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    Filter module and projection apparatus
    96.
    发明授权
    Filter module and projection apparatus 有权

    公开(公告)号：US11867930B2

    公开(公告)日：2024-01-09

    申请号：US17386515

    申请日：2021-07-27

    申请人： Coretronic Corporation

    发明人： Cheng-Che Chien ,  Ming-Tsung Weng ,  Sheng-Chiang Lin

    IPC分类号： G02B5/02 ,  G02B13/16 ,  G02B5/20 ,  G02B21/14

    CPC分类号： G02B5/0294 ,  G02B5/20 ,  G02B13/16 ,  G02B21/14

    摘要： A filter module and a projection apparatus are provided. The filter module includes a filter layer and a diffusion layer. The filter layer includes a first filter region and a second filter region, which respectively allow light having a first waveband and light having a second waveband to pass through. The diffusion layer is disposed on a side of the filter module opposite to the filter layer and includes a first diffusion portion with a first haze value and a second diffusion portion with a second haze value. The first diffusion portion is disposed corresponding to the first filter region and allows the light having the first waveband to pass through. The second diffusion portion is disposed corresponding to the second filter region and allows the light having the second waveband to pass through. The first haze value is different from the second haze value.

    ILLUMINATION DISPLAY AS ILLUMINATION SOURCE FOR MICROSCOPY
    97.
    发明公开
    ILLUMINATION DISPLAY AS ILLUMINATION SOURCE FOR MICROSCOPY 审中-公开

    公开(公告)号：US20230350182A1

    公开(公告)日：2023-11-02

    申请号：US18220184

    申请日：2023-07-10

    申请人： ETALUMA, INC.

    发明人： Chris SHUMATE ,  Robert K. LEVIN ,  Eric WEINER

    IPC分类号： G02B21/14 ,  G02B21/26 ,  G02B21/36

    CPC分类号： G02B21/14 ,  G02B21/26 ,  G02B21/361

    摘要： Microscope imaging and illumination systems and methods are included that may be used to image multiple specimens at different locations relative to a specimen fixture without the need for repositioning a source of illumination. In some cases, light patterns emitted from illumination screens may be repositioned and reconfigured electronically as needed with an illumination signal communicated to such illumination screens. Specialized microscope imaging techniques such as phase contrast microscopy may also be used with the systems and methods discussed herein.

    EUV PHOTOMASK INSPECTION APPARATUS
    100.
    发明公开
    EUV PHOTOMASK INSPECTION APPARATUS 审中-公开

    公开(公告)号：US20230194845A1

    公开(公告)日：2023-06-22

    申请号：US18056984

    申请日：2022-11-18

    申请人： Samsung Electronics Co., Ltd.

    发明人： Garam Choi ,  Taejoong Kim ,  Jihoon Na ,  Changhoon Choi

    IPC分类号： G02B21/14 ,  G02B21/28 ,  G02B21/36 ,  G02B27/28 ,  G02B26/08 ,  G03F7/20

    CPC分类号： G02B21/14 ,  G02B21/28 ,  G02B21/361 ,  G02B27/283 ,  G02B26/0816 ,  G03F7/7065

    摘要： An EUV photomask inspection apparatus includes a plurality of optical systems respectively forming different confocal points in a mask structure including an EUV photomask and a pellicle on the EUV photomask. A first optical system among the plurality of optical systems includes a first light source emitting first light having a wavelength in a visible light range, a beam splitter transmitting or reflecting the first light, an objective lens configured to allow the first light to pass through at least a portion of the mask structure to form a first focus in the mask structure, a first light detector configured to detect first reflected light reflected from the mask structure by the incident first light, and a pinhole plate in front of the first light source. The first light detector includes a detection module including a PMT and an APD, and a thermoelectric cooling.