公开(公告)号：US20120040593A1

公开(公告)日：2012-02-16

申请号：US12949816

申请日：2010-11-19

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B24B1/00

CPC分类号： B24B9/14 ,  B24B27/0023 ,  B24B27/0069 ,  B24B57/02 ,  C03C17/002

摘要： A coating and cylindrical grinding apparatus includes a main body defining a cavity, a roller device, a liquid jetting device, a heating device, a cylindrical grinding device, and a support device received in the cavity. The roller device includes a number of rollers positioned along a first direction and is used for coating a work-piece. The liquid jetting device is mounted above the roller device for ejecting coating liquid to the roller device. The heating device heats the work-piece. The cylindrical grinding device includes a grinding wheel positioned at an end of the cavity along a second direction substantially perpendicular to the first direction. The support device includes a support plate for supporting the work-piece, the support device is capable of carrying the work-piece to contact the rollers or the grinding wheel.

摘要翻译： 涂层和圆柱形磨削装置包括限定空腔的主体，辊装置，液体喷射装置，加热装置，圆柱形磨削装置和容纳在腔中的支撑装置。 辊装置包括沿着第一方向定位的多个辊，并且用于涂覆工件。 液体喷射装置安装在辊装置上方，用于将涂布液喷射到辊装置。 加热装置加热工件。 圆柱形磨削装置包括沿着基本上垂直于第一方向的第二方向定位在腔的端部的砂轮。 支撑装置包括用于支撑工件的支撑板，支撑装置能够承载工件以接触辊或砂轮。

公开(公告)号：US20120015591A1

公开(公告)日：2012-01-19

申请号：US12894092

申请日：2010-09-29

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B24C3/00

CPC分类号： B24C1/04

摘要： A glass manufacturing device includes a working container, a loading device, a sand blower, a shielding device, and a supporting device. The loading device is received in the working container and configured for loading a glass substrate in place. The sand blower is arranged opposite to the loading device and configured for sandblasting the glass substrate. The supporting device is used for supporting the shielding device and pressing the shielding device onto the glass substrate during the process of sandblasting. The shielding device includes a shielding cover having a number of shielding units. The shielding units are configured to shield portions of the glass substrate and prevent the portions of the glass substrate from being cut during sandblasting.

摘要翻译： 玻璃制造装置包括工作容器，装载装置，砂磨机，屏蔽装置和支撑装置。 装载装置被容纳在工作容器中，并被配置用于将玻璃基板装载到位。 砂浆机布置成与装载装置相对，并配置用于喷砂玻璃基板。 支撑装置用于在喷砂过程中支撑屏蔽装置并将屏蔽装置按压到玻璃基板上。 屏蔽装置包括具有多个屏蔽单元的屏蔽盖。 屏蔽单元被构造成屏蔽玻璃基板的部分并防止在喷砂期间玻璃基板的部分被切割。

公开(公告)号：US20110283938A1

公开(公告)日：2011-11-24

申请号：US12891768

申请日：2010-09-27

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B05C13/02

CPC分类号： B25B11/005

摘要： A lens barrel coating aid apparatus includes a holder, a suction component and a suction source. The holder includes a holding surface, securing portions positioned on the holding surface to fix lens barrels, and a first positioning portion. The first positioning portions are formed on the holding surface, and spaced from the securing portions. The suction component includes a suction surface facing the holding surface and a second positioning portion corresponding to the first positioning portion. Suction holes are defined on the suction surface corresponding to the securing portions. The suction holes are configured to suck plugs to insert into or pull out of the lens barrels. The second positioning portions are formed on the suction surface, and spaced from the suction holes. The suction source is connected with the suction holes, and provides suction force to the suction holes.

摘要翻译： 透镜筒涂敷辅助装置包括保持器，抽吸部件和抽吸源。 保持器包括保持表面，位于保持表面上的固定部分以固定镜筒，以及第一定位部。 第一定位部分形成在保持表面上并与固定部分间隔开。 抽吸部件包括面对保持面的抽吸面和与第一定位部对应的第二定位部。 在对应于固定部分的吸力表面上限定吸入孔。 吸孔被配置为吸入插头以插入或拉出镜筒。 第二定位部分形成在吸入表面上并与吸入孔间隔开。 抽吸源与抽吸孔连接，并向抽吸孔提供吸力。

公开(公告)号：US20110259738A1

公开(公告)日：2011-10-27

申请号：US12869705

申请日：2010-08-26

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： C23C14/35

CPC分类号： C23C14/35 ,  H01J37/3405

摘要： A magnetron sputtering device includes a holding compartment, a target assembly, a supporting base, and a rotation module. The holding compartment is divided to a reactive chamber and a receiving chamber. The target assembly includes two cooling plates, two magnetic units, and a target. The two cooling plates define a magnetron room communicating with the receiving chamber. The two magnetic units are suspended in the magnetron room. The target is attached on the cooling plate under the magnetic units. The supporting base is for supporting work-pieces. The rotation module is received in the receiving chamber, and jointed to the two magnetic units. The rotation module drives the magnetic units to spin about a central axis thereof and move back and forth along a direction lengthwise of the magnetic unit.

摘要翻译： 磁控溅射装置包括保持室，目标组件，支撑基座和旋转模块。 保持室被分成反应室和接收室。 目标组件包括两个冷却板，两个磁性单元和一个目标。 两个冷却板限定与接收室连通的磁控管室。 两个磁性单元悬挂在磁控管室中。 目标在磁性单元下方的冷却板上。 支撑底座用于支撑工件。 旋转模块被容纳在接收室中，并连接到两个磁性单元。 旋转模块驱动磁性单元围绕其中心轴线旋转并且沿着磁性单元的纵向方向前后移动。

公开(公告)号：US20110159792A1

公开(公告)日：2011-06-30

申请号：US12752153

申请日：2010-04-01

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B24B41/06 ,  B24B27/00

CPC分类号： B24B27/00 ,  B24B41/06 ,  B24B55/02

摘要： A multi-functional grinding apparatus includes a fixed barrel, a moving barrel, a cutting device, a grinding plate, and an actuator. The fixed barrel defines a chamber therein and includes a number of inner side surfaces, the inner side surfaces are substantially parallel to a central axis of the fixed barrel. Each of the inner side surfaces defines a holding groove therein for holding a workpiece. The moving barrel is received in the chamber and includes a first side surface and a second side surface, the first side surface and second side surface are substantially parallel to the central axis. The cutting device is fixed on the first side surface. The grinding plate is fixed on the second side surface. The actuator is configured for driving the moving barrel to move towards a workpiece, and rotating the moving barrel.

摘要翻译： 多功能研磨装置包括固定筒，移动筒，切割装置，研磨板和致动器。 固定筒在其中限定一个室，并且包括多个内侧表面，内侧表面基本上平行于固定桶的中心轴线。 每个内侧表面在其中限定用于保持工件的保持槽。 移动的筒体容纳在腔室中，并且包括第一侧表面和第二侧表面，第一侧表面和第二侧表面基本上平行于中心轴线。 切割装置固定在第一侧面上。 研磨板固定在第二侧面上。 致动器构造成用于驱动移动的筒朝向工件移动，并且旋转移动的筒。

公开(公告)号：US20110088615A1

公开(公告)日：2011-04-21

申请号：US12758037

申请日：2010-04-12

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B05C9/14 ,  B05C3/02

CPC分类号： B05C3/09 ,  B05C3/005

摘要： A dip coating apparatus includes a housing and a workpiece holder movably and rotatably received in the housing. The housing includes an immersing portion configured for carrying out immersion process and a drying portion configured for carrying out drying process. The inner spaces of the immersing portion and the drying portion are communicated with each other. The lifting workpiece holder is configured for fixed workpieces thereon and moving and rotating relative to the immersing portion and the drying portion of the housing. The workpieces is driven by the lifting-rotating to carry out the immersion process and the drying process.

摘要翻译： 浸涂装置包括壳体和可移动和可旋转地容纳在壳体中的工件保持件。 壳体包括构造成用于进行浸渍处理的浸渍部分和构造成进行干燥处理的干燥部分。 浸渍部分和干燥部分的内部空间彼此连通。 提升工件保持器构造成用于其上的固定工件，并相对于壳体的浸渍部分和干燥部分移动和旋转。 工件由提升旋转驱动，进行浸渍处理和干燥处理。

公开(公告)号：US20110073472A1

公开(公告)日：2011-03-31

申请号：US12770753

申请日：2010-04-30

申请人： Shao-Kai Pei

发明人： Shao-Kai Pei

IPC分类号： C23C14/34

CPC分类号： C23C14/06 ,  C23C14/24 ,  C23C14/34 ,  C23C14/505

摘要： A coating apparatus includes a housing, a sputter mechanism, an evaporation mechanism, and a workpiece transport assembly. The housing defines a receiving space. The workpiece transport assembly includes a fixing plate, a first transport member, and a first shaft. The fixing plate is secured to the housing via the receiving space and divides the receiving space into a sputter chamber and an evaporation chamber. The sputter mechanism is mounted in the sputter chamber, and the evaporation mechanism is mounted in the evaporation chamber. The fixing plate defines a through hole. The sputter chamber communicates with the evaporation chamber via the through hole. The first transport member is configured to transport at least one workpiece. The first shaft is secured to the first transport member and rotatably mounted to the housing.

摘要翻译： 涂覆装置包括壳体，溅射机构，蒸发机构和工件传送组件。 外壳定义了一个接收空间。 工件运输组件包括固定板，第一输送构件和第一轴。 固定板通过接收空间固定到壳体，并将接收空间分成溅射室和蒸发室。 溅射机构安装在溅射室中，蒸发机构安装在蒸发室中。 固定板限定通孔。 溅射室通过通孔与蒸发室连通。 第一输送构件被构造成输送至少一个工件。 第一轴被固定到第一传送构件并且可旋转地安装到壳体。

公开(公告)号：US20110052180A1

公开(公告)日：2011-03-03

申请号：US12758038

申请日：2010-04-12

申请人： SHAO-KAI PEI ,  ZIH-WEI WANG

发明人： SHAO-KAI PEI ,  ZIH-WEI WANG

IPC分类号： G03B17/00 ,  G02B5/22 ,  H05K9/00 ,  B05D3/06

CPC分类号： H05K9/0094 ,  G02B5/003 ,  G02B5/22 ,  G03B17/00

摘要： An exemplary light blocking plate includes a light pervious substrate, a filter film formed on the light pervious substrate, and a metal film layer formed on the light pervious substrate and the optical filter film. The metal film layer defines a through hole to expose a central portion of the optical filter film.

摘要翻译： 示例性的遮光板包括透光性基板，形成在透光性基板上的滤光膜以及形成在透光性基板上的金属膜层和滤光膜。 金属膜层限定了通孔以暴露滤光膜的中心部分。

公开(公告)号：US20110048321A1

公开(公告)日：2011-03-03

申请号：US12763185

申请日：2010-04-19

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： B05B7/06

CPC分类号： C23C14/568 ,  C23C14/505

摘要： A coating apparatus includes a first coating element, a second coating element, an isolating element, at least one isolating block, and at least one linear driving element. The isolating element includes a main chamber and at least one secondary chamber communicating with the main chamber. The first coating element is connected to one end of the isolating element, and the second coating element is connected to an opposite end of the isolating element. Each of the at least one isolating block is received in one of the at least one secondary chamber. Each of the at least one linear driving element is mounted in one of the at least one secondary chamber and connected to one of the at least one isolating block.

摘要翻译： 涂覆装置包括第一涂层元件，第二涂覆元件，隔离元件，至少一个隔离块和至少一个线性驱动元件。 隔离元件包括主室和与主室连通的至少一个次室。 第一涂层元件连接到隔离元件的一端，第二涂层元件连接到隔离元件的相对端。 所述至少一个隔离块中的每一个被接收在所述至少一个次室中的一个中。 所述至少一个线性驱动元件中的每一个安装在所述至少一个次级室中的一个中并且连接到所述至少一个隔离块中的一个。

公开(公告)号：US20110031116A1

公开(公告)日：2011-02-10

申请号：US12758034

申请日：2010-04-12

申请人： SHAO-KAI PEI

发明人： SHAO-KAI PEI

IPC分类号： C23C14/35

CPC分类号： C23C14/35 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3455

摘要： A coating apparatus includes a shielding casing defining a chamber, a substrate holder received in the chamber and a target assembly located inside the shielding casing. The substrate holder is configured to hold a substrate. The target assembly faces the substrate. The target assembly includes a target frame, two opposite target electrodes, a number of magnetrons and a transport unit. The target base includes two opposite end surfaces and a number of side surfaces interconnecting the end surfaces. The two opposite target electrodes are fixed on the two opposite side surfaces. The magnetrons are received in the receiving cavity and disposed between the target electrodes. The transport unit is configured to carry the magnetrons to circulate therearound.

摘要翻译： 涂覆装置包括限定腔室的屏蔽壳体，容纳在腔室中的衬底保持器和位于屏蔽壳体内的目标组件。 衬底保持器构造成保持衬底。 目标组件面向基板。 目标组件包括目标框架，两个相对的目标电极，多个磁控管和传送单元。 目标基座包括两个相对的端面和互连端表面的多个侧表面。 两个相对的目标电极固定在两个相对的侧表面上。 磁控管被容纳在接收腔中并且设置在目标电极之间。 运输单元被配置为携带磁控管在其周围循环。