公开(公告)号：US07118684B2

公开(公告)日：2006-10-10

申请号：US10492247

申请日：2002-10-11

申请人： Yoshihiro Hirata ,  Yoshio Ueda ,  Hiroaki Takase ,  Kazuaki Suzuki

发明人： Yoshihiro Hirata ,  Yoshio Ueda ,  Hiroaki Takase ,  Kazuaki Suzuki

IPC分类号： D06M11/83

CPC分类号： D06M16/00 ,  A01N59/16 ,  B01F3/1214 ,  B01F3/1221 ,  B22F1/0022 ,  B22F1/025 ,  B22F9/02 ,  B22F2999/00 ,  B82Y30/00 ,  D06M11/83 ,  Y10T442/109 ,  Y10T442/152 ,  Y10T442/20 ,  A01N25/34 ,  A01N25/04 ,  A01N2300/00

摘要： Burn noble metal in high-pressure water using hydrogen and oxygen to produce noble metal micro-dispersion water in which super-fine noble metal particles are dispersed, and use the obtained noble metal micro-dispersion water to treat fiber products in order to provide high-function fiber products, typically clothes, which offer excellent health-promoting function and cleanliness-improving function.

摘要翻译： 在高压水中使用氢气和氧气烧制贵金属，制备分散有超细贵金属颗粒的贵金属微分散水，并使用得到的贵金属微分散水处理纤维制品以提供高 功能性纤维制品，通常是衣服，其具有优异的健康促进功能和清洁度改善功能。

公开(公告)号：US20050236021A1

公开(公告)日：2005-10-27

申请号：US11102968

申请日：2005-04-11

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： A01G25/09 ,  A01G27/00 ,  A47L7/02 ,  A47L9/00 ,  B08B3/00 ,  G05D1/02

CPC分类号： A47L9/009 ,  A01G27/00 ,  A47L2201/04

摘要： Conventionally, it is impossible to water a potted plant or the like with a freely moving cleaner. A cleaner of this invention finds a travel route to the location of a first potted plant said cleaner determines that current time is a timer-set time, travels to said location to pour a specified amount of water on said potted plant, on completion of that watering finds a travel route to a second potted plant, travels to said location, pours a specified amount of water on said second potted plant, and on completion of that watering returns to an initial standby position at a hall.

摘要翻译： 通常，不可能用自由移动的清洁剂来浇灌盆栽植物等。 本发明的清洁剂找到到第一盆栽植物位置的行进路线，所述清洁器确定当前时间是定时器设定时间，在完成时移动到所述位置以将特定量的水倒在所述盆栽植物上 浇水找到到第二盆栽植物的旅行路线，前往所述位置，在所述第二盆栽植物上浇一定量的水，并且在浇水完成时，返回到大厅的初始待命位置。

公开(公告)号：US20050053629A1

公开(公告)日：2005-03-10

申请号：US10494001

申请日：2002-11-01

申请人： Yoshio Ueda ,  Hiroaki Takase ,  Kazuaki Suzuki

发明人： Yoshio Ueda ,  Hiroaki Takase ,  Kazuaki Suzuki

IPC分类号： A61K8/04 ,  A61K8/19 ,  A61Q5/00 ,  A61Q7/00 ,  A61Q19/00 ,  A61Q19/08 ,  A61K7/00

CPC分类号： A61K8/044 ,  A61K8/19 ,  A61Q5/006 ,  A61Q7/00 ,  A61Q19/00 ,  A61Q19/08

摘要： Use in cosmetic lotions a dispersion solution of super-fine noble metal particles obtained by burning a mixture gas of oxygen and hydrogen in high-pressure water and using the combustion gas to melt noble metal and thus causing super-fine noble metal particles to micro-disperse in water, wherein such production process is implemented using an apparatus for producing a cosmetic lotion that comprises a pressure-resistant container equipped with a high-pressure water tank, an injection nozzle for mixture gas of oxygen and hydrogen, a noble metal bar, an ignition device and a combustion chamber.

摘要翻译： 在化妆液中使用通过在高压水中燃烧氧气和氢气的混合气体而得到的超细贵金属颗粒的分散溶液，并使用燃烧气体来熔化贵金属，从而使超细贵金属颗粒成为微细的， 分散在水中，其中使用生产化妆水的设备实现这种生产方法，该装置包括装有高压水箱的耐压容器，用于氧气和氢气的混合气体的喷嘴，贵金属棒， 点火装置和燃烧室。

公开(公告)号：US06608665B1

公开(公告)日：2003-08-19

申请号：US09523304

申请日：2000-03-10

申请人： Kenji Nishi ,  Kazuaki Suzuki

发明人： Kenji Nishi ,  Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70433 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/701 ,  G03F7/702 ,  G03F7/70358 ,  G03F7/70558

摘要： In a projection exposure apparatus for transferring a pattern formed in a transfer area on a mask onto a photosensitive substrate by a scanning exposure system, provision is made of an illuminating optical system for applying illuminating light to the transfer area of the mask through a rectangular aperture in a field stop disposed apart from a plane conjugate with the pattern surface of the mask, and a light intercepting member having an aperture of which the width is variable in the direction of the relative scanning of the mask and the photosensitive substrate for shielding at least a part of an illumination area on the mask which is defined by the rectangular aperture in the field stop from the light, and provision is further made of a member for driving the light intercepting member so as to change the width of the aperture therein in operative association with a change in the position of the illumination area on the transfer area of the mask which is changed by the relative scanning.

摘要翻译： 在通过扫描曝光系统将形成在掩模上的转印区域中的图案转印到感光基板上的投影曝光装置中，提供照明光学系统，用于通过矩形孔将照明光施加到掩模的转印区域 在与掩模的图案表面共轭的平面上设置的场停止器中，以及具有孔径的遮光构件，该遮光构件的宽度在掩模和感光基板的相对扫描方向上可变，以至少屏蔽 由场中的矩形孔限定的掩模上的照明区域的一部分从光中停止，并且进一步设置用于驱动遮光构件的构件，以便在其中改变其中的孔的宽度 与通过相对扫描改变的掩模的转印区域上的照明区域的位置的变化相关联 ing。

公开(公告)号：US06572022B2

公开(公告)日：2003-06-03

申请号：US09756847

申请日：2001-01-10

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G06K1906

CPC分类号： G06K19/07758 ,  G06K19/04 ,  G06K19/073 ,  G06K19/07745 ,  G06K19/07749 ,  G06K19/07779 ,  G06K19/07783 ,  G06K2017/0096 ,  H01L2924/0002 ,  Y10T428/24826 ,  H01L2924/00

摘要： An information recording tag contains: an IC module in which a resonance circuit and an IC chip 3 are packaged on a substrate 1 where the resonance circuit has an antenna coil 2 and a film condenser 5; and an adhesive 17 that is applied to the IC module in order to adhere said IC module onto an adherend, wherein an empty portion 18 that is adhesive-free has been formed in the adhesive 17 so as to distinguish an area on the IC module where the area contains the film condenser 5 from other areas on the IC module.

摘要翻译： 信息记录标签包括：其中谐振电路和IC芯片3封装在谐振电路具有天线线圈2和薄膜电容器5的基板1上的IC模块; 和粘合剂17，其被施加到IC模块以将所述IC模块粘附到被粘物上，其中在粘合剂17中形成无粘合剂的空部分18，以区分IC模块上的区域 区域包含IC模块上其他区域的薄膜电容器5。

公开(公告)号：US06518887B2

公开(公告)日：2003-02-11

申请号：US09794099

申请日：2001-02-28

申请人： Kazuaki Suzuki ,  Takashi Matsumura

发明人： Kazuaki Suzuki ,  Takashi Matsumura

IPC分类号： G08B1314

CPC分类号： G06K19/07758 ,  G06K19/073 ,  G06K19/07381 ,  G06K19/0739 ,  G06K19/07749 ,  G06K19/0776 ,  H05K3/281 ,  H05K3/284 ,  H05K3/386

摘要： The information recording tag includes an IC module in which an IC chip and a resonance circuit which is composed of a film capacitor and of an antenna coil are packaged on a substrate, and an adhesive that is applied to the IC module in order to adhere said IC module to an adherend S. The adhesive force between the adhesive and the adherend S is greater than the adhesive force between the insulation film of the film capacitor and the film type electrodes. The information recording tag, that is affixed to a prescribed adherend and used, can be destroyed if an attempt is made to remove it from its adherend after the information recording tag has been affixed to an adherend, in order to prevent improper usage of the information recording tag.

摘要翻译： 信息记录标签包括IC模块，其中IC芯片和由薄膜电容器和天线线圈组成的谐振电路封装在基板上，以及粘合剂，其被施加到IC模块以粘附所述 IC模块。粘合剂和被粘物S之间的粘合力大于薄膜电容器的绝缘膜和薄膜型电极之间的粘合力。 如果在将信息记录标签贴在被粘物上之后尝试将其从被粘物上除去，则为了防止信息的不当使用而被贴在规定的被粘物上并使用的信息记录标签可以被破坏 录音标签

公开(公告)号：US06496247B2

公开(公告)日：2002-12-17

申请号：US09796526

申请日：2001-03-02

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03F7/70041 ,  G03F7/70558

摘要： In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. At that time, not only fluctuations of the energies of the pulsed lights but also fluctuations of light emission timing of the pulsed lights are taken into consideration.

摘要翻译： 在狭缝扫描型投影曝光装置中，从脉冲光源发出规定数量的脉冲光，将掩模版上的图案转印到晶片上，同时以相对于曝光区域的恒定速度扫描掩模版和晶片 在晶圆上。 此时，不仅考虑了脉冲光的能量的波动，还考虑了脉冲光的发光定时的波动。

公开(公告)号：US06295119B1

公开(公告)日：2001-09-25

申请号：US09231634

申请日：1999-01-15

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70475

摘要： A scanning exposure apparatus of the scan-and-stitch type for stitching and forming a plurality of pattern images while partially superimposing them on a photosensitive substrate along a direction perpendicular to a scanning direction. The apparatus includes a fixed field diaphragm for setting a width of an illumination area in the scanning direction on the mask, and a variable field diaphragm comprising third and fourth shielding plates for restricting the width of the illumination area in the scanning direction, and first and second shielding plates which are rotationally movable in a plane perpendicular to an optical axis of an illumination optical system for setting a width of the illumination area in the direction perpendicular to the scanning direction. Scanning exposure is performed while each of the first and second shielding plates maintains an identical rotational angle over a connecting area of an image-plane stitching section. Thus the same amount of exposure light is obtained on the connecting area and the other areas.

摘要翻译： 一种用于缝合和形成多个图案图像的扫描和缝合类型的扫描曝光装置，同时沿着垂直于扫描方向的方向将它们部分地重叠在感光基板上。 该装置包括用于设置掩模上的扫描方向上的照明区域的宽度的固定场光阑和包括用于限制扫描方向上的照明区域的宽度的第三和第四屏蔽板的可变场光​​阑，以及第一和 第二遮蔽板，其可在垂直于照明光学系统的光轴的平面中旋转移动，用于设置照射区域在与扫描方向垂直的方向上的宽度。 在第一和第二屏蔽板中的每一个在图像平面缝合部分的连接区域上保持相同的旋转角度的同时执行扫描曝光。 因此，在连接区域和其他区域上获得相同量的曝光光。

公开(公告)号：US06292254B1

公开(公告)日：2001-09-18

申请号：US09089048

申请日：1998-06-02

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03F7/70241 ,  G03F7/70358 ,  G03F9/70

摘要： A transfer method includes a step of disposing a mask and a substrate with a projection optical system interposed therebetween in planes substantially perpendicular to the optical axis thereof; and a step of moving the image plane of the projection optical system and the substrate relative to each other along the optical axis in accordance with a variation in the positional relationship between the mask and the projection optical system along the optical axis while the mask and the substrate are moved perpendicular to the optical axis of the projection optical system, in order to transfer a pattern on the mask onto the substrate.

摘要翻译： 转印方法包括以下步骤：在基本上垂直于其光轴的平面中设置有投影光学系统的掩模和基板; 以及根据掩模和投影光学系统之间的沿着光轴的位置关系的变化沿光轴移动投影光学系统和基板的像面的步骤，同时掩模和 衬底垂直于投影光学系统的光轴移动，以将掩模上的图案转印到衬底上。

公开(公告)号：US06259510B1

公开(公告)日：2001-07-10

申请号：US09432412

申请日：1999-11-02

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70066 ,  G03F7/70091 ,  G03F7/70225 ,  G03F7/70358 ,  G03F7/70433 ,  G03F7/70558 ,  G03F7/70716

摘要： An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a scanning device for scanning synchronously the mask and the photosensitive substrate, and a device for setting a width of an exposure area in a scan direction of the photosensitive substrate conjugate with an illumination area on the mask with respect to the projection optical system, to integer times as large as a distance which the photosensitive substrate moves during an interval between pulse emissions from the light source.

摘要翻译： 用于将形成在掩模上的图案转印到感光基板上的曝光装置设置有用光束照射掩模上的局部区域的照明光学系统，用于将掩模的图案投影到感光基板的投影光学系统 以及用于同时扫描掩模和感光基板的扫描装置，以及用于设置与掩模相对于投影光学系统的照明区域共轭的感光基板的扫描方向上的曝光区域的宽度的装置， 在光源的脉冲发射间隔期间，感光基片移动的距离的整数倍。