公开(公告)号：US20040137831A1

公开(公告)日：2004-07-15

申请号：US10744761

申请日：2003-12-23

申请人： 3M Innovative Properties Company

发明人： Jeffrey S. Kollodge ,  Christopher N. Loesch

IPC分类号： B24B007/22

CPC分类号： B24B37/245 ,  B24B37/22 ,  B24B37/24 ,  B24D11/00

摘要： The present invention is directed to an abrasive article comprising a fixed abrasive layer and a subpad. The fixed abrasive element is co-extensive with the subpad. The subpad comprises a resilient element. The resilient element has a Shore A hardness of no greater than 60 as measured using ASTM-2240.

摘要翻译： 本发明涉及一种包括固定研磨层和子垫的研磨制品。 固定的研磨元件与子垫共同扩展。 子板包括弹性元件。 使用ASTM-2240测量的弹性元件的肖氏A硬度不大于60。

公开(公告)号：US20040053042A1

公开(公告)日：2004-03-18

申请号：US10451167

申请日：2003-06-19

发明人： Hiroyuki Eguchi

IPC分类号： B32B005/16

CPC分类号： G11B5/8408 ,  B24D3/32 ,  B24D11/00 ,  B24D13/147 ,  C08J7/047 ,  Y10T428/25 ,  Y10T428/254

摘要： A wiping film having a flexible film backing, and a wiping layer formed on one surface of the backing, wherein the wiping layer is composed of a binder and plastic particles dispersed therein. The wiping film is useful for removing foreign matter and loose lubricant from the treatment surface of a magnetic disk without generating any scratches or fiber particles thereon.

摘要翻译： 具有柔性膜背衬的擦拭膜和形成在背衬的一个表面上的擦拭层，其中擦拭层由分散在其中的粘合剂和塑料颗粒构成。 擦拭膜可用于从磁盘的处理表面去除异物和松散的润滑剂，而不会在其上产生任何划痕或纤维颗粒。

公开(公告)号：US20040038613A1

公开(公告)日：2004-02-26

申请号：US10648094

申请日：2003-08-26

申请人： 3M Innovative Properties Company

发明人： Lawrence J. Mann ,  Phillip M. Winter

IPC分类号： B32B027/04 ,  D04H001/00 ,  B32B027/12 ,  B32B005/02 ,  D04H003/00

CPC分类号： B24D11/00 ,  B24B29/02 ,  D06N3/0011 ,  D06N2205/04 ,  D06N2205/10 ,  Y10T428/249986 ,  Y10T442/2508 ,  Y10T442/2525 ,  Y10T442/2738 ,  Y10T442/60 ,  Y10T442/674 ,  Y10T442/682 ,  Y10T442/689 ,  Y10T442/696 ,  Y10T442/697 ,  Y10T442/699

摘要： Cleaning articles comprising a nonwoven web or foam, binder, and organic particles. In another aspect, the present invention provides a method for cleaning soiled surfaces utilizing cleaning articles comprising a nonwoven web or foam, binder, and optionally organic particles

摘要翻译： 包括非织造纤维网或泡沫，粘合剂和有机颗粒的清洁物品。 在另一方面，本发明提供了一种利用包括非织造纤维网或泡沫，粘合剂和任选的有机颗粒的清洁制品来清洁污染表面的方法

公开(公告)号：US06595833B2

公开(公告)日：2003-07-22

申请号：US09874536

申请日：2001-06-04

申请人： Gundu M. Sabde ,  Scott Meikle

发明人： Gundu M. Sabde ,  Scott Meikle

IPC分类号： B24B100

CPC分类号： B24B37/245 ,  B24B21/004 ,  B24B37/04 ,  B24D11/00 ,  H01L21/3212 ,  H01L21/7684 ,  Y10S977/777 ,  Y10S977/883 ,  Y10S977/888

摘要： A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the apparatus can include a fixed abrasive polishing pad having metal abrasive elements selected to be a compound of metal in the substrate. Alternatively, the metal abrasive elements can include a refractory metal where the substrate includes a refractory metal. Where the substrate includes two metals, the abrasive elements can be selected to planarize the first metal at a rate that is less than approximately twice the rate at which it planarizes the second metal. A single fixed abrasive polishing pad and a single planarizing liquid can be used to planarize both metals.

公开(公告)号：US06575824B2

公开(公告)日：2003-06-10

申请号：US09867535

申请日：2001-05-31

申请人： Hideto Kuramochi ,  Satoshi Kondoh ,  Yoshinori Harada ,  Mutsumi Asano

发明人： Hideto Kuramochi ,  Satoshi Kondoh ,  Yoshinori Harada ,  Mutsumi Asano

IPC分类号： B24D1100

CPC分类号： B24B37/24 ,  B24D11/00

摘要： An abrasive molding comprising at least 90% by weight, based on the abrasive molding, of an inorganic material having a stock hardness of 50-400 kg/mm2, and said abrasive molding having a relative density of 20-70% and an average particle diameter of 0.001-50 &mgr;m. The abrasive molding preferably has pores having a pore size distribution such that the integrated pore volume of pores having a diameter of 0.01-1 &mgr;m is at least 20% of the integrated total pore volume of the entire pores, and the integrated pore volume of pores having a diameter of 1-360 &mgr;m is in the range of 10% to 70% of the integrated total pore volume of the entire pores. The abrasive molding is suitable for polishing a material having a Vickers hardness not larger than 300 kg/mm2.

公开(公告)号：US06575821B2

公开(公告)日：2003-06-10

申请号：US09838770

申请日：2001-04-19

申请人： Peter Jöst

发明人： Peter Jöst

IPC分类号： B24D1100

CPC分类号： B24B55/08 ,  B24D11/00

摘要： An abrasive belt for a belt grinding machine has a support layer, an intermediate layer connected to the support layer, and an abrasive layer connected to the intermediate layer. The support layer transmits a drive output of the belt grinding machine onto the abrasive layer. The abrasive layer allows flow of grinding particles through the abrasive layer. The intermediate layer also allows flow of the grinding particles through the intermediate layer, and the support layer allows flow of the grinding particles through the support layer.

公开(公告)号：US20030101658A1

公开(公告)日：2003-06-05

申请号：US10200466

申请日：2002-07-18

申请人： Nihon Microcoating Co., Ltd.

发明人： Hisatomo Ohno ,  Toshihiro Izumi

IPC分类号： C09C001/68

CPC分类号： C03C19/00 ,  B24D3/28 ,  B24D11/00 ,  B24D11/001

摘要： A polishing film is formed by treating silica particles with heat at 100-400null C. for 4-48 hours and a polishing layer with no internal holes and a thickness of 50 nullm or greater, containing 50-85 weight % of such heat-treated silicon particles is formed by fixing these silica particles with a binder resin.

摘要翻译： 通过在100-400℃下加热二氧化硅颗粒处理4-48小时的抛光层和不含内孔和厚度为50μm以上的抛光层，形成抛光膜，其中含有50-85重量％的热处理 通过用粘合剂树脂固定这些二氧化硅颗粒来形成硅颗粒

公开(公告)号：US06565425B1

公开(公告)日：2003-05-20

申请号：US09806100

申请日：2001-05-17

申请人： Steffen Wuensch

发明人： Steffen Wuensch

IPC分类号： B24B2100

CPC分类号： B24B21/12 ,  B24B23/06 ,  B24D11/00

摘要： A power belt sander (10) with a housing (11), which contains means for driving a sanding belt (24) which can be continuously guided by means of a drive roller (23), preferably also by means of a deflection roller (22), is less costly, lighter in weight, and more efficient due to the fact that the sanding belt (24) is supported by a toothed sanding belt (21), wherein the toothed sanding belt (21) is oriented with its toothed side (25) toward the drive roller (23), preferably the guide roller (22).

摘要翻译： 一种具有壳体（11）的动力带砂光机（10），其包含用于驱动可以通过驱动辊（23）连续引导的砂带（24）的装置，优选地也可借助于偏转辊（22） ），由于砂带（24）由齿形砂带（21）支撑的事实，成本较低，重量更轻，效率更高，其中齿形砂带（21）的齿形侧（ 25）朝向驱动辊（23），优选地为导辊（22）。

公开(公告)号：US20030046874A1

公开(公告)日：2003-03-13

申请号：US10117589

申请日：2002-04-05

发明人： Yong-Bum Kim

IPC分类号： B24D003/00 ,  B24D003/28

CPC分类号： B24D11/00 ,  B24D3/34

摘要： A method for preparing an abrasive article of the present invention comprises coating a conductive binder resin on one surface of a cylinder paper or greige cloth, coating abrasive particles on one side of a PET or nylon film, and combining the coated surface of the cylinder paper or greige cloth with the other side of the PET or nylon film.

摘要翻译： 制备本发明的磨料制品的方法包括在圆筒纸或粗布的一个表面上涂覆导电粘合剂树脂，在PET或尼龙膜的一面上涂覆磨粒，并将圆筒纸的涂覆表面 或与PET或尼龙膜的另一侧的布料。

公开(公告)号：USRE37997E1

公开(公告)日：2003-02-18

申请号：US08624783

申请日：1996-03-27

申请人： Mark E. Tuttle

发明人： Mark E. Tuttle

IPC分类号： B24D1100

CPC分类号： B24D11/00 ,  B24B7/228 ,  B24B13/01 ,  B24B37/26

摘要： A polishing pad is provided, having its face shaped to produce controlled nonuniform removal of material from a workpiece. Non-uniformity is produced as a function of distance from the pad's rotational axis (the working radius). The pad face is configured with both raised, contact regions and voided, non-contact regions such that arcuate abrasive contact varies nonuniformly as a function of distance from the pad's rotational axis. Void density at any distance may be produced by several techniques such as varying void size as a function of working radius or varying the number of voids per unit area as a function of working radius. Either technique produces variation in voided area per total unit area for rings of pad surface concentric with the rotational axis having infintesimally small width.

摘要翻译： 提供了一种抛光垫，其表面形状可以从工件上产生受控的不均匀的材料去除。 产生与衬垫旋转轴距离（工作半径）的函数的不均匀性。 衬垫面配置有凸起，接触区域和空隙的非接触区域，使得弧形磨料接触作为距衬垫旋转轴线的距离的函数不均匀地变化。 任何距离处的空隙密度可以通过几种技术产生，例如作为工作半径的函数改变空隙尺寸或者改变作为工作半径的函数的每单位面积的空隙数。 任一技术产生与具有正面小的宽度的旋转轴线同心的垫表面的环的每单位面积的空隙面积的变化。