Implant damage control by in-situ C doping during SiGe epitaxy for device applications
    101.
    发明申请
    Implant damage control by in-situ C doping during SiGe epitaxy for device applications 有权
    用于器件应用的SiGe外延期间原位C掺杂的植入物损伤控制

    公开(公告)号:US20070096149A1

    公开(公告)日:2007-05-03

    申请号:US11502132

    申请日:2006-08-09

    Inventor: Jin Liu Judson Holt

    Abstract: Some example embodiments of the invention comprise methods for and semiconductor structures comprised of: a MOS transistor comprised of source/drain regions, a gate dielectric, a gate electrode, channel region; a carbon doped SiGe region that applies a stress on the channel region whereby the carbon doped SiGe region retains stress/strain on the channel region after subsequent heat processing.

    Abstract translation: 本发明的一些示例性实施例包括用于和半导体结构的方法,包括:源极/漏极区,栅极电介质,栅电极,沟道区的MOS晶体管; 碳掺杂的SiGe区域,其在沟道区域上施加应力,由此碳掺杂SiGe区域在随后的热处理之后在沟道区域上保持应力/应变。

    Polymer composite membrane and method of making the same
    103.
    发明申请
    Polymer composite membrane and method of making the same 有权
    聚合物复合膜及其制备方法

    公开(公告)号:US20060183809A1

    公开(公告)日:2006-08-17

    申请号:US11058994

    申请日:2005-02-16

    CPC classification number: C08J5/2275 C08J2323/12

    Abstract: The present invention provides a polymer composite membrane having a polymer membrane and a poly(furfuryl alcohol) filling internal pores of the polymer membrane. The polymer composite membrane can have a high proton conductivity and/or a reduced methanol permeability and can be used in fuel cells, electrochemical sensor, and the like. The present invention also provides a method of making a polymer composite membrane, by providing a perfluorosulfonic polymer member, subjecting the perfluorosulfonic polymer member to a furan-based monomer, and polymerizing the furan-based monomer to obtain a polymer composite membrane having a high proton conductivity and/or a reduced methanol permeability.

    Abstract translation: 本发明提供一种聚合物复合膜,其具有填充聚合物膜的内部孔的聚合物膜和聚(糠醇)。 聚合物复合膜可以具有高的质子传导性和/或降低的甲醇渗透性,并且可以用于燃料电池,电化学传感器等。 本发明还提供一种制备聚合物复合膜的方法,通过提供全氟磺酸聚合物构件,使全氟磺酸聚合物构件经受呋喃类单体,并使呋喃类单体聚合,得到具有高质子的聚合物复合膜 导电性和/或甲醇渗透性降低。

    Rinse apparatus and method for wafer polisher
    104.
    发明授权
    Rinse apparatus and method for wafer polisher 失效
    晶圆抛光机的冲洗装置及方法

    公开(公告)号:US07021999B2

    公开(公告)日:2006-04-04

    申请号:US11099926

    申请日:2005-04-05

    CPC classification number: B24B53/017

    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.

    Abstract translation: 一种用于抛光晶片的装置,包括具有旋转中心的可旋转抛光垫和邻近抛光垫定位并基本上与中心径向对准的冲洗输送导管。 冲洗输送导管包括多个喷嘴以分配冲洗液体。 在一个实施例中,多个喷嘴被配置和定位成在漂洗输送导管的末端靠近中心产生较高流量的漂洗液体,而不是在远离中心的漂洗输送导管末端。 在另一个实施例中,冲洗输送导管具有基本上邻近中心的近端和与垫的外周近似近似的远端。

    Rinse apparatus and method for wafer polisher
    106.
    发明申请
    Rinse apparatus and method for wafer polisher 失效
    晶圆抛光机的冲洗装置及方法

    公开(公告)号:US20050181709A1

    公开(公告)日:2005-08-18

    申请号:US11099926

    申请日:2005-04-05

    CPC classification number: B24B53/017

    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.

    Abstract translation: 一种用于抛光晶片的装置,包括具有旋转中心的可旋转抛光垫和邻近抛光垫定位并基本上与中心径向对准的冲洗输送导管。 冲洗输送导管包括多个喷嘴以分配冲洗液体。 在一个实施例中,多个喷嘴被配置和定位成在漂洗输送导管的末端靠近中心产生较高流量的漂洗液体,而不是在远离中心的漂洗输送导管末端。 在另一个实施例中,冲洗输送导管具有基本上邻近中心的近端和与垫的外周近似近似的远端。

    Rinse apparatus and method for wafer polisher

    公开(公告)号:US06908370B1

    公开(公告)日:2005-06-21

    申请号:US10728550

    申请日:2003-12-04

    CPC classification number: B24B53/017

    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.

    RINSE APPARATUS AND METHOD FOR WAFER POLISHER
    108.
    发明申请
    RINSE APPARATUS AND METHOD FOR WAFER POLISHER 失效
    用于波轮抛光的冲洗装置和方法

    公开(公告)号:US20050124267A1

    公开(公告)日:2005-06-09

    申请号:US10728550

    申请日:2003-12-04

    CPC classification number: B24B53/017

    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.

    Abstract translation: 一种用于抛光晶片的装置,包括具有旋转中心的可旋转抛光垫和邻近抛光垫定位并基本上与中心径向对准的冲洗输送导管。 冲洗输送管道包括多个喷嘴以分配冲洗液体。 在一个实施例中,多个喷嘴被配置和定位成在漂洗输送导管的末端靠近中心产生较高流量的漂洗液体,而不是在远离中心的漂洗输送导管末端。 在另一个实施例中,冲洗输送导管具有基本上邻近中心的近端和与垫的外周近似近似的远端。

    Mounting frame for mounting input/output device to conpactPCI-based computer
    109.
    发明授权
    Mounting frame for mounting input/output device to conpactPCI-based computer 失效
    用于安装输入/输出设备以安装基于PCI的计算机的安装框架

    公开(公告)号:US06185110B2

    公开(公告)日:2001-02-06

    申请号:US09239677

    申请日:1999-01-29

    Applicant: Jin Liu

    Inventor: Jin Liu

    CPC classification number: H05K7/1425 G06F1/181

    Abstract: A mounting frame adapted to mount an I/O device to a compactPCI-based computer includes an outer case member and an inner case member fixed together to define therebetween an interior space for accommodating and retaining the I/O device therein so as to form a modularized I/O system. The I/O module that is formed by fixing the I/O device between the inner case member and the outer case member is secured to the computer casing by means of a suitable device and electrically connected to an interface card arranged in the computer to define an easy-to-replace and easy-to-install modularized structure.

    Abstract translation: 适于将I / O装置安装到基于CompactPCI的计算机上的安装框架包括固定在一起以在其间限定内部空间的外壳构件和内壳体构件,用于在其中容纳和保持I / O装置,以形成 模块化I / O系统。 通过将I / O装置固定在内壳构件和外壳构件之间形成的I / O模块通过合适的装置固定到计算机外壳,并电连接到布置在计算机中的接口卡,以定义 易于替换和易于安装的模块化结构。

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