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141 条记录 (耗时 0.02 秒)

    Drill bit for PCB
    92.
    发明申请
    Drill bit for PCB 审中-公开
    钻头用于PCB

    公开(公告)号：US20070286693A1

    公开(公告)日：2007-12-13

    申请号：US11727629

    申请日：2007-03-27

    申请人： Seung Hyun Cho ,  Han Kim ,  Sun Joong Ryu ,  Il Soung Yoon

    发明人： Seung Hyun Cho ,  Han Kim ,  Sun Joong Ryu ,  Il Soung Yoon

    IPC分类号： B23D77/00

    CPC分类号： B23B51/02 ,  B23B41/14 ,  B23B51/08 ,  B23B2228/36 ,  B23D77/00 ,  B23D77/12 ,  H05K3/0047 ,  H05K2203/1476 ,  Y10T408/909

    摘要： Disclosed is a drill bit for making a hole through stacked PCBs includes a drill part formed with drilling edges on an outer surface thereof and brought into contact with the PCBs, that is, a workpiece in which to make the hole; a reamer part formed on the rear end of the drill part and having at least one reaming edge for finishing the surface of the hole; and a shank part formed on the rear end of the reamer part and mounted to a machine tool.

    摘要翻译： 公开了一种用于通过堆叠的PCB制造孔的钻头，其包括在其外表面上形成有钻孔边缘并与PCB接触的钻头部分，即在其中制造孔的工件; 钻孔部分，其形成在钻头部分的后端，并且具有至少一个用于完成孔表面的铰孔边缘; 以及形成在扩孔器部分的后端上并安装到机床上的柄部分。

    Technique for providing service processor access to control and status registers of a module
    94.
    发明申请
    Technique for providing service processor access to control and status registers of a module 有权
    提供服务处理器访问模块的控制和状态寄存器的技术

    公开(公告)号：US20070240007A1

    公开(公告)日：2007-10-11

    申请号：US11313437

    申请日：2005-12-20

    申请人： Han Kim ,  Wei-Yu Chen

    发明人： Han Kim ,  Wei-Yu Chen

    IPC分类号： G06F1/12

    CPC分类号： G06F1/12

    摘要： A technique for providing service processor (SP) access to registers, e.g., control and status registers (CSRs), located within hardware modules of a computer system, ensures access to the CSRs within a predetermine time period. The computer system includes a host module (HM) and a plurality of client modules (CMs). The CMs each include one or more associated registers, and each of the CMs is separately addressable. At least one of the CMs operates at a different clock frequency than the remaining CMs and includes a clock synchronizer, which provides a clock signal to facilitate reading of or writing to the associated registers of the CM by the HM.

    摘要翻译： 提供服务处理器（SP）访问位于计算机系统的硬件模块内的寄存器（例如控制和状态寄存器（CSR））的技术确保在预定时间段内访问CSR。 计算机系统包括主机模块（HM）和多个客户端模块（CM）。 CM各自包括一个或多个相关联的寄存器，并且每个CM是单独可寻址的。 CM中的至少一个以与剩余的CM不同的时钟频率工作，并且包括时钟同步器，该时钟同步器提供时钟信号以促进HM的相关寄存器的读取或写入。

    CVD apparatus for depositing polysilicon
    95.
    发明申请
    CVD apparatus for depositing polysilicon 审中-公开
    用于沉积多晶硅的CVD装置

    公开(公告)号：US20070128861A1

    公开(公告)日：2007-06-07

    申请号：US11405091

    申请日：2006-04-17

    申请人： Myoung Kim ,  Han Kim ,  Seok Jeong

    发明人： Myoung Kim ,  Han Kim ,  Seok Jeong

    IPC分类号： H01L21/84 ,  H01L21/44 ,  C23C16/00

    CPC分类号： C23C16/44 ,  C23C16/24 ,  H01L27/13 ,  H01L29/6675

    摘要： Disclosed is a CVD apparatus for depositing polysilicon without a separate following annealing process, the CVD apparatus comprising: a chamber to form a thin film on a substrate; a showerhead placed in an upper part of the chamber to inject reaction gas onto the substrate; a distributor formed with distributing holes to uniformly distribute the reaction gas; a catalyst hot wire unit to heat and dissolve the reaction gas injected through the distributing holes of the distributor; a chuck on which the substrate is mounted; a discharging hole to discharge the reaction gas; and a shielding wall provided as a lateral wall of the chamber and formed with a heater to suppress particle generation. With this configuration, the particle generation is minimized and thus the yield is enhanced. Also, the thin film has good crystallinity, and decreased hydrogen content.

    摘要翻译： 公开了一种用于在没有单独的跟随退火工艺的情况下沉积多晶硅的CVD装置，该CVD装置包括：在衬底上形成薄膜的腔室; 放置在所述室的上部的喷头，以将反应气体注入到所述基板上; 形成有分布孔以均匀分布反应气体的分配器; 用于加热和溶解通过分配器的分配孔注入的反应气体的催化剂热丝单元; 安装有基板的卡盘; 用于排出反应气体的排出孔; 以及作为室的侧壁设置的屏蔽壁，并且形成有用于抑制颗粒产生的加热器。 利用这种构造，使颗粒生成最小化，从而提高了产率。 此外，薄膜具有良好的结晶度，并降低了氢含量。

    Inductively coupled plasma processing apparatus
    97.
    发明申请
    Inductively coupled plasma processing apparatus 审中-公开
    电感耦合等离子体处理装置

    公开(公告)号：US20070017637A1

    公开(公告)日：2007-01-25

    申请号：US11489656

    申请日：2006-07-18

    申请人： Kyu Lee ,  Han Kim ,  Do Kim ,  Myoung Kim

    发明人： Kyu Lee ,  Han Kim ,  Do Kim ,  Myoung Kim

    IPC分类号： C23F1/00 ,  C23C16/00

    CPC分类号： H01J37/321

    摘要： An inductively coupled plasma processing apparatus is disclosed. The inductively coupled plasma processing apparatus includes a reaction chamber, a substrate holder for forming a plasma space in the reaction chamber and for supporting a processing substrate therein, a shield provided at the lateral side of the substrate holder, a plurality of openings formed below the substrate, and a linear antenna in the lower portion of the reaction chamber to which a high frequency power signal is applied. Thus, the inductively coupled plasma processing apparatus can uniformly distribute the density of the plasma so that a large-sized flat panel display can be implemented.

    摘要翻译： 公开了一种电感耦合等离子体处理装置。 电感耦合等离子体处理装置包括反应室，用于在反应室中形成等离子体空间并用于在其中支撑处理基板的基板保持件，设置在基板保持器的侧面的屏蔽件， 基板和在其上施加高频功率信号的反应室下部的线性天线。 因此，电感耦合等离子体处理装置可以均匀地分配等离子体的密度，从而可以实现大尺寸的平板显示器。