OXIDE FILM DEPOSITION METHOD AND OXIDE FILM DEPOSITION DEVICE
    8.
    发明申请
    OXIDE FILM DEPOSITION METHOD AND OXIDE FILM DEPOSITION DEVICE 有权
    氧化膜沉积方法和氧化膜沉积装置

    公开(公告)号:US20140141170A1

    公开(公告)日:2014-05-22

    申请号:US14131128

    申请日:2011-09-13

    Abstract: The present invention provides a method for forming an oxide film by which normal formation of an oxide film is always achieved without receiving an influence of a change in the atmosphere, a metal oxide film having a low resistance can be formed, and a high efficiency of film formation is obtained. In the present invention, a raw material solution containing an alkyl compound is formed into a mist and ejected to a substrate (100) in the atmosphere. Additionally, an oxidizing agent that exerts an oxidizing effect on the alkyl compound is supplied to the mist of the raw material solution. Through the above-described processes, an oxide film is formed on the substrate in the present invention.

    Abstract translation: 本发明提供一种形成氧化膜的方法,其中始终实现氧化膜的正常形成而不受到大气变化的影响,可以形成具有低电阻的金属氧化物膜,并且高效率 获得成膜。 在本发明中,将含有烷基化合物的原料溶液形成为雾状并喷射到大气中的基板(100)上。 另外,向原料溶液的雾中供给对烷基化合物发挥氧化作用的氧化剂。 通过上述工序,在本发明的基板上形成氧化膜。

    Method for coating a component
    9.
    发明授权
    Method for coating a component 失效
    涂层成分的方法

    公开(公告)号:US08652585B2

    公开(公告)日:2014-02-18

    申请号:US13144534

    申请日:2009-12-18

    Applicant: Rainer Roeck

    Inventor: Rainer Roeck

    Abstract: The invention relates to a method for coating a component (16), wherein the component (16) is provided with at least one coating layer that can be cured by applying UV light, said layer having UV light applied thereto in an exposure chamber (14) comprising a substantially spherical or ellipsoidal interior (18), wherein the at least one coating layer is applied to the component (16) in a coating chamber (12) comprising the exposure chamber (14).

    Abstract translation: 本发明涉及一种涂覆组分(16)的方法,其中组分(16)设置有至少一个可通过施加UV光固化的涂层,所述层在曝光室(14)中施加有UV光 )包括基本上球形或椭圆形的内部(18),其中所述至少一个涂层在包括所述曝光室(14)的涂布室(12)中被施加到所述部件(16)。

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