公开(公告)号：US5817185A

公开(公告)日：1998-10-06

申请号：US976262

申请日：1997-11-21

申请人： Naoki Shindo ,  Shigenori Kitahara ,  Takayuki Toshima ,  Kenji Yokomizo

发明人： Naoki Shindo ,  Shigenori Kitahara ,  Takayuki Toshima ,  Kenji Yokomizo

IPC分类号： H01L21/00 ,  H01L21/306 ,  H01L21/677 ,  B08B13/00

CPC分类号： H01L21/67057 ,  H01L21/02052 ,  H01L21/67051 ,  H01L21/67781 ,  Y10S134/902 ,  Y10S414/137

摘要： A method of washing substrates arranged at a substantially equal pitch internal in a cassette which includes steps of (a) transferring the substrates to a holder a pitch interval narrower than the arrangement pitch interval in said cassette; (b) supplying a washing solution into a processing bath; (c) conveying the holder holding the substrates into the processing bath; (d) dipping the substrates in the washing solution in the processing bath to wash the substrates; and (e) supplying a rinse solution into the processing bath to substitute the washing solution with the rinse solution to rinse the substrates in the processing bath.

摘要翻译： 一种洗涤在盒子内部以基本相同的间距排列的衬底的方法，包括以下步骤：（a）将衬底转移到保持器，该间距间隔窄于所述盒中的布置间距间隔; （b）将洗涤溶液供应到处理槽中; （c）将保持基板的支架输送到处理槽中; （d）将基材浸入处理槽中的洗涤溶液中以洗涤基材; 和（e）将冲洗溶液供应到处理槽中以用冲洗溶液替换洗涤溶液以冲洗处理槽中的基底。

公开(公告)号：US5633040A

公开(公告)日：1997-05-27

申请号：US246817

申请日：1994-05-20

申请人： Takayuki Toshima ,  Tohru Aoyama

发明人： Takayuki Toshima ,  Tohru Aoyama

IPC分类号： B05D1/00 ,  B05D3/04 ,  G03F7/16 ,  B05D3/02 ,  B05D3/12

CPC分类号： G03F7/168 ,  B05D3/0466 ,  B05D3/0486 ,  B05D1/005

摘要： A film treating method treats a resist film which is formed on a substrate by spin coating. The method comprises a step for coating resist on the substrate to form the resist film, a step for conveying the substrate to a region having an atmosphere of a saturated vapor or a super-saturated vapor of solvent before the solvent contained in the resist film is lost, a step for executing a first heating process wherein the substrate is heated at a temperature which lowers the viscosity of the resist film and permits solvent to remain in the resist film in an amount sufficient to maintain the fluidity of the resist film, a step for conveying the substrate away from the region having the atmosphere of the saturated vapor or the super-saturated vapor of solvent, and a step for executing a second heating process wherein the substrate is heated at a temperature higher than that of the first heating process, thereby permitting the solvent to evaporate from the resist film.

摘要翻译： 膜处理方法通过旋涂处理在基板上形成的抗蚀剂膜。 该方法包括在基板上涂覆抗蚀剂以形成抗蚀剂膜的步骤，在抗蚀剂膜中包含的溶剂是在基板上传送到具有饱和蒸气或溶剂的超饱和蒸气的区域的区域的步骤 丢失，执行第一加热过程的步骤，其中在降低抗蚀剂膜的粘度的温度下加热基板并允许溶剂以足以保持抗蚀剂膜的流动性的量保留在抗蚀剂膜中的步骤，步骤 用于将衬底远离具有饱和蒸汽气氛或溶剂的超饱和蒸气的区域，以及用于执行第二加热过程的步骤，其中衬底在比第一加热过程高的温度下被加热， 从而允许溶剂从抗蚀剂膜蒸发。