公开(公告)号：US09229335B2

公开(公告)日：2016-01-05

申请号：US13361443

申请日：2012-01-30

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US09146478B2

公开(公告)日：2015-09-29

申请号：US13240946

申请日：2011-09-22

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20120127441A1

公开(公告)日：2012-05-24

申请号：US13361443

申请日：2012-01-30

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

摘要翻译： 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。

公开(公告)号：US08138486B2

公开(公告)日：2012-03-20

申请号：US12613846

申请日：2009-11-06

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20100270709A1

公开(公告)日：2010-10-28

申请号：US12836543

申请日：2010-07-14

申请人： Jeroen Johannes Sophia Maria MERTENS ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

发明人： Jeroen Johannes Sophia Maria MERTENS ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC分类号： B29C35/08 ,  B29C35/02

CPC分类号： G03F7/70341

摘要： In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

摘要翻译： 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。

公开(公告)号：US08687168B2

公开(公告)日：2014-04-01

申请号：US13083966

申请日：2011-04-11

申请人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G02B27/42 ,  G02B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US08142852B2

公开(公告)日：2012-03-27

申请号：US12836543

申请日：2010-07-14

申请人： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

发明人： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC分类号： B05D1/32

CPC分类号： G03F7/70341

摘要： In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

摘要翻译： 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。

公开(公告)号：US07929112B2

公开(公告)日：2011-04-19

申请号：US12292329

申请日：2008-11-17

申请人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US07928407B2

公开(公告)日：2011-04-19

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G21K5/10

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US07779781B2

公开(公告)日：2010-08-24

申请号：US10900394

申请日：2004-07-28

申请人： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

发明人： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC分类号： B05C3/02

CPC分类号： G03F7/70341

摘要： In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

摘要翻译： 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。