-
公开(公告)号：US5200814A
公开(公告)日：1993-04-06
申请号：US511790
申请日：1990-04-20
申请人： Koji Hirata , Hiroki Yoshikawa , Takahiko Yoshida , Tooru Numata , Masayuki Muranaka , Kiyoshi Wada , Isao Yoshizaki , Shigeru Inaoka
发明人： Koji Hirata , Hiroki Yoshikawa , Takahiko Yoshida , Tooru Numata , Masayuki Muranaka , Kiyoshi Wada , Isao Yoshizaki , Shigeru Inaoka
CPC分类号： H04N9/31 , G02B13/16 , G02B13/18 , G02B27/0025
摘要： Disclosed is a projection lens system for use in an optical system for magnifying and projecting original images displayed on plural image display devices onto a screen through projection lenses provided in corresponding relation to the image display devices, which projection lens system comprises plural lens elements and in which according to colors or degrees of fineness of original images, the number of constituent lenses, or the shape of lens surface, or an effective aperture of at least one constituent lens element surface, or the number of constituent lenses and the shape of lens surface, or the number of constituent lenses and an effective aperture of at least one constituent lens element surface, or the shape of lens surface and an effective aperture of at least one constituent lens element surface, or the number of constituent lenses, the shape of lens surface and an effective aperture of at least one constituent lens element surface, are changed at a time.
摘要翻译： 公开了一种用于光学系统的投影透镜系统，用于通过与图像显示装置相对应地设置的投影透镜将显示在多个图像显示装置上的原始图像放大和投影到屏幕上，该投影透镜系统包括多个透镜元件，并且 其根据原始图像的颜色或程度，构成透镜的数量，或透镜表面的形状，或至少一个构成透镜元件表面的有效孔径，或构成透镜的数量和透镜表面的形状 ，或构成透镜的数量和至少一个构成透镜元件表面的有效孔径，或透镜表面的形状和至少一个构成透镜元件表面的有效孔径，或构成透镜的数量，透镜的形状 表面和至少一个构成透镜元件表面的有效孔径一次改变。
-
公开(公告)号：US4824224A
公开(公告)日：1989-04-25
申请号：US948251
申请日：1986-12-31
申请人： Kyohei Fukuda , Hiroki Yoshikawa , Shigeru Mori , Koji Hirata , Soichi Sakurai
发明人： Kyohei Fukuda , Hiroki Yoshikawa , Shigeru Mori , Koji Hirata , Soichi Sakurai
摘要： An improved lens system for a projection television is described. The lens system is designed to be used with a cathode ray tube having a face glass with an aspheric surface having phosphor elements mounted thereto. The aspheric surface of the face glass has its maximum radius at the optical axis and is of lesser radius outwardly thereof. From the screen, the lens system companies a first aspheric lens of relatively weak power, a second biconvex lens of relatively high positive power, a third aspheric lens of weak positive power and a fourth lens having a concave face on its screen sider and of relatively large negative power.
摘要翻译： 描述了用于投影电视的改进的透镜系统。 透镜系统设计成与具有带有安装有荧光体元件的非球面的面玻璃的阴极射线管一起使用。 面玻璃的非球面表面在光轴处具有最大半径，并且其外侧具有较小的半径。 从屏幕上看，透镜系统公司具有功率相对较弱的第一非球面透镜，具有相对高正功率的第二双凸透镜，弱正功率的第三非球面透镜和在屏幕上具有凹面的第四透镜，并且相对 大负功率
-
公开(公告)号：US4638643A
公开(公告)日：1987-01-27
申请号：US767807
申请日：1985-08-21
CPC分类号： F25B13/00 , F25B49/025
摘要： A control system for a compressor motor used with an air conditioning unit is disclosed. A current for generating a non-rotating magnetic field is supplied to the compressor motor to preheat a compressor. A current for generating a rotating magnetic field is also supplied to the compressor motor together with the current for generating a non-rotating magnetic field to heat the compressor. The heat pump using this control system is thus capable of transmitting sufficient heat energy immediately after start of the operation of the heat pump.
摘要翻译： 公开了一种与空调机一起使用的压缩机的控制系统。 用于产生非旋转磁场的电流被提供给压缩机电动机以预热压缩机。 用于产生旋转磁场的电流也与用于产生非旋转磁场的电流一起提供给压缩机电动机以加热压缩机。 因此，使用该控制系统的热泵能够在热泵的运转开始后立即传递足够的热能。
-
公开(公告)号：US08841048B2
公开(公告)日：2014-09-23
申请号：US13590315
申请日：2012-08-21
摘要： In a photomask blank comprising a transparent substrate, an optical film of material containing a transition metal and silicon, and a hard mask film, the hard mask film is a multilayer film including a first layer of a chromium-based material containing 20-60 atom % of oxygen and a second layer of a chromium-based material containing at least 50 atom % of chromium and less than 20 atom % of oxygen. The hard mask film having a thickness of 2.0 nm to less than 10 nm is resistant to fluorine dry etching.
摘要翻译： 在包含透明基板的光掩模坯料，含有过渡金属和硅的材料的光学膜和硬掩模膜中，硬掩模膜是包括含有20-60个原子的铬基材料的第一层的多层膜 氧的百分比和含有至少50原子％的铬和小于20原子％的氧的铬基材料的第二层。 具有2.0nm至小于10nm厚度的硬掩模膜耐氟干蚀刻。
-
105.发明授权Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process 有权在其上层压有用于电子束和有机导电膜的抗蚀剂膜的基板，其制造方法和抗蚀剂图案化工艺公开(公告)号：US08563216B2
公开(公告)日：2013-10-22
申请号：US13168446
申请日：2011-06-24
申请人： Satoshi Watanabe , Hiroki Yoshikawa
发明人： Satoshi Watanabe , Hiroki Yoshikawa
IPC分类号： G03C5/00
CPC分类号： G03F1/78 , H01J2237/004 , H01J2237/31796
摘要： There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed having a conductive inorganic thin film as its surface layer, wherein a surface to be processed of the substrate to be processed has an area of direct contact between the organic conductive film and the conductive inorganic thin film in part thereof. There can be a substrate to be processed capable of forming a resist pattern stably and accurately with efficient removal of electricity even when an electron beam with high current density is irradiated.
摘要翻译： 公开了一种在其上层压有用于电子束的抗蚀剂膜和有机导电膜的待处理衬底，其中至少将用于电子束的抗蚀剂膜和有机导电膜按顺序层压在待处理的衬底上，具有 导电性无机薄膜作为其表面层，其中被处理基板的被处理面在其一部分具有有机导电膜与导电性无机薄膜之间直接接触的面积。 即使照射具有高电流密度的电子束，也可以具有能够稳定且准确地形成抗蚀剂图案而能够有效地去除电力的待处理基板。
-
公开(公告)号：US20120251930A1
公开(公告)日：2012-10-04
申请号：US13494530
申请日：2012-06-12
摘要： According to one embodiment, a photomask blank wherein a second film is stacked on a first film, the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing no chromium and which is etchable by dry etching using fluorine and dry etching using oxygen-containing chlorine.
摘要翻译： 根据一个实施方案，一种光掩模坯料，其中第二膜层叠在第一膜上，所述第一膜含有铬，并且其基本上不被使用氟的干蚀刻蚀刻，并且可通过使用含氧氯的干蚀刻来蚀刻， 并且第二膜不含铬，并且可以通过使用氟的干蚀刻和使用含氧氯的干蚀刻来蚀刻。
-
公开(公告)号：US07790339B2
公开(公告)日：2010-09-07
申请号：US11785689
申请日：2007-04-19
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yuichi Fukushima
IPC分类号： G03F1/00
CPC分类号： G03F1/58 , G03F1/32 , Y10T428/31616
摘要： A photomask blank has a light-shielding film composed of a single layer of a material containing a transition metal, silicon and nitrogen or a plurality of layers that include at least one layer made of a material containing a transition metal, silicon and nitrogen, and has one or more chrome-based material film. The high transition metal content ensures electrical conductivity, preventing charge-up in the photomask production process, and also provides sufficient chemical stability to cleaning in photomask production. The light-shielding film has a good resistance to dry etching of the chrome-based material film in the presence of chlorine and oxygen, thus ensuring a high processing accuracy.
摘要翻译： 光掩模坯料具有由单层含有过渡金属，硅和氮的材料或多层构成的遮光膜，所述多层包括至少一层由含有过渡金属，硅和氮的材料制成的层，以及 具有一种或多种铬基材料膜。 高过渡金属含量确保电导率，防止光掩模生产过程中的充电，并且还为光掩模生产中的清洁提供足够的化学稳定性。 遮光膜在氯和氧的存在下对铬基材料膜的干蚀刻具有良好的耐蚀性，因此确保高的加工精度。
-
公开(公告)号：US07767366B2
公开(公告)日：2010-08-03
申请号：US11715346
申请日：2007-03-08
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
IPC分类号： G03F1/00
摘要： A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
摘要翻译： 提供一种光掩模坯料，其包括设置在透明基板上的耐蚀刻干蚀刻和通过氯干蚀刻除去的蚀刻停止膜，设置在蚀刻停止膜上的遮光膜，并且包括至少一层由 过渡金属/硅材料和设置在遮光膜上的抗反射膜。 当光屏蔽膜被干蚀刻以形成图案时，由图案密度依赖性引起的图案尺寸变化减小，使得以高精度产生光掩模。
-
109.发明授权Screen, fresnel lens sheet used for the same, and image display apparatus using the same 失效用于其的屏幕，菲涅尔透镜片和使用其的图像显示装置公开(公告)号：US07697202B2
公开(公告)日：2010-04-13
申请号：US12103241
申请日：2008-04-15
申请人： Hiroki Yoshikawa , Tetsu Ohishi , Koji Hirata , Daisuke Imafuku
发明人： Hiroki Yoshikawa , Tetsu Ohishi , Koji Hirata , Daisuke Imafuku
CPC分类号： G03B21/625
摘要： An image display apparatus includes an image generation source, optics for projecting in an enlarged form the image generated by the image generation source, and a transmissive screen for displaying the image projected from said optics. The transmissive screen includes a Fresnel lens sheet disposed at an image generation source side, and a diffusing sheet disposed at an image-watching side in order to diffuse image light at least in a horizontal direction of the screen. The Fresnel lens sheet has a plurality of entrance-side prisms formed at the image generation source side, and a plurality of exit-side prisms formed at the image-watching side, and the Fresnel lens sheet emits lights in a first direction and a second direction. The first direction is almost parallel to a central axis of the Fresnel lens sheet, and the second direction extends toward the central axis.
摘要翻译： 图像显示装置包括图像生成源，用于以放大的形式投影由图像生成源生成的图像的光学器件和用于显示从所述光学器件投影的图像的透射屏幕。 透射屏幕包括设置在图像产生源侧的菲涅尔透镜片和设置在图像观看侧的扩散片，以至少在屏幕的水平方向上扩散图像光。 菲涅尔透镜片具有形成在图像产生源侧的多个入射侧棱镜和形成在图像观看侧的多个出射侧棱镜，并且菲涅耳透镜片在第一方向上发光，而第二 方向。 第一方向几乎平行于菲涅尔透镜片的中心轴线，第二方向朝向中心轴线延伸。
-
公开(公告)号：US07691546B2
公开(公告)日：2010-04-06
申请号：US11662183
申请日：2005-09-08
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/00
摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.
摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。
-
-
-
-
-
-
-
-
-
搜索结果
130 条记录 (耗时 0.03 秒)
