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公开(公告)号：US08138486B2
公开(公告)日：2012-03-20
申请号：US12613846
申请日：2009-11-06
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US07928407B2
公开(公告)日：2011-04-19
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21K5/10
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20110090474A1
公开(公告)日：2011-04-21
申请号：US12980406
申请日：2010-12-29
申请人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US07633073B2
公开(公告)日：2009-12-15
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US08481978B2
公开(公告)日：2013-07-09
申请号：US13083327
申请日：2011-04-08
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21G5/00
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US08687168B2
公开(公告)日：2014-04-01
申请号：US13083966
申请日：2011-04-11
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US07929112B2
公开(公告)日：2011-04-19
申请号：US12292329
申请日：2008-11-17
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US07468779B2
公开(公告)日：2008-12-23
申请号：US11167563
申请日：2005-06-28
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US20090073408A1
公开(公告)日：2009-03-19
申请号：US12292329
申请日：2008-11-17
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 平版印刷设备和设备制造方法公开了一种光刻投影设备，其中采取措施来防止或减少投影光束通过其流出的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US20110188015A1
公开(公告)日：2011-08-04
申请号：US13083966
申请日：2011-04-11
申请人： Roelof Frederik DE GRAAF , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik DE GRAAF , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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