公开(公告)号：US20070218406A1

公开(公告)日：2007-09-20

申请号：US11717618

申请日：2007-03-14

申请人： Kazuyoshi Mizutani ,  Kaoro Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

发明人： Kazuyoshi Mizutani ,  Kaoro Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

IPC分类号： G03C1/00

CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

公开(公告)号：US20070072121A1

公开(公告)日：2007-03-29

申请号：US11529442

申请日：2006-09-29

申请人： Kazuyoshi Mizutani

发明人： Kazuyoshi Mizutani

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046

摘要： A positive resist composition including: (A-1) a resin of which a solubility in an alkali developer increases under the action of an acid, the resin including a repeating unit represented by formula (Ia) and a repeating unit represented by formula (A1); and (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation: wherein in the formula (Ia), AR represents an aromatic group, and X1 represents a group having a carbon number of 5 or more and being capable of decomposing under the action of an acid, and in the formula (A1), m represents an integer of one of 1 and 2.

摘要翻译： 一种正型抗蚀剂组合物，其包含：（A-1）在酸性作用下在碱性显影剂中的溶解度增加的树脂，所述树脂包含由式（Ia）表示的重复单元和由式（A1）表示的重复单元 ）; 和（B）能够在用光化射线和辐射之一照射时产生酸的化合物：其中在式（Ia）中，AR表示芳族基团，X 1表示具有 碳数为5以上，能够在酸的作用下分解，在式（A1）中，m表示1和2之一的整数。

公开(公告)号：US20060147837A1

公开(公告)日：2006-07-06

申请号：US11359424

申请日：2006-02-23

申请人： Hyou Takahashi ,  Shoichiro Yasunami ,  Kazuyoshi Mizutani

发明人： Hyou Takahashi ,  Shoichiro Yasunami ,  Kazuyoshi Mizutani

IPC分类号： G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0045 ,  G03F7/0392

摘要： The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter ion, the compound generating an acid upon irradiation of actinic rays or radiation.

摘要翻译： 本发明的抗蚀剂组合物，通过照射光化射线或辐射，特别是电子束，X射线或EUV光，确保了用于形成图案的优异的图案形状和优异的隔离性能，其包含（A）具有 特定的部分结构和抗衡离子，该化合物在光化射线或辐射照射时产生酸。

公开(公告)号：US06506535B1

公开(公告)日：2003-01-14

申请号：US09698221

申请日：2000-10-30

申请人： Kazuyoshi Mizutani ,  Kenichiro Sato ,  Kunihiko Kodama

发明人： Kazuyoshi Mizutani ,  Kenichiro Sato ,  Kunihiko Kodama

IPC分类号： G03C172

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106

摘要： Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is a positive working photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (B) an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), (C) at least one solvent capable of dissolving the components (A) and (B), (D) an organic basic compound and (E) at least one surfactant selected from fluorine-containing surfactants, silicon-containing surfactants and nonionic surfactants:

摘要翻译： 公开了一种正性光致抗蚀剂组合物，其包含至少含有由下式（I）表示的重复单元和至少一种由下式（IIa）或（IIb）表示的重复单元的酸可分解聚合物，并且还公开 是一种正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物，（B）至少含有由下式（I）表示的重复单元的酸可分解聚合物和至少 由下式（IIa）或（IIb）表示的一个重复单元，（C）至少一种能够溶解组分（A）和（B）的溶剂，（D）有机碱性化合物和（E） 一种选自含氟表面活性剂，含硅表面活性剂和非离子表面活性剂的表面活性剂：

公开(公告)号：US06399269B2

公开(公告)日：2002-06-04

申请号：US09397117

申请日：1999-09-16

申请人： Kazuyoshi Mizutani ,  Makoto Momota

发明人： Kazuyoshi Mizutani ,  Makoto Momota

IPC分类号： G03F709

CPC分类号： G03F7/091

摘要： A bottom anti-reflective coating material composition for a photoresist comprising the following components (a) to (d): (a) a polymer containing a dye structure having a molar extinction coefficient of 1.0×104 or more to light including a wavelength used for exposure of the photoresist; (b) a thermal crosslinking agent which is activated by an acid to react with component (a) described above, thereby forming a crosslinked structure; (c) a sulfonic acid ester compound or diaryl iodonium salt, which is decomposed to generate an acid with heating at temperature between 150 to 200° C.; and (d) an organic solvent capable of dissolving components (a) to (c) described above. The bottom anti-reflective coating material composition for a photoresist provides a bottom anti-reflective coating having a large absorbance to light including a wavelength used for exposure, and an adverse effect due to a standing wave generated by reflection from a substrate can be reduced, a limiting resolution of the photoresist is increased, and a good resist profile is obtained. A method of forming a resist pattern using the composition is also disclosed.

摘要翻译： 一种用于光致抗蚀剂的底部抗反射涂料组合物，其包含以下组分（a）至（d）：（a）含有具有摩尔吸光系数为1.0×10 4或更高的染料结构的聚合物，其包含用于曝光的波长 的光致抗蚀剂;（b）由酸活化以与上述组分（a）反应的热交联剂，由此形成交联结构;（c）磺酸酯化合物或二芳基碘鎓盐，其分解成 在150〜200℃的温度下加热生成酸。 和（d）能够溶解上述组分（a）至（c）的有机溶剂。用于光致抗蚀剂的底部抗反射涂料组合物提供具有大的吸光度的底部抗反射涂层，其包括用于 曝光以及由于从基板反射产生的驻波产生的不利影响，可以降低光致抗蚀剂的极限分辨率，获得良好的抗蚀剂图。 还公开了使用该组合物形成抗蚀剂图案的方法。

公开(公告)号：US06248500B1

公开(公告)日：2001-06-19

申请号：US09499703

申请日：2000-02-07

申请人： Kazuyoshi Mizutani ,  Hiroshi Yoshimoto

发明人： Kazuyoshi Mizutani ,  Hiroshi Yoshimoto

IPC分类号： G03F711

CPC分类号： G03F7/091

摘要： A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having specific structure, and optionally a melamine, guanamine, urea, phenol, naphthol or hydroxyanthracene compound substituted by at least one group selected from the group consisting of a methylol group and an alkoxymethyl group at two or more positions. The composition for anti-reflective coating material of the present invention is effective for the reduction of adverse effects of reflection by the substrate in a lithographic process using various radiations. A resist pattern formation process which comprises the use of the composition for anti-reflective coating material is also disclosed.

摘要翻译： 公开了一种抗反射涂层材料的组合物，其包含具有特定结构的重复单元的高分子化合物，以及任选的三聚氰胺，胍胺，脲，苯酚，萘酚或羟基蒽化合物，被至少一种选自以下的基团所取代： 羟甲基和烷氧基甲基。 本发明的抗反射涂层材料的组合物对于在使用各种辐射的光刻工艺中减少基板反射的不利影响是有效的。 还公开了包括使用抗反射涂层材料用组合物的抗蚀图案形成方法。

公开(公告)号：US6165684A

公开(公告)日：2000-12-26

申请号：US997393

申请日：1997-12-23

申请人： Kazuyoshi Mizutani ,  Makoto Momota

发明人： Kazuyoshi Mizutani ,  Makoto Momota

IPC分类号： G03F7/09 ,  G03F7/11

CPC分类号： G03F7/091

摘要： A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.

摘要翻译： 用于底部抗反射涂层材料的组合物和使用该组合物形成抗蚀剂图案的方法，其干蚀刻速率高，分辨率高，抗蚀剂膜厚度依赖性优异，防止效果高 公开了防曝光的反射光，并且不提供与光致抗蚀剂层的混合，其中用于底部抗反射涂层材料的组合物包含具有特定结构的含萘基的聚合物化合物。

公开(公告)号：US5216105A

公开(公告)日：1993-06-01

申请号：US550446

申请日：1992-07-10

申请人： Toshiaki Aoai ,  Kazuyoshi Mizutani

发明人： Toshiaki Aoai ,  Kazuyoshi Mizutani

IPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/075

CPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/0757 ,  Y10S430/122 ,  Y10S430/126

摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.