公开(公告)号：US20050219707A1

公开(公告)日：2005-10-06

申请号：US11097398

申请日：2005-04-01

申请人： Karl-Heinz Schuster ,  Hans-Juergen Rostalski ,  Aurelian Dodoc

发明人： Karl-Heinz Schuster ,  Hans-Juergen Rostalski ,  Aurelian Dodoc

IPC分类号： G02B3/00 ,  G02B3/12 ,  G02B13/14 ,  G02B27/00 ,  G03F7/20

CPC分类号： G03F7/70266 ,  G02B3/12 ,  G02B13/143 ,  G02B27/0068 ,  G03F7/70883 ,  G03F7/70958

摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.

摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。

公开(公告)号：US20050178944A1

公开(公告)日：2005-08-18

申请号：US11102818

申请日：2005-04-11

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G01B11/00 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G02B7/04

CPC分类号： G03F9/7026 ,  G02B7/28

摘要： A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface. The system for coupling the measuring beam in and the system for coupling it out are configured such that the measuring beam is reflected at least once at the substrate surface and at least once at a reflecting surface of the imaging system that reflects the light employed for measurement purposes before the measuring beam enters the system for coupling it out, which allows employing the image side of the imaging system as part of the focus-detection system. The focus-detection system also operates reliably when used on ultrahigh-aperture lenses that have correspondingly short working distances.

摘要翻译： 微光刻投影照明系统具有聚焦检测系统，用于光学地检测投影透镜的图像平面与布置在其图像平面附近的基板的上表面的偏差。 焦点检测系统具有用于耦合到至少一个测量光束的系统，所述至少一个测量光束倾斜地入射到衬底表面上并将其反射到成像系统的最终光学表面与衬底表面之间的中间区域中， 用于耦合出测量光束并在其在衬底表面处的反射之后检测它的系统。 用于耦合测量光束的系统和用于耦合测量光束的系统被配置为使得测量光束在基板表面处被反射至少一次，并且至少在反射用于测量的光的成像系统的反射表面反射一次 测量光束进入系统以将其耦合出来的目的，这允许将成像系统的像侧作为焦点检测系统的一部分。 当使用具有相应较短工作距离的超高孔径镜头时，对焦检测系统也可靠地运行。

公开(公告)号：US20050141098A1

公开(公告)日：2005-06-30

申请号：US10935321

申请日：2004-09-08

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B13/24 ,  G02B13/14 ,  G02B13/18 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B9/00

CPC分类号： G02B13/143 ,  G03F7/70241 ,  G03F7/70341

摘要： A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA≧0.85, if appropriate of NA≧1.

摘要翻译： 具有多个光学元件的非常高孔径的纯折射投影物镜具有在像平面前方以间隔排列的系统光阑（5）。 靠近投影物镜的像面（3）的光学元件是具有基本上球形的入射表面和基本上平坦的出射表面的平凸透镜（34）。 平凸透镜的直径至少为系统隔膜（5）的膜片直径的50％。 优选仅在系统隔膜（5）和图像平面（3）之间布置正透镜（32,33,34）。 在NA> = 0.85的非常高的孔径的情况下，如果NA> = 1，光学系统允许成像。

公开(公告)号：US20050134825A1

公开(公告)日：2005-06-23

申请号：US10913575

申请日：2004-08-09

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B27/28 ,  G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70075 ,  G02B27/283 ,  G03F7/70566 ,  G03F7/70958

摘要： An illumination system for a projection exposure machine, operating with ultraviolet light, for microlithography has an angle-conserving light mixing device with at least one integrator rod that has an entrance surface for receiving light from a light source, and an exit surface for outputting exit light mixed by the integrator rod. At least one prism arrangement for receiving exit light and for varying the state of polarization of the exit light is placed downstream of the integrator rod. A preferred prism arrangement has a polarization splitter surface, aligned transversely to the direction of propagation of the exit light, which passes light fractions with p-polarization without hindrance, and reflects fractions with s-polarization. The separated beams with orthogonal polarization are parallelized by means of a reflecting surface aligned parallel to the polarization splitter surface, and the same state of polarization is set for both partial beams by means of a suitable retarder.

摘要翻译： 一种用于微光刻的用于紫外光的投影曝光机的照明系统具有角度保守的光混合装置，其具有至少一个积分杆，该积分杆具有用于接收来自光源的光的入射表面和用于输出出射的出射表面 光通过积分杆混合。 用于接收出射光并用于改变出射光的偏振状态的至少一个棱镜装置被放置在积分杆的下游。 优选的棱镜装置具有偏振分离器表面，其横向于出射光的传播方向对准，其以无偏振的方式通过具有p-偏振的光分数，并且反射具有s偏振的分数。 具有正交偏振的分离的光束通过平行于偏振分离器表面的反射表面平行化，并且通过合适的延迟器为两个部分光束设置相同的偏振状态。

公开(公告)号：US06878916B2

公开(公告)日：2005-04-12

申请号：US10210051

申请日：2002-08-02

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G01B11/00 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G02B27/40

CPC分类号： G03F9/7026 ,  G02B7/28

摘要： A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface. The system for coupling the measuring beam in and the system for coupling it out are configured such that the measuring beam is reflected at least once at the substrate surface and at least once at a reflecting surface of the imaging system that reflects the light employed for measurement purposes before the measuring beam enters the system for coupling it out, which allows employing the image side of the imaging system as part of the focus-detection system. The focus-detection system also operates reliably when used on ultrahigh-aperture lenses that have correspondingly short working distances.

摘要翻译： 微光刻投影照明系统具有聚焦检测系统，用于光学地检测投影透镜的图像平面与布置在其图像平面附近的基板的上表面的偏差。 焦点检测系统具有用于耦合到至少一个测量光束的系统，所述至少一个测量光束倾斜地入射到衬底表面上并将其反射到成像系统的最终光学表面与衬底表面之间的中间区域中， 用于耦合出测量光束并在其在衬底表面处的反射之后检测它的系统。 用于耦合测量光束的系统和用于耦合测量光束的系统被配置为使得测量光束在基板表面处被反射至少一次，并且至少在反射用于测量的光的成像系统的反射表面反射一次 测量光束进入系统以将其耦合出来的目的，这允许将成像系统的像侧作为焦点检测系统的一部分。 当使用具有相应较短工作距离的超高孔径镜头时，对焦检测系统也可靠地运行。

公开(公告)号：US06366410B1

公开(公告)日：2002-04-02

申请号：US09125621

申请日：1999-08-12

申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster

发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster

IPC分类号： G02B300

CPC分类号： G03F7/70066 ,  G02B13/143 ,  G03F7/70225

摘要： A REMA objective is realized by introduction of a few (1 to 5 units) aspherical surfaces of high-quality correction with a low number of lenses (no more than 10), and low path in glass (maximum 25% to 30%) of the object-reticle distance, thus enhancing efficiency.

摘要翻译： REMA的目标是通过引入低质量校正的几个（1至5个单位）非球面表面，具有低数量的透镜（不超过10个）和玻璃中的低通道（最大25％至30％）的 对象 - 标线距离，从而提高效率。

公开(公告)号：US5357341A

公开(公告)日：1994-10-18

申请号：US912285

申请日：1992-07-13

申请人： Michael Kuchel ,  Karl-Heinz Schuster ,  Klaus Freischlad

发明人： Michael Kuchel ,  Karl-Heinz Schuster ,  Klaus Freischlad

IPC分类号： G01B9/021 ,  G01B9/02

CPC分类号： G01B9/02007 ,  G01B9/02057 ,  G01B9/02069 ,  G01B9/02087 ,  G01B2290/45 ,  G01B2290/70

摘要： The invention relates to an evaluation method for interferograms and an interferometer corresponding thereto with which tile influence of coherent noise is reduced with simultaneously high interference contrast. Several phase maps are computed from interferograms which are recorded with coherent light. The interferogram components of the test object and the interferogram components of the coherent noise are displaced relative to each other in the camera plane between recording the interferograms. The influence of the coherent noise is suppressed by subsequently averaging the phase maps.

摘要翻译： 本发明涉及一种用于干涉图的评估方法和与之对应的干涉仪，其中相干噪声的瓦片影响同时具有高的干涉对比度而降低。 用相干光记录的干涉图计算出几个相位图。 测试对象的干涉图分量和相干噪声的干涉图分量在记录干涉图之间在相机平面中相对于彼此移位。 随后对相位图进行平均，抑制相干噪声的影响。

公开(公告)号：US07764427B2

公开(公告)日：2010-07-27

申请号：US11614536

申请日：2006-12-21

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B5/30

CPC分类号： G02B5/3083 ,  G03F7/70191 ,  G03F7/70566 ,  G03F7/70966

摘要： An optical system, such as, for example, an illumination system or a projection lens of a microlithographic exposure system. The optical system can have an optical axis and include at least one optical element that includes an optically uniaxial material having, for an operating wavelength of the optical system, an ordinary refractive index no and an extraordinary refractive index ne. The extraordinary refractive index ne can be larger than the ordinary refractive index no. The optical element can absorb, at least for light rays of the operating wavelength entering the optical element with respect to the optical axis under an angle of incidence that lies within a certain angle region, a p-polarized component of the light rays significantly stronger than a s-polarized component of the light rays.

摘要翻译： 光学系统，例如微光刻曝光系统的照明系统或投影透镜。 光学系统可以具有光轴并且包括至少一个光学元件，其包括光学单轴材料，其对于光学系统的工作波长具有普通的折射率no和非常折射率ne。 非常折射率ne可以大于普通折射率no。 光学元件至少可以吸收相对于光轴进入光学元件的工作波长的光线，其入射角位于一定角度范围内，光线的p偏振分量明显强于 光线的s偏振分量。

公开(公告)号：US07456408B2

公开(公告)日：2008-11-25

申请号：US12009984

申请日：2008-01-23

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC分类号： G02B27/14 ,  G02B5/30 ,  G02B17/00

CPC分类号： B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

摘要： There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

公开(公告)号：US07443948B2

公开(公告)日：2008-10-28

申请号：US11345880

申请日：2006-02-02

申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

IPC分类号： G21K5/04

CPC分类号： G02B3/0043 ,  B82Y10/00 ,  G02B3/0062 ,  G02B17/0657 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K1/06 ,  G21K1/062

摘要： There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

摘要翻译： 提供照明系统。 所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件 栅格元素和位于其上的第四光栅元素。 第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。 第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。 第二距离与第一距离不同。