摘要:
An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
摘要:
In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (107), multiple data for matching are created for each alignment pattern (108), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image (113) based on an image signal from the optical microscope (114), and the amount of position shift and the amount of rotation of the wafer are calculated (116) on the basis of the results of matching (115).
摘要:
In order to obtain a quality image without deterioration owing to radiation noise in inspection using the optical video camera in high radiation environment, an inspection apparatus is formed of an image pick-up unit, an image obtaining unit which fetches a video image that contains a signal (noise) that is substantially independent of each frame obtained by the image pick-up unit, a local alignment unit which locally aligns frames with different time phases for forming the image fetched by the image obtaining unit, a frame synthesizing unit which synthesizes the plurality of frames aligned by the local alignment unit for generating a synthesis frame with an SN ratio higher than the SN ratio of the frame before frame synthesis, and an image output unit for displaying or recording the image formed of the synthesis frame generated by the frame synthesizing unit.
摘要:
A charged particle orbit control device (100) is used in a ring-shaped charged particle accelerator or a charged particle storage ring. The charged particle orbit control device (100) is configured to enable the orbit of a charged particle to return to the original orbit in multiple cycles. The charged particle orbit control device (100) includes multiple bending magnets (1) that bend the charged particle (3). In the charged particle orbit control device (100), the bending angle and relative position of each bending magnet (1) are prescribed such that every time the charged particle (3) passes through, the orbit of the charged particle (3) in each bending magnet (1) alternately switches between two orbits.
摘要:
A charged particle orbit control device (100) is used in a ring-shaped charged particle accelerator or a charged particle storage ring. The charged particle orbit control device (100) is configured to enable the orbit of a charged particle to return to the original orbit in multiple cycles. The charged particle orbit control device (100) includes multiple bending magnets (1) that bend the charged particle (3). In the charged particle orbit control device (100), the bending angle and relative position of each bending magnet (1) are prescribed such that every time the charged particle (3) passes through, the orbit of the charged particle (3) in each bending magnet (1) alternately switches between two orbits.
摘要:
The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.
摘要:
The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.
摘要:
In an ultrasonic diagnosis device, while a signal component is preserved, a factor of degrading image quality such as a flicker of a noise is suppressed. An input image is separated into a signal component image and a noise component image. After frame synthesis processing is performed on the noise component image, the signal component image is synthesized with the noise component image having undergone the frame synthesis. Thus, the noise is suppressed. Otherwise, after the input image is separated into the signal component image and noise component image, the frame synthesis processing is performed on the signal component image. The noise component image is then synthesized with the signal component image having undergone the frame synthesis. Thus, discernment of a signal can be improved.
摘要:
In order to obtain a quality image without deterioration owing to radiation noise in inspection using the optical video camera in high radiation environment, an inspection apparatus is formed of an image pick-up unit, an image obtaining unit which fetches a video image that contains a signal (noise) that is substantially independent of each frame obtained by the image pick-up unit, a local alignment unit which locally aligns frames with different time phases for forming the image fetched by the image obtaining unit, a frame synthesizing unit which synthesizes the plurality of frames aligned by the local alignment unit for generating a synthesis frame with an SN ratio higher than the SN ratio of the frame before frame synthesis, and an image output unit for displaying or recording the image formed of the synthesis frame generated by the frame synthesizing unit.
摘要:
In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.