公开(公告)号：US07092231B2

公开(公告)日：2006-08-15

申请号：US10643167

申请日：2003-08-19

申请人： Martinus Hendricus Hendricus Hoeks ,  Joost Jeroen Ottens

发明人： Martinus Hendricus Hendricus Hoeks ,  Joost Jeroen Ottens

IPC分类号： H02N13/00 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70708 ,  G03F7/707 ,  H01L21/6833

摘要： A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.

摘要翻译： 光刻投影装置设置有静电卡盘。 静电卡盘包括形成在第一表面上的多个销的电介质元件。 通过施加位于与夹紧表面相对的电介质构件的表面上的电极与位于待夹紧物品的夹紧表面上的电极之间的电位差，待夹紧的物品夹在卡盘上的适当位置。 引脚设置有至少一个上导电层，其用于减少约翰森 - 拉贝克效应，允许基板更快地释放。

公开(公告)号：US07030967B2

公开(公告)日：2006-04-18

申请号：US10738987

申请日：2003-12-19

申请人： Robertus Nicodemus Jacobus Van Ballegoij ,  Martinus Agnes Willem Cuijpers ,  Pieter Johannes Gertrudis Meijers ,  Gerardus Petrus Matthijs Van Nunen ,  Joost Jeroen Ottens

发明人： Robertus Nicodemus Jacobus Van Ballegoij ,  Martinus Agnes Willem Cuijpers ,  Pieter Johannes Gertrudis Meijers ,  Gerardus Petrus Matthijs Van Nunen ,  Joost Jeroen Ottens

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A substrate holder has burls having a height not less than 100 μm and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.

摘要翻译： 衬底保持器具有高度不小于100μm的孔，并且至少10个真空端口布置在延伸到衬底半径的三分之一半径的中心区域内。 由此，可以通过在中心区域产生初始真空来可靠地夹紧凹形晶片，该中心区域施加趋于平坦化晶片的夹紧力并允许初始真空加深直到晶片完全夹紧。

公开(公告)号：US07019820B2

公开(公告)日：2006-03-28

申请号：US10735848

申请日：2003-12-16

申请人： Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal

发明人： Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/62 ,  G03B27/58

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation and an article support for supporting an article to be placed in a beam path of the beam of radiation on the article support. The article support has a plurality of supporting protrusions. The plurality of protrusions define a support zone for providing a flat plane of support. A backfill gas feed is arranged in the support zone for providing a backfill gas flow to a backside of the article when supported by the article support, for providing an improved thermal conduction between the article and the article support. According to one aspect of the invention, the support zone is surrounded by a boundary zone having a reduced height relative to the plane of support so that the backfill gas flow is not bounded to the support zone.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统和用于支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑件。 物品支撑件具有多个支撑突起。 多个突起限定用于提供平坦的支撑平面的支撑区域。 在支撑区域中布置有回填气体进料，用于当物品支撑件支撑时提供回填气体到物品的背面，以便在物品和物品支撑件之间提供改进的热传导。 根据本发明的一个方面，支撑区被相对于支撑平面具有减小的高度的边界区包围，使得回填气体流不限于支撑区。

公开(公告)号：US09541843B2

公开(公告)日：2017-01-10

申请号：US13306532

申请日：2011-11-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Joost Jeroen Ottens ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Joost Jeroen Ottens ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

摘要翻译： 公开了一种光刻投影装置和装置制造方法，其中投影系统和基板上的物体之间的空间至少部分地被填充液体。 一旦传感器通过液体，传感器被定位成被辐射束照射。 可以设置边缘密封构件以至少部分地围绕传感器的边缘并且提供面向基本上与传感器的主表面平行的投影系统的主表面。

公开(公告)号：US09488919B2

公开(公告)日：2016-11-08

申请号：US13022397

申请日：2011-02-07

申请人： Takeshi Kaneko ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

发明人： Takeshi Kaneko ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

摘要翻译： 一种用于光刻设备的工作台，具有位于工作台上的编码器板的工作台，编码器板和工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙，以及 一种在间隙表面上具有开口以从间隙提取液体的流体提取系统。

公开(公告)号：US09188882B2

公开(公告)日：2015-11-17

申请号：US13160042

申请日：2011-06-14

申请人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

发明人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

公开(公告)号：US09081299B2

公开(公告)日：2015-07-14

申请号：US13195248

申请日：2011-08-01

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

摘要翻译： 一种曝光装置，包括：液体供应系统，被配置为向所述投影系统和物体之间的空间提供液体，以及具有凹部的可移动台，所述凹部包括所述物体或表面以保持和支撑所述物体，其中， 液体可以进入的间隙开口限定在凹部的周壁和物体之间，并且凹部还包括在间隙开口下方的流体开口，以去除进入间隙开口的液体。

公开(公告)号：US09052612B2

公开(公告)日：2015-06-09

申请号：US12466119

申请日：2009-05-14

申请人： Marcus Martinus Petrus Adrianus Vermeulen ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens

发明人： Marcus Martinus Petrus Adrianus Vermeulen ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens

IPC分类号： G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  G03F1/66 ,  G03B27/53

CPC分类号： G03F7/70691 ,  G03B27/53 ,  G03F1/66 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

摘要： A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.

摘要翻译： 用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分至少布置成 部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。

公开(公告)号：US09013682B2

公开(公告)日：2015-04-21

申请号：US12451749

申请日：2008-06-20

申请人： Rene Theodorus Petrus Compen ,  Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Joost Jeroen Ottens ,  Martin Frans Pierre Smeets

发明人： Rene Theodorus Petrus Compen ,  Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Joost Jeroen Ottens ,  Martin Frans Pierre Smeets

IPC分类号： G03F7/20 ,  H01L21/683 ,  H01L21/687

CPC分类号： G03F7/70783 ,  G03F7/707 ,  H01L21/6838 ,  H01L21/68742 ,  H01L21/6875

摘要： The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.

摘要翻译： 夹紧装置技术领域本发明涉及一种构造成将物体（20,120）夹持在支撑件（1,101）上的夹持装置。 夹紧装置包括：第一装置，其被配置为使用第一力将物体和支撑件彼此远离;以及第二装置，其被配置为使用第二力将物体和支撑件朝向彼此强制。 第一装置和第二装置构造成在完成将物体夹持在支撑件上之前分别同时施加第一力和第二力以将物体成形为期望的形状。

公开(公告)号：US08947631B2

公开(公告)日：2015-02-03

申请号：US13116423

申请日：2011-05-26

申请人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

摘要： A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

摘要翻译： 公开了一种具有与衬底台分开形成的盖板的光刻设备，以及通过控制盖板的温度来稳定衬底台的温度的装置。 公开了一种具有绝热性的光刻设备，其设置在盖板和基板台之间，使得盖板用作基板台的热屏蔽。 公开了一种光刻设备，其包括参考衬底台变形来确定衬底台变形并改善衬底的位置控制的装置。