Electrically Erasable Programmable Read-Only Memory (EEPROM) Cell and Methods for Forming and Reading the Same
    1.
    发明申请
    Electrically Erasable Programmable Read-Only Memory (EEPROM) Cell and Methods for Forming and Reading the Same 有权
    电可擦除可编程只读存储器(EEPROM)单元及其形成和读取方法

    公开(公告)号:US20110038210A1

    公开(公告)日:2011-02-17

    申请号:US12912517

    申请日:2010-10-26

    IPC分类号: G11C16/26 G11C16/04 G11C16/30

    摘要: In a method of reading data in an EEPROM cell, a bit line voltage for reading is applied to the EEPROM cell including a memory transistor and a selection transistor. A first voltage is applied to a sense line of the memory transistor. A second voltage greater than the first voltage is applied to a word line of the selection transistor. A current passing through the EEPROM cell is compared with a predetermined reference current to read the data stored in the EEPROM cell. An on-cell current of the EEPROM cell may be increased in an erased state and the data in the cell may be readily discriminated.

    摘要翻译: 在EEPROM单元中读取数据的方法中,用于读取的位线电压被施加到包括存储晶体管和选择晶体管的EEPROM单元。 第一电压被施加到存储晶体管的感测线。 大于第一电压的第二电压被施加到选择晶体管的字线。 将通过EEPROM单元的电流与预定的参考电流进行比较,以读取存储在EEPROM单元中的数据。 可以在擦除状态下增加EEPROM单元的通电池电流,并且可以容易地区分单元中的数据。

    Mask ROM and method of fabricating the same
    2.
    发明授权
    Mask ROM and method of fabricating the same 有权
    掩模ROM及其制造方法

    公开(公告)号:US07638387B2

    公开(公告)日:2009-12-29

    申请号:US11823381

    申请日:2007-06-27

    IPC分类号: H01L21/8234

    CPC分类号: H01L27/1021

    摘要: A mask read-only memory (ROM) includes a dielectric layer formed on a substrate and a plurality of first conductive lines formed on the dielectric layer. A plurality of diodes are formed in the first conductive lines, and a plurality of final vias are formed for a first set of the diodes each representing a first type of memory cell, with no final via being formed for a second set of diodes each representing a second type of memory cell. Each of a plurality of second conductive lines is formed over a column of the diodes.

    摘要翻译: 掩模只读存储器(ROM)包括形成在基板上的电介质层和形成在电介质层上的多个第一导电线。 在第一导线中形成多个二极管,并且为第一组二极管形成多个最终通孔,每个二极管表示第一类型的存储单元,没有形成用于第二组二极管的最终通孔,每个二极管表示 第二种类型的存储单元。 多个第二导电线中的每一个形成在二极管的列上。

    Mask ROM device, semiconductor device including the mask ROM device, and methods of fabricating mask ROM device and semiconductor device
    3.
    发明授权
    Mask ROM device, semiconductor device including the mask ROM device, and methods of fabricating mask ROM device and semiconductor device 失效
    掩模ROM器件,包括掩模ROM器件的半导体器件,以及制造掩模ROM器件和半导体器件的方法

    公开(公告)号:US08053342B2

    公开(公告)日:2011-11-08

    申请号:US12836066

    申请日:2010-07-14

    IPC分类号: H01L21/8238

    摘要: A mask read-only memory (ROM) device, which can stably output data, includes an on-cell and an off-cell. The on-cell includes an on-cell gate structure on a substrate and an on-cell junction structure within the substrate. The off-cell includes an off-cell gate structure on the substrate and an off-cell junction structure within the substrate. The on-cell gate structure includes an on-cell gate insulating film, an on-cell gate electrode and an on-cell gate spacer. The on-cell junction structure includes first and second on-cell ion implantation regions of a first polarity and third and fourth on-cell ion implantation regions of a second polarity. The off-cell gate structure includes an off-cell gate insulating film, an off-cell gate electrode and an off-cell gate spacer. The off-cell junction structure includes first and second off-cell ion implantation regions of the first polarity and a third off-cell ion implantation region of the second polarity.

    摘要翻译: 可以稳定地输出数据的掩模只读存储器(ROM)装置包括接通电池和截止电池。 开放单元包括衬底上的孔上栅极结构和衬底内的电池单元结结构。 离子电池包括在衬底上的离子电池栅极结构和衬底内的细胞外结合结构。 单体栅极结构包括单元间栅极绝缘膜,单晶体栅极电极和单元间栅极间隔物。 该单电池结结构包括具有第一极性的第一和第二开孔离子注入区和第二极性的第三和第四接通电离子注入区。 离群栅极结构包括离子栅极绝缘膜,离子阱栅极电极和非电池栅极间隔物。 离电池结结构包括具有第一极性的第一和第二离子外离子注入区域和第二极性的第三离子间离子注入区域。

    Electrically erasable programmable read-only memory (EEPROM) cell and methods for forming and reading the same
    4.
    发明授权
    Electrically erasable programmable read-only memory (EEPROM) cell and methods for forming and reading the same 有权
    电可擦除可编程只读存储器(EEPROM)单元及其形成和读取方法

    公开(公告)号:US07944753B2

    公开(公告)日:2011-05-17

    申请号:US12912517

    申请日:2010-10-26

    IPC分类号: G11C16/04

    摘要: In a method of reading data in an EEPROM cell, a bit line voltage for reading is applied to the EEPROM cell including a memory transistor and a selection transistor. A first voltage is applied to a sense line of the memory transistor. A second voltage greater than the first voltage is applied to a word line of the selection transistor. A current passing through the EEPROM cell is compared with a predetermined reference current to read the data stored in the EEPROM cell. An on-cell current of the EEPROM cell may be increased in an erased state and the data in the cell may be readily discriminated.

    摘要翻译: 在EEPROM单元中读取数据的方法中,用于读取的位线电压被施加到包括存储晶体管和选择晶体管的EEPROM单元。 第一电压被施加到存储晶体管的感测线。 大于第一电压的第二电压被施加到选择晶体管的字线。 将通过EEPROM单元的电流与预定的参考电流进行比较,以读取存储在EEPROM单元中的数据。 可以在擦除状态下增加EEPROM单元的通电池电流,并且可以容易地区分单元中的数据。

    Electrically erasable programmable read-only memory (EEPROM) cell and methods for forming and reading the same
    5.
    发明授权
    Electrically erasable programmable read-only memory (EEPROM) cell and methods for forming and reading the same 有权
    电可擦除可编程只读存储器(EEPROM)单元及其形成和读取方法

    公开(公告)号:US07839680B2

    公开(公告)日:2010-11-23

    申请号:US12192839

    申请日:2008-08-15

    IPC分类号: G11C16/04

    摘要: In a method of reading data in an EEPROM cell, a bit line voltage for reading is applied to the EEPROM cell including a memory transistor and a selection transistor. A first voltage is applied to a sense line of the memory transistor. A second voltage greater than the first voltage is applied to a word line of the selection transistor. A current passing through the EEPROM cell is compared with a predetermined reference current to read the data stored in the EEPROM cell. An on-cell current of the EEPROM cell may be increased in an erased state and the data in the cell may be readily discriminated.

    摘要翻译: 在EEPROM单元中读取数据的方法中,用于读取的位线电压被施加到包括存储晶体管和选择晶体管的EEPROM单元。 第一电压被施加到存储晶体管的感测线。 大于第一电压的第二电压被施加到选择晶体管的字线。 将通过EEPROM单元的电流与预定的参考电流进行比较,以读取存储在EEPROM单元中的数据。 可以在擦除状态下增加EEPROM单元的通电池电流,并且可以容易地区分单元中的数据。

    MASK ROM DEVICE, SEMICONDUCTOR DEVICE INCLUDING THE MASK ROM DEVICE, AND METHODS OF FABRICATING MASK ROM DEVICE AND SEMICONDUCTOR DEVICE
    6.
    发明申请
    MASK ROM DEVICE, SEMICONDUCTOR DEVICE INCLUDING THE MASK ROM DEVICE, AND METHODS OF FABRICATING MASK ROM DEVICE AND SEMICONDUCTOR DEVICE 失效
    掩蔽ROM器件,包括掩模ROM器件的半导体器件,以及制造掩模ROM器件和半导体器件的方法

    公开(公告)号:US20100285641A1

    公开(公告)日:2010-11-11

    申请号:US12836066

    申请日:2010-07-14

    IPC分类号: H01L21/8238 H01L21/8234

    摘要: A mask read-only memory (ROM) device, which can stably output data, includes an on-cell and an off-cell. The on-cell includes an on-cell gate structure on a substrate and an on-cell junction structure within the substrate. The off-cell includes an off-cell gate structure on the substrate and an off-cell junction structure within the substrate. The on-cell gate structure includes an on-cell gate insulating film, an on-cell gate electrode and an on-cell gate spacer. The on-cell junction structure includes first and second on-cell ion implantation regions of a first polarity and third and fourth on-cell ion implantation regions of a second polarity. The off-cell gate structure includes an off-cell gate insulating film, an off-cell gate electrode and an off-cell gate spacer. The off-cell junction structure includes first and second off-cell ion implantation regions of the first polarity and a third off-cell ion implantation region of the second polarity.

    摘要翻译: 可以稳定地输出数据的掩模只读存储器(ROM)装置包括接通电池和截止电池。 开放单元包括衬底上的孔上栅极结构和衬底内的电池单元结结构。 离子电池包括在衬底上的离子电池栅极结构和衬底内的细胞外结合结构。 单体栅极结构包括单元间栅极绝缘膜,单晶体栅极电极和单元间栅极间隔物。 该单电池结结构包括具有第一极性的第一和第二开孔离子注入区和第二极性的第三和第四接通电离子注入区。 离群栅极结构包括离子栅极绝缘膜,离子阱栅极电极和非电池栅极间隔物。 离电池结结构包括具有第一极性的第一和第二离子外离子注入区域和第二极性的第三离子间离子注入区域。

    Electrically Erasable Programmable Read-Only Memory (EEPROM) Cell and Methods for Forming and Reading the Same
    7.
    发明申请
    Electrically Erasable Programmable Read-Only Memory (EEPROM) Cell and Methods for Forming and Reading the Same 有权
    电可擦除可编程只读存储器(EEPROM)单元及其形成和读取方法

    公开(公告)号:US20090059664A1

    公开(公告)日:2009-03-05

    申请号:US12192839

    申请日:2008-08-15

    摘要: In a method of reading data in an EEPROM cell, a bit line voltage for reading is applied to the EEPROM cell including a memory transistor and a selection transistor. A first voltage is applied to a sense line of the memory transistor. A second voltage greater than the first voltage is applied to a word line of the selection transistor. A current passing through the EEPROM cell is compared with a predetermined reference current to read the data stored in the EEPROM cell. An on-cell current of the EEPROM cell may be increased in an erased state and the data in the cell may be readily discriminated.

    摘要翻译: 在EEPROM单元中读取数据的方法中,用于读取的位线电压被施加到包括存储晶体管和选择晶体管的EEPROM单元。 第一电压被施加到存储晶体管的感测线。 大于第一电压的第二电压被施加到选择晶体管的字线。 将通过EEPROM单元的电流与预定的参考电流进行比较,以读取存储在EEPROM单元中的数据。 可以在擦除状态下增加EEPROM单元的通电池电流,并且可以容易地区分单元中的数据。

    Non-volatile memory device and method for fabricating the same
    8.
    发明申请
    Non-volatile memory device and method for fabricating the same 审中-公开
    非易失性存储器件及其制造方法

    公开(公告)号:US20080093646A1

    公开(公告)日:2008-04-24

    申请号:US11602075

    申请日:2006-11-20

    IPC分类号: H01L29/76

    CPC分类号: H01L29/7881 H01L29/66825

    摘要: A non-volatile memory device comprises a semiconductor substrate having source/drain regions formed at both ends of a channel region, a gate structure forming an offset region by being separated a predetermined distance from the source region and comprising a charge accumulation region and a control gate sequentially deposited in the channel region to at least partially overlap the drain region, and a spacer arranged at each of both side walls of the gate structure. A threshold voltage value of the offset region changes depending on a dielectric constant of the spacer.

    摘要翻译: 一种非易失性存储器件包括:半导体衬底,其具有形成在沟道区两端的源极/漏极区;栅极结构,通过与源极区隔开预定的距离而形成偏移区,并且包括电荷累积区和控制 顺序地沉积在沟道区域中以与漏极区域至少部分重叠的栅极以及布置在栅极结构的两个侧壁中的每一个侧壁处的间隔物。 偏移区域的阈值电压值根据间隔物的介电常数而变化。

    Non-volatile memory devices including local control gates on multiple isolated well regions and related methods and systems
    9.
    发明申请
    Non-volatile memory devices including local control gates on multiple isolated well regions and related methods and systems 有权
    非易失性存储器件包括多个隔离阱区域上的本地控制栅极以及相关的方法和系统

    公开(公告)号:US20080080244A1

    公开(公告)日:2008-04-03

    申请号:US11818238

    申请日:2007-06-13

    IPC分类号: G11C11/34 G11C7/00

    摘要: A non-volatile integrated circuit memory device may include a semiconductor substrate having first and second electrically isolated wells of a same conductivity type. A first plurality of non-volatile memory cell transistors may be provided on the first well, and a second plurality of non-volatile memory cell transistors may be provided on the second well. A local control gate line may be electrically coupled with the first and second pluralities of non-volatile memory cell transistors, and a group selection transistor may be electrically coupled between the local control gate line and a global control gate line. More particularly, the group selection transistor may be configured to electrically couple and decouple the local control gate line and the global control gate line responsive to a group selection gate signal applied to a gate of the group selection transistor. Related methods and systems are also discussed.

    摘要翻译: 非易失性集成电路存储器件可以包括具有相同导电类型的第一和第二电隔离阱的半导体衬底。 可以在第一阱上提供第一多个非易失性存储单元晶体管,并且可以在第二阱上提供第二多个非易失性存储单元晶体管。 本地控制栅极线可以与第一和第二多个非易失性存储单元晶体管电耦合,并且组选择晶体管可以电耦合在本地控制栅极线和全局控制栅极线之间。 更具体地,组选择晶体管可以被配置为响应于施加到组选择晶体管的栅极的组选择栅极信号来电耦合和去耦合本地控制栅极线和全局控制栅极线。 还讨论了相关方法和系统。

    Non-volatile memory device and method for fabricating the same
    10.
    发明申请
    Non-volatile memory device and method for fabricating the same 审中-公开
    非易失性存储器件及其制造方法

    公开(公告)号:US20080001204A1

    公开(公告)日:2008-01-03

    申请号:US11647711

    申请日:2006-12-29

    IPC分类号: H01L29/76

    摘要: A non-volatile memory device and a method for fabricating the non-volatile memory device. The non-volatile memory device includes a memory cell located in a first conductive region and has a memory transistor, a selection transistor and a high voltage switching device located in a second conductive region close to the first conductive region. The memory cell is controlled by the high voltage switching device. At least one of the high voltage switching device, the memory transistor, or the selection transistor has a recessed channel region.

    摘要翻译: 一种非易失性存储器件和用于制造非易失性存储器件的方法。 非易失性存储器件包括位于第一导电区域中的存储单元,并且具有位于靠近第一导电区域的第二导电区域中的存储晶体管,选择晶体管和高压开关器件。 存储单元由高电压开关装置控制。 高压开关器件,存储晶体管或选择晶体管中的至少一个具有凹陷沟道区域。