公开(公告)号：USD654041S1

公开(公告)日：2012-02-14

申请号：US29387289

申请日：2011-03-11

Applicant: Jong-Bo Jung ,  Ji-Young Lee

Designer： Jong-Bo Jung ,  Ji-Young Lee

公开(公告)号：US08056102B2

公开(公告)日：2011-11-08

申请号：US12213039

申请日：2008-06-13

Applicant: Ji-Young Lee

Inventor： Ji-Young Lee

IPC: H04N5/445 ,  G06F13/00 ,  G06F3/00 ,  H04N5/50

CPC classification number: H04N5/44543 ,  H04N5/50 ,  H04N7/0122 ,  H04N21/4263 ,  H04N21/4316 ,  H04N21/4345 ,  H04N21/4348 ,  H04N21/440263 ,  H04N21/482

Abstract: There is provided a channel selection device receiving a multi-channel video including plural videos and video configuration information on each video from a head end. The channel selection device includes a first screen display unit editing the multi-channel video based on the video configuration information and searching view configuration information to generate a channel searching view and displaying the channel searching view on a sub-screen of a television; and a second screen display unit displaying on a main screen of the television a video selected by a viewer out of the videos included in the channel searching view.

Abstract translation: 提供一种频道选择装置，从头端接收包括多个视频的多频道视频和关于每个视频的视频配置信息。 频道选择装置包括基于视频配置信息编辑多声道视频的第一屏幕显示单元和搜索视图配置信息以生成频道搜索视图并在电视机的子屏幕上显示频道搜索视图; 以及第二屏幕显示单元，在电视的主屏幕上显示由观看者在包括在频道搜索视图中的视频中选择的视频。

公开(公告)号：US20110269294A1

公开(公告)日：2011-11-03

申请号：US13181655

申请日：2011-07-13

Applicant: Cha-won Koh ,  Han-ku Cho ,  Jeong-lim Nam ,  Gi-sung Yeo ,  Joon-soo Park ,  Ji-young Lee

Inventor： Cha-won Koh ,  Han-ku Cho ,  Jeong-lim Nam ,  Gi-sung Yeo ,  Joon-soo Park ,  Ji-young Lee

IPC: H01L21/762

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144 ,  H01L21/76816

Abstract: A method of forming hard mask employs a double patterning technique. A first hard mask layer is formed on a substrate, and a first sacrificial pattern is formed on the first hard mask layer by photolithography. Features of the first sacrificial pattern are spaced from one another by a first pitch. A second hard mask layer is then formed conformally on the first sacrificial pattern and the first hard mask layer so as to delimit recesses between adjacent features of the first sacrificial pattern. Upper portions of the second hard mask layer are removed to expose the first sacrificial pattern, and the exposed first sacrificial pattern and the second sacrificial pattern are removed. The second hard mask layer and the first hard mask layer are then etched to form a hard mask composed of residual portions of the first hard mask layer and the second hard mask layer. A fine pattern of a semiconductor device, such as a trench isolation region or a pattern of contact holes, can be formed using the hard mask as an etch mask.

Abstract translation: 形成硬掩模的方法采用双重图案化技术。 第一硬掩模层形成在基板上，并且通过光刻在第一硬掩模层上形成第一牺牲图案。 第一牺牲图案的特征彼此间隔开第一间距。 然后在第一牺牲图案和第一硬掩模层上共形地形成第二硬掩模层，以便限定第一牺牲图案的相邻特征之间的凹部。 去除第二硬掩模层的上部以露出第一牺牲图案，并且去除暴露的第一牺牲图案和第二牺牲图案。 然后蚀刻第二硬掩模层和第一硬掩模层，以形成由第一硬掩模层和第二硬掩模层的残留部分组成的硬掩模。 可以使用硬掩模作为蚀刻掩模来形成诸如沟槽隔离区域或接触孔图案的半导体器件的精细图案。

公开(公告)号：USD645439S1

公开(公告)日：2011-09-20

申请号：US29380507

申请日：2010-12-07

Applicant: Ji-Young Lee ,  Min-Hyouk Lee

Designer： Ji-Young Lee ,  Min-Hyouk Lee

公开(公告)号：USD644196S1

公开(公告)日：2011-08-30

申请号：US29379765

申请日：2010-11-24

Applicant: Ji-Young Lee ,  Nam-Mi Kim

Designer： Ji-Young Lee ,  Nam-Mi Kim

公开(公告)号：USD643827S1

公开(公告)日：2011-08-23

申请号：US29379102

申请日：2010-11-15

Applicant: Ji-Young Lee ,  Nam-Mi Kim

Designer： Ji-Young Lee ,  Nam-Mi Kim

公开(公告)号：US20110164270A1

公开(公告)日：2011-07-07

申请号：US12923670

申请日：2010-10-01

Applicant: LYE-SUK LEE ,  HWAN-JOON CHOI ,  JI-YOUNG LEE

Inventor： LYE-SUK LEE ,  HWAN-JOON CHOI ,  JI-YOUNG LEE

IPC: G06F3/12 ,  G06F15/00

CPC classification number: G06F3/1203 ,  G06F3/1239 ,  G06F3/1261 ,  G06F3/1291 ,  G06F21/604 ,  G06F21/608

Abstract: An image forming apparatus is provided. The image forming apparatus includes a storage unit which stores information regarding the other image forming apparatuses of the same group as the image forming apparatus and quota information of each user which is shared by the other image forming apparatuses, a controller which, if a job command is input, determines whether to perform a job according to whether the number of copies requested by the job command satisfies the quota information of each user, a function unit which performs the job under control of the controller, a quota information administration unit which updates the quota information of each user stored in the storage unit as the job is performed, and a communication interface which transmits the updated quota information of each user to the other image forming apparatuses.

Abstract translation: 提供一种图像形成装置。 图像形成装置包括存储单元，其存储与图像形成装置相同的组的其他图像形成装置的信息和由其他图像形成装置共享的每个用户的配额信息，控制器，如果作业命令 被输入，根据作业指令所请求的副本是否满足每个用户的配额信息来确定是否执行作业，在控制器的控制下执行作业的功能单元，配额信息管理单元更新 执行作业时存储在存储单元中的每个用户的配额信息，以及将每个用户的更新的配额信息发送到其他图像形成装置的通信接口。

公开(公告)号：US20110109392A1

公开(公告)日：2011-05-12

申请号：US12907925

申请日：2010-10-19

Applicant: Jang Hyun PARK ,  Chang Sun Kim ,  Yea Chul Roh ,  Tae-Yeoul Yun ,  Hyun-kyu Park ,  Ji-Young Lee

Inventor： Jang Hyun PARK ,  Chang Sun Kim ,  Yea Chul Roh ,  Tae-Yeoul Yun ,  Hyun-kyu Park ,  Ji-Young Lee

IPC: H03F1/34

CPC classification number: H03F1/32 ,  H03F1/223 ,  H03F1/342 ,  H03F2200/117 ,  H03F2200/144 ,  H03F2200/147 ,  H03F2200/294 ,  H03F2200/36 ,  H03F2200/411 ,  H03F2200/451

Abstract: Provided is a Low Noise Amplifier (LNA). Embodiments of the present invention provide LNAs including: a common gate amplifier circuit configure to amplify a signal of an input node to which an Alternating Current (AC) component is provided and transfer the amplified signal to an amplifier node; and a negative-feedback amplifier circuit configured to amplify a signal of the amplifier node, transfer the amplified signal to an output node, wherein the negative-feedback amplifier circuit includes a feedback capacitor and a feedback inductor connected in series between the amplifier node and the output node to form a negative feedback. the LNA of the present invention forms a negative feedback exclusive of a feedback resistance, such that a broad frequency bandwidth is obtained and noise and heat are reduced.

Abstract translation: 提供了一种低噪声放大器（LNA）。 本发明的实施例提供LNA，其包括：公共栅极放大器电路，其配置为放大提供交流电（AC）分量的输入节点的信号，并将放大的信号传送到放大器节点; 以及负反馈放大器电路，被配置为放大放大器节点的信号，将放大的信号传送到输出节点，其中负反馈放大器电路包括反馈电容器和反馈电感器，其串联连接在放大器节点和 输出节点形成负反馈。 本发明的LNA形成排除反馈电阻的负反馈，从而获得宽的频率带宽，降低噪声和热量。

公开(公告)号：US20110081778A1

公开(公告)日：2011-04-07

申请号：US12966110

申请日：2010-12-13

Applicant: Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

Inventor： Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

IPC: H01L21/768

CPC classification number: H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76804 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/76816 ,  H01L27/105 ,  H01L27/1052 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device and method are disclosed in which an interlayer insulating layer is patterned using multiple overlaying masks to define the geometry of contact plugs and corresponding wiring layers separated by fine pitches.

Abstract translation: 公开了一种半导体器件和方法，其中使用多个覆盖掩模来图案化层间绝缘层，以限定接触插塞的几何形状和由细间距分开的对应的布线层。

公开(公告)号：US07873935B2

公开(公告)日：2011-01-18

申请号：US11762838

申请日：2007-06-14

Applicant: Sung-gon Jung ,  Ji-young Lee ,  Han-ku Cho ,  Gi-sung Yeo

Inventor： Sung-gon Jung ,  Ji-young Lee ,  Han-ku Cho ,  Gi-sung Yeo

IPC: G06F17/50 ,  G06F19/00 ,  G21K5/00

CPC classification number: G03F1/36

Abstract: A method of manufacturing a mask includes designing a first mask data pattern, designing a second mask data pattern for forming the first mask data pattern, acquiring a first emulation pattern, which is predicted from the second mask data pattern, using layout-based Self-Aligning Double Patterning (SADP) emulation, comparing the first emulation pattern with the first mask data pattern, and modifying the second mask data pattern according to results of the comparison. The method further includes performing Optical Proximity Correction (OPC) on the modified second mask data pattern, acquiring second emulation patterns, which are predicted from the second mask data pattern on which the OPC has been performed, using image-based SADP emulation, and comparing the second emulation patterns and the first mask data pattern and manufacturing a first mask layer, which corresponds to the second mask data pattern on which the OPC has been performed, according to the results of the comparison.

Abstract translation: 一种制造掩模的方法包括：设计第一掩模数据图案，设计用于形成第一掩模数据图案的第二掩模数据图案，使用基于布局的自对准方法获取从第二掩模数据图案预测的第一仿真图案， 对准双重图案（SADP）仿真，将第一仿真模式与第一掩模数据模式进行比较，并根据比较结果修改第二掩模数据模式。 该方法还包括在修改的第二掩模数据模式上执行光学邻近校正（OPC），从使用基于图像的SADP仿真的第二掩模数据模式中获取第二仿真模式，其中已经执行了OPC，并且比较 第二仿真模式和第一掩模数据模式，并且根据比较结果制造对应于已经执行了OPC的第二掩模数据模式的第一掩模层。