公开(公告)号：US20150099357A1

公开(公告)日：2015-04-09

申请号：US14508989

申请日：2014-10-07

Applicant: XINTEC INC.

Inventor： Chuan-Jin SHIU ,  Tsang-Yu LIU ,  Chih-Wei HO ,  Shih-Hsing CHAN ,  Ching-Jui CHUANG

IPC: H01L23/00

CPC classification number: H01L24/03 ,  H01L21/32139 ,  H01L21/6835 ,  H01L21/78 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68372 ,  H01L2224/02371 ,  H01L2224/02372 ,  H01L2224/03009 ,  H01L2224/0345 ,  H01L2224/0361 ,  H01L2224/0362 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05548 ,  H01L2224/05558 ,  H01L2224/05567 ,  H01L2224/05583 ,  H01L2224/056 ,  H01L2224/11821 ,  H01L2224/13022 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/94 ,  H01L2924/0105 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2924/014

Abstract: A method of fabricating a wafer-level chip package is provided. First, a wafer with two adjacent chips is provided, the wafer having an upper surface and a lower surface, and one side of each chip includes a conducting pad on the lower surface. A recess and an isolation layer extend from the upper surface to the lower surface, which the recess exposes the conducting pad. A part of the isolation layer is disposed in the recess with an opening to expose the conducting pad. A conductive layer is formed on the isolation layer and the conductive pad, and a photo-resist layer is spray coated on the conductive layer. The photo-resist layer is exposed and developed to expose the conductive layer, and the conductive layer is etched to form a redistribution layer. After stripping the photo-resist layer, a solder layer is formed on the isolation layer and the redistribution layer.

Abstract translation: 提供了制造晶片级芯片封装的方法。 首先，提供具有两个相邻芯片的晶片，所述晶片具有上表面和下表面，并且每个芯片的一侧在下表面上包括导电焊盘。 凹部和隔离层从上表面延伸到下表面，凹部暴露导电垫。 隔离层的一部分设置在具有开口的凹部中以暴露导电垫。 在隔离层和导电焊盘上形成导电层，并且将光致抗蚀剂层喷涂在导电层上。 曝光和显影光致抗蚀剂层以暴露导电层，并且蚀刻导电层以形成再分布层。 在剥离光刻胶层之后，在隔离层和再分布层上形成焊料层。