公开(公告)号：US5363598A

公开(公告)日：1994-11-15

申请号：US17433

申请日：1993-02-12

Applicant: Tomoyasu Imai ,  Takani Yoshimi ,  Akihiro Matsuura ,  Toshiharu Takashima ,  Toshihiro Tsutsui ,  Hiroyuki Nakano

Inventor： Tomoyasu Imai ,  Takani Yoshimi ,  Akihiro Matsuura ,  Toshiharu Takashima ,  Toshihiro Tsutsui ,  Hiroyuki Nakano

IPC: B24B49/18 ,  B24B53/053 ,  B24B53/14 ,  B24B49/00

CPC classification number: B24B49/18 ,  B24B53/053 ,  B24B53/14

Abstract: A machine tool having a grinding wheel for grinding a workpiece mounted on a table. The machine tool is provided with a truing apparatus for truing the grinding wheel and a measuring device for measuring the diameter of the grinding wheel after every truing operation. Both of the truing apparatus and the measuring device are mounted on a movable base. The movable base is moved between its retract position at the outside of the table and a forward position above the table. The movable base is move to the forward position to bring the truing apparatus and the touch sensor into predetermined positions for truing and measuring operations. After the truing and measuring operations, the movable base is moved away from the table and is retracted to its retract position. The truing apparatus is provided with a truer support shaft whose rotational shaft intersects with a horizontal plane with an angle of 45.degree., and a truer attached to the truer support shaft. The truer has a cylindrical abrasive layer formed at periphery thereof and extending along a conical plane having a top angle of 90.degree..

Abstract translation: 一种具有用于研磨安装在工作台上的工件的砂轮的机床。 机床具有用于修整砂轮的修整装置和用于在每次修整操作之后测量砂轮的直径的测量装置。 修整装置和测量装置均安装在可动基座上。 可移动基座在桌子外侧的缩回位置和桌子上方的前方位置之间移动。 可移动基座移动到前进位置，使修整装置和触摸传感器进入预定位置以进行修整和测量操作。 在修整和测量操作之后，可移动底座移动离开工作台并缩回到其缩回位置。 修整装置设有一个整流器支承轴，其转动轴与一个45°的角度的水平面相交，并且一个修整器附着在整修器支承轴上。 修整器具有在其周边形成并沿着顶角为90°的锥形平面延伸的圆柱形研磨层。

公开(公告)号：US4887052A

公开(公告)日：1989-12-12

申请号：US276146

申请日：1988-11-25

Applicant: Yoshikazu Murakami ,  Yasuyuki Mizunuma ,  Takahiro Ohgihara ,  Hiroyuki Nakano ,  Kanako Niikura ,  Tsutomu Okamoto

Inventor： Yoshikazu Murakami ,  Yasuyuki Mizunuma ,  Takahiro Ohgihara ,  Hiroyuki Nakano ,  Kanako Niikura ,  Tsutomu Okamoto

IPC: H03B1/00 ,  H03B5/04 ,  H03B5/18 ,  H03D7/16

CPC classification number: H03B5/1894 ,  H03B2201/0241 ,  H03B5/04 ,  H03D7/161

Abstract: A tuned oscillator utilizing a thin film ferromagnetic resonator is disclosed. The oscillator comprises an active element for oscillator and a YIG thin film resonator connected to the active element as a part of feed-back circuit for the active element. The YIG thin film resonator is applied with a bias magnetic field perpendicular to a surfce of a YIG disk which is generated by a permanent magnet for a fixed component and a coil for a variable component for the resonance frequency. The resonance frequency is stabilized by use of a PLL circuit connected to an output of the oscillator and feeding back to the coil. Since the YIG thin film tuned oscillator has a high Q value, high quality communication signal processing can be achieved. The YIG tuned oscillator is used as local oscillator for a transciever.

公开(公告)号：US4649364A

公开(公告)日：1987-03-10

申请号：US651869

申请日：1984-09-18

Applicant: Maki Tanahashi ,  Sumio Horiike ,  Hiroyuki Nakano

Inventor： Maki Tanahashi ,  Sumio Horiike ,  Hiroyuki Nakano

IPC: G01K7/18 ,  G01N27/12 ,  H01C7/00

CPC classification number: G01K7/183 ,  G01N27/121

Abstract: An environment sensor includes an insulating base board, a first electrode made of a material which can provide an electrical indication of the value of a first physical quantity and formed on the insulating base board, a second electrode formed of electrically conducting material and formed on the insulating base board, and a mass of metal oxide semiconductor material which can provide an electrical indication of the value of a second physical quantity, layered on the base board over the first and second electrodes. Thus, the first electrode by itself constitutes a sensor subsystem which can sense the value of the first physical quantity, which may preferably be temperature, while the first and second electrodes together with the mass of metal oxide semiconductor material constitute a sensor subsystem which can sense the value of the second physical quantity, which may preferably be humidity.

Abstract translation: 环境传感器包括绝缘基板，由能够提供第一物理量的值的电指示并形成在绝缘基板上的材料制成的第一电极，由导电材料形成并形成在绝缘基板上的第二电极 绝缘基板和大量金属氧化物半导体材料，其可以提供在第一和第二电极上层叠在基板上的第二物理量的值的电指示。 因此，第一电极本身构成传感器子系统，其可以感测第一物理量的值，其优选可以是温度，而第一和第二电极与金属氧化物半导体材料的质量构成可感测的传感器子系统 第二物理量的值，其可以优选为湿度。

公开(公告)号：US08218138B2

公开(公告)日：2012-07-10

申请号：US13172233

申请日：2011-06-29

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/00 ,  G01N21/88

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.

Abstract translation: 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

公开(公告)号：US08107065B2

公开(公告)日：2012-01-31

申请号：US12831102

申请日：2010-07-06

Applicant: Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

Inventor： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC: G01N21/88

CPC classification number: G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

Abstract: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

Abstract translation: 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20110255074A1

公开(公告)日：2011-10-20

申请号：US13172233

申请日：2011-06-29

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/17 ,  G01J4/00

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.

Abstract translation: 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

公开(公告)号：US08037984B2

公开(公告)日：2011-10-18

申请号：US11798415

申请日：2007-05-14

Applicant: Satoru Suzuki ,  Tsutomu Suzuki ,  Yuzo Geshi ,  Hiroyuki Nakano ,  Kiyonori Hirao

Inventor： Satoru Suzuki ,  Tsutomu Suzuki ,  Yuzo Geshi ,  Hiroyuki Nakano ,  Kiyonori Hirao

IPC: B60W10/02 ,  B60W10/10

CPC classification number: F16H61/32 ,  B60K23/0808 ,  F16H63/14 ,  F16H63/18 ,  Y10T74/19251 ,  Y10T74/19279

Abstract: A four-wheel-drive-vehicle driving force distribution apparatus has an auxiliary transmission mechanism for switching motive power transmitted to an input shaft at least between two levels, a high speed and a low speed, and transmitting the motive power to a main output shaft; a friction clutch for selectively transmitting the motive power of the main output shaft to an auxiliary output shaft; a ball cam mechanism for changing the pressing force of the friction clutch in a non-step manner; and a shift mechanism for shifting the auxiliary transmission mechanism. A clutch control mechanism is provided between a drive member fixed to an output shaft of a motor and a pinion gear and changes the clutch pressing force caused by the ball cam mechanism corresponding to clockwise rotation of the drive member performed by a motor starting from a control starting point. A shift control mechanism is provided between the drive member and a shifting cylindrical cam and alternately repeating switching between a H position and a L position of the auxiliary transmission mechanism in every counterclockwise reciprocating rotation of the drive member performed by the motor starting from the control starting point.

Abstract translation: 四轮驱动车辆驱动力分配装置具有辅助传动机构，用于至少在两级之间切换传动到输入轴的动力，即高速和低速，并将动力传递到主输出轴 ; 用于选择性地将主输出轴的动力传递到辅助输出轴的摩擦离合器; 用于以非步进方式改变摩擦离合器的按压力的球形凸轮机构; 以及用于移动辅助传动机构的换档机构。 离合器控制机构设置在固定到电动机的输出轴的驱动构件与小齿轮之间，并且改变与由控制器开始的由电动机执行的驱动构件的顺时针旋转对应的由球形凸轮机构引起的离合器按压力 初始点。 在驱动构件和变速圆柱形凸轮之间设置有变速控制机构，并且在由控制开始的电动机的驱动构件的每个逆时针往复旋转中的交替重复切换辅助变速机构的H位置和L位置之间 点。

公开(公告)号：US20110075134A1

公开(公告)日：2011-03-31

申请号：US12964176

申请日：2010-12-09

Applicant: Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

Inventor： Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: An apparatus for inspecting a specimen includes a first illumination unit having a laser light source and a first optical component for illuminating a specimen on which patterns are formed with a laser from a first elevation angle direction, a second illuminating unit having a light source and a second optical component for illuminating the specimen from a second elevation angle direction which is greater than the first elevation angle, a first detection optical unit which detects light from the specimen illuminated by the first illumination unit, a second detection optical unit which detects light from the specimen illuminated by the second illumination unit, and a signal processing unit which processes signals output from the first detector to detect defects in a first area on the specimen and processes signals output from the second detector to detect defects in a second area on the specimen.

Abstract translation: 一种用于检查试样的装置包括具有激光光源的第一照明单元和用于照射具有来自第一仰角方向的激光形成图案的样本的第一光学部件，具有光源的第二照明单元和 第二光学部件，用于从大于所述第一仰角的第二仰角方向照射所述试样;第一检测光学单元，其检测来自所述第一照明单元照射的样本的光;第二检测光学单元， 由第二照明单元照射的样本，以及信号处理单元，处理从第一检测器输出的信号，以检测样本上的第一区域中的缺陷，并处理从第二检测器输出的信号，以检测样本上的第二区域中的缺陷。

公开(公告)号：US20100265496A1

公开(公告)日：2010-10-21

申请号：US12827470

申请日：2010-06-30

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/00 ,  G06K9/00

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US07748075B2

公开(公告)日：2010-07-06

申请号：US11889802

申请日：2007-08-16

Applicant: Hiroyuki Nakano

Inventor： Hiroyuki Nakano

IPC: B60S1/46

CPC classification number: B60S1/486 ,  Y10S318/02

Abstract: In a low speed wiping mode, reciprocal wiping movement of a wiper is executed at a first wiping speed without spraying the washer fluid from washer nozzles. In a high speed wiping mode, reciprocal wiping movement of the wiper is executed at a second wiping speed that is higher than the first wiping speed without spraying the washer fluid from the washer nozzles. In a wash and wipe mode, washer fluid is sprayed from the washer nozzles over the windshield, and reciprocal wiping movement of the wiper is executed a plurality of times. A wiping speed of the wiper in the wash and wipe mode in at least one of a running state and a stopped state of the vehicle is set to be lower than the first wiping speed of the wiper that is set for the low speed wiping mode.

Abstract translation: 在低速擦拭模式中，擦拭器的往复擦拭运动以第一擦拭速度执行，而不从垫圈喷嘴喷射洗涤剂流体。 在高速擦拭模式中，擦拭器的往复擦拭运动以比第一擦拭速度高的第二擦拭速度执行，而不从垫圈喷嘴喷射洗涤剂流体。 在洗涤和擦拭模式中，清洗液从洗涤器喷嘴喷射到挡风玻璃上，擦拭器的往复擦拭运动多次执行。 在车辆的行驶状态和停止状态中的至少一个中，洗涤和擦拭模式中的擦拭器的擦拭速度被设定为低于为低速擦拭模式设定的刮水器的第一擦拭速度。