition exhibits an excellent performance of suppressing the standing wave effect in addition to the excellent photosensitivity, resolving power and depth of focusing in the patterning exposure to light as well as good heat resistance of the patterned resist layer.

摘要翻译： 公开了一种适用于制造诸如VLSI的电子设备的光刻精细图案化工作中的正性光致抗蚀剂组合物。 除了作为成膜成分的碱溶性酚醛清漆树脂和萘醌-1,2-二叠氮磺酸作为感光成分的酯化产物之外，组合物还包含作为感光成分的独特的添加剂化合物，其为烷基或芳烷基酯 2-羟基苯甲酸，如水杨酸苄酯，或取代至少一个烷基的酚化合物如2-叔丁基-4-甲基苯酚。 通过添加这种独特的添加剂，本发明的光致抗蚀剂组合物除了在图案曝光中具有优异的光敏性，分辨能力和聚焦深度以及良好的耐热性外，还表现出优异的抑制驻波效应的性能 图案化的抗蚀剂层。

公开(公告)号：US5401605A

公开(公告)日：1995-03-28

申请号：US282772

申请日：1994-07-29

申请人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  G03F7/023

CPC分类号： G03F7/022

摘要： Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.

摘要翻译： 提出了在光刻图案工作中适合作为光致抗蚀剂的正性感光性树脂组合物，用于制造例如具有优异的储存稳定性的半导体器件，并且能够给出具有优异的图像对比度的图案化抗蚀剂层， 线图形的横截面轮廓和耐热性以及令人满意的高光敏性和大的聚焦纬度。 该组合物与作为成膜剂的碱溶性酚醛清漆树脂的混合物包含作为其中两个羟基苯基各自具有环己基基团的特定三（羟基苯基）甲烷化合物的酯化产物的光敏剂 在指定位置与至少一个萘醌-1,2-二叠氮基磺酰基作为酯化基。

公开(公告)号：US5478692A

公开(公告)日：1995-12-26

申请号：US350128

申请日：1994-11-29

申请人： Kousuke Doi ,  Taku Nakao ,  Remi Numata ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Kousuke Doi ,  Taku Nakao ,  Remi Numata ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/031 ,  H01L21/027 ,  G03F7/023

CPC分类号： G03F7/0226

摘要： Proposed is a novel positive-working photoresist composition suitable for use in the fine patterning works in the manufacture of electronic devices and capable of exhibiting excellent performance with high resolution, high sensitivity, wide range of focusing depth, large exposure dose latitude and other characteristics. The photoresist composition is formulated, in addition to the basic ingredients of an alkali-soluble novolac resin as a film-forming agent and photosensitive ingredient such as an ester of naphthoquinone-1,2-diazide sulfonic acid and a polyhydroxy compound, with a limited amount of 4,4'-bis(dialkylamino) benzophenone, e.g., 4,4'-bis(diethylamino) benzophenone, preferably, in combination with a polyhydroxy compound such as 4,6-bis[1-methyl-1-(4-hydroxyphenyl)ethyl]-1,3-dihydroxy phenol.

摘要翻译： 提出了一种新型正性光致抗蚀剂组合物，适用于电子器件制造中的精细图案化工作，能够以高分辨率，高灵敏度，宽范围的聚焦深度，较大的曝光剂量纬度等特性表现出优异的性能。 光致抗蚀剂组合物除了作为成膜剂的碱溶性酚醛清漆树脂的基本成分和萘醌-1,2-二叠氮磺酸和多羟基化合物的酯等感光成分以外，配合有限制 4,4'-双（二烷基氨基）二苯甲酮的量，例如4,4'-双（二乙基氨基）二苯甲酮，优选与多羟基化合物如4,6-双[1-甲基-1-（4 - 羟基苯基）乙基] -1,3-二羟基苯酚。

公开(公告)号：US4985333A

公开(公告)日：1991-01-15

申请号：US385820

申请日：1989-07-27

申请人： Nobuo Tokutake ,  Koichi Takahashi ,  Yoshiyuki Satoh ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Nobuo Tokutake ,  Koichi Takahashi ,  Yoshiyuki Satoh ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： C08L61/08 ,  G03F7/022

CPC分类号： G03F7/022

摘要： The positive-working photosensitive composition useful as a material of photoresist comprises, in addition to a film-forming resin, such as a cresol novolak resin, and a photosensitive compound, such as an ester of a polyhydroxy benzophenone and 1,2-naphthoquinonediazido-5-sulfonic acid, an esterification product of curcumin with 1,2-naphthoquinone diazide sulfonic acid in a limited amount. The photosensitive composition is outstandingly insusceptible to the adverse influence of halation even when the photoresist layer is formed on a highly reflective aluminum-deposited surface of a substrate without decreasing the photosensitivity of the composition to actinic rays in the photolithographic process for the manufacture of semiconductor devices.

摘要翻译： 可用作光致抗蚀剂材料的正性感光性组合物除了成膜树脂以外，例如甲酚酚醛清漆树脂和光敏化合物，例如多羟基二苯甲酮的酯和1,2-萘醌二叠氮基 - 5-磺酸，姜黄素与1,2-萘醌二叠氮磺酸的酯化产物有限。 即使当光致抗蚀剂层形成在基板的高反射性铝沉积表面上时，光敏组合物对于不利影响也是显着的，而不会在用于制造半导体器件的光刻工艺中降低组合物对光化射线的光敏性 。

公开(公告)号：US07425457B2

公开(公告)日：2008-09-16

申请号：US10792715

申请日：2004-03-05

申请人： Nobuo Tokutake ,  Akio Hasebe

发明人： Nobuo Tokutake ,  Akio Hasebe

IPC分类号： H01L21/66 ,  G01R31/26 ,  A61N5/06

CPC分类号： F21S8/006 ,  H05B37/02 ,  H05B37/029

摘要： In a method of irradiating an object with simulated solar radiation using a plurality of light sources, the object is irradiated with simulated solar radiation resulting from superimposed light rays from a plurality of light sources including light sources having different times at which light emission output reaches a peak.

摘要翻译： 在使用多个光源照射具有模拟的太阳辐射的物体的方法中，对来自多个光源的叠加光线产生的模拟太阳辐射照射物体，所述多个光源包括具有不同时间的光源，发光输出达到 峰。

公开(公告)号：US6132817A

公开(公告)日：2000-10-17

申请号：US822607

申请日：1997-03-19

申请人： Nobuo Tokutake ,  Masafumi Sano ,  Ryo Hayashi ,  Makoto Higashikawa

发明人： Nobuo Tokutake ,  Masafumi Sano ,  Ryo Hayashi ,  Makoto Higashikawa

IPC分类号： H01L31/04 ,  H01L21/304 ,  H01L31/0392 ,  H01L31/052 ,  H01L31/076 ,  H01L31/20 ,  B05D3/10 ,  H05H1/24

CPC分类号： H01L31/076 ,  H01L31/03921 ,  H01L31/056 ,  H01L31/202 ,  H01L31/204 ,  H01L31/206 ,  Y02E10/52 ,  Y02E10/548 ,  Y02P70/521

摘要： A method of manufacturing a photoelectric transducer forms a functional film on a conductive substrate. The method comprises applying ultrasonic cleaning with a cleaning liquid containing water to the conductive substrate, then allowing the surface of the conductive substrate to contact purified water so as to import uniform oxidation and then forming the functional film thereon. The functional film is characterized in being formed with a metal layer as light-reflecting layer, a reflection enhancing layer, and a semiconductor photovoltaic device layer, prepared by a plasma CVD method, comprising a non-monocrystalline material containing silicon atoms as the matrix.

摘要翻译： 光电转换器的制造方法在导电性基板上形成功能膜。 该方法包括将超声波清洗用含有水的清洗液施加到导电性基材上，然后使导电性基材的表面与净化水接触，进行均匀氧化，然后在其上形成功能膜。 功能膜的特征在于，通过等离子体CVD法制备的金属层作为光反射层，反射增强层和半导体光电器件层，其包含含有硅原子作为基体的非单晶材料。

公开(公告)号：US5601961A

公开(公告)日：1997-02-11

申请号：US412889

申请日：1995-03-29

申请人： Kazuhiko Nakayama ,  Taku Nakao ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Kazuhiko Nakayama ,  Taku Nakao ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  C08G8/08 ,  G03F7/023 ,  H01L21/027

CPC分类号： C08G8/08 ,  G03F7/0236

摘要： Disclosed is an improved positive-working photoresist composition comprising an alkali-soluble resin as a film-forming agent and a quinone diazide group-containing compound as a photosensitive agent. The most characteristic feature of the inventive composition consists in the unique formulation of the alkali-soluble resin which is a combination of two or three kinds of novolac resins selected from novolac resins (a), (b1) or (b2) and (c1) or (c2), each of which is characterized by the unique formulation of the phenolic compounds as a mixture to be subjected to a condensation reaction with an aldehyde compound to form the novolac resin. Namely, the phenolic mixture for the novolac (a) consists of m- and p-cresols, the phenolic mixture for the novolac (b1) consists of m-cresol and a xylenol, the phenolic mixture for the novolac (b2) consists of m- and p-cresols and a xylenol, the phenolic mixture for the novolac (c1) consists of m-cresol and a trimethyl phenol and the phenolic mixture for the novolac (c2) consists of m- and p-cresols and a trimethyl phenol each in a specified molar proportion of the constituent phenolic compounds.

摘要翻译： 公开了一种改进的正性光致抗蚀剂组合物，其包含作为成膜剂的碱溶性树脂和含醌二叠氮基的化合物作为感光剂。 本发明组合物最具特色的特征在于碱溶性树脂的独特配方，其是选自酚醛清漆树脂（a），（b1）或（b2）和（c1）中的两种或三种酚醛清漆树脂的组合， 或（c2），其各自的特征在于酚类化合物作为与醛化合物进行缩合反应以形成酚醛清漆树脂的混合物的独特配方。 即，酚醛清漆（a）的酚类混合物由间甲酚和对甲酚组成，酚醛清漆（b1）的酚类混合物由间甲酚和二甲苯酚组成，酚醛清漆（b2）的酚类混合物由 - 酚甲酚和二甲苯酚，酚醛清漆（c1）的酚类混合物由间甲酚和三甲酚组成，酚醛清漆（c2）的酚类混合物由间甲苯酚和对甲酚和三甲酚组成 以规定摩尔比例的组成酚类化合物。

公开(公告)号：US5501936A

公开(公告)日：1996-03-26

申请号：US362857

申请日：1994-12-23

申请人： Hiroshi Hosoda ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Hiroshi Hosoda ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023

CPC分类号： G03F7/0226

摘要： An improved positive-working photoresist composition useful in the fine patterning work of a resist layer is proposed which is capable of giving a patterned resist layer having excellent resolution, heat resistance and orthogonality of the cross sectional profile of a line pattern with a high sensitivity to actinic rays and a wide range of the focusing depth. The photoresist composition comprises, as a uniform mixture in the form of a solution, (a) an alkali-soluble novolac resin, (b) a naphthoquinone-1,2-diazido group-containing compound as a photosensitizing ingredient and (c) a specific phenolic triphenyl methane compound substituted by cyclohexyl groups on two of the phenyl groups, such as bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenyl methane or bis(3-cyclohexyl-6-hydroxy-4-methylphenyl)-3,4-dihydroxyphenyl methane, in a specified amount.

摘要翻译： 提出了可用于抗蚀剂层的精细图案化工作的改进的正性光致抗蚀剂组合物，其能够提供具有高灵敏度的线图案的横截面轮廓的优异分辨率，耐热性和正交性的图案化抗蚀剂层 光化射线和广泛的聚焦深度。 光致抗蚀剂组合物包含作为溶液形式的均匀混合物，（a）碱溶性酚醛清漆树脂，（b）含萘醌-1,2-二叠氮基化合物作为光敏成分，（c） 在两个苯基上的环己基取代的特异性酚类三苯基甲烷化合物，例如双（3-环己基-4-羟基-6-甲基苯基）-3,4-二羟基苯基甲烷或双（3-环己基-6-羟基 - 4-甲基苯基）-3,4-二羟基苯基甲烷。