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公开(公告)号：US08125616B2
公开(公告)日：2012-02-28
申请号：US12325578
申请日：2008-12-01
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Henrikus Herman Marie Cox , Godfried Katharina Hubertus Franciscus Geelen , Jérôme François Sylvain Virgile Van Loo
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Henrikus Herman Marie Cox , Godfried Katharina Hubertus Franciscus Geelen , Jérôme François Sylvain Virgile Van Loo
CPC分类号： G03F7/70716 , G03F7/70991
摘要： A lithographic apparatus includes, in an embodiment, an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a flexible transportation line extending between a first and second part of the apparatus, the second part moveable with respect to the first part, wherein the line is pre-formed in a three-dimensional curve.
摘要翻译： 在一个实施例中，光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及在所述装置的第一和第二部分之间延伸的柔性运输线，所述第二部分可相对于所述第一部分移动，其中所述线预先形成为三维曲线。
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2.发明申请LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS 有权用于校正平面设备阶段的位置的平面设备和方法公开(公告)号：US20110208459A1
公开(公告)日：2011-08-25
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。
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公开(公告)号：US20090290137A1
公开(公告)日：2009-11-26
申请号：US12466119
申请日：2009-05-14
申请人： Marcus Martinus Petrus Adrianus VERMEULEN , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS
发明人： Marcus Martinus Petrus Adrianus VERMEULEN , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS
IPC分类号： G03B27/53
CPC分类号： G03F7/70691 , G03B27/53 , G03F1/66 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/708
摘要： A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.
摘要翻译： 用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分至少布置成 部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。
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4.发明申请Lithographic apparatus, a dryer and a method of removing liquid from a surface 有权平版印刷设备，干燥器和从表面除去液体的方法公开(公告)号：US20080192214A1
公开(公告)日：2008-08-14
申请号：US11984825
申请日：2007-11-21
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus, a Dryer and a Method of Removing Liquid from a Surface A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
摘要翻译： 平版印刷设备，干燥器和从表面去除液体的方法公开了一种干燥和/或润湿表面（例如基底的顶表面）的新方法，其可用于浸没式光刻。 将表面放置在单相萃取器下方，并将启动液体在单相萃取器和表面之间输送。 单相萃取器只有在单相萃取器和表面之间提供了引发液体后才被激活。 在整个干燥和/或润湿过程中，引发液体被输送到单相萃取器。
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5.发明授权Method for displacing a movable element by means of a least two actuators facing each other and positioned on a stator, as well as a wave motor, displacing device and assembly 失效通过面向彼此并定位在定子上的至少两个致动器来移动可移动元件的方法，以及波动马达，位移装置和组件公开(公告)号：US07365473B2
公开(公告)日：2008-04-29
申请号：US10507680
申请日：2003-03-14
IPC分类号： H02N2/00 , H01L41/047 , H03H9/145
摘要： A method for displacing a movable element (3) by means of at least two actuators (4, 5) facing each other on a stator (2). Electrical wave signals are simultaneously applied to at least two actuators facing each other so that oppositely directed waves are generated in the surface of the stator. The two oppositely directed waves form a compound wave in the surface of the stator by means of which the movable element is displaced over a moving area located between the actuators.
摘要翻译： 一种用于通过在定子（2）上彼此面对的至少两个致动器（4,5）来移动可移动元件（3）的方法。 电波信号同时施加到彼此面对的至少两个致动器，使得在定子的表面中产生相反方向的波。 两个相反方向的波在定子的表面中形成复合波，通过该波形，可移动元件在位于致动器之间的移动区域上移位。
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公开(公告)号：US09632425B2
公开(公告)日：2017-04-25
申请号：US11984825
申请日：2007-11-21
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
CPC分类号： G03F7/70341
摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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公开(公告)号：US09052612B2
公开(公告)日：2015-06-09
申请号：US12466119
申请日：2009-05-14
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens
CPC分类号： G03F7/70691 , G03B27/53 , G03F1/66 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/708
摘要： A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.
摘要翻译： 用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分至少布置成 部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。
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8.发明授权Fluid extraction system, lithographic apparatus and device manufacturing method 有权流体萃取系统，光刻设备和装置制造方法公开(公告)号：US08654309B2
公开(公告)日：2014-02-18
申请号：US12634242
申请日：2009-12-09
申请人： Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
发明人： Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
CPC分类号： G03F7/70341 , F01N1/023 , G03F7/709
摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。
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公开(公告)号：US08269949B2
公开(公告)日：2012-09-18
申请号：US12563838
申请日：2009-09-21
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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