Abstract:
Some example embodiments of the invention comprise methods for and semiconductor structures comprised of: a MOS transistor comprised of source/drain regions, a gate dielectric, a gate electrode, channel region; a carbon doped SiGe region that applies a stress on the channel region whereby the carbon doped SiGe region retains stress/strain on the channel region after subsequent heat processing.
Abstract:
A read activity detector circuit for use in a random access memory array includes a plurality of synchronizer circuits operative to receive a plurality of respective reference clock signals having a frequency that is substantially the same as a core reference clock and having different phases relative to one another. Each of the synchronizer circuits, in response to a first control signal presented thereto, generates an output signal having a rising edge or a falling edge which is substantially aligned to a rising edge or a falling edge of the reference clock signal corresponding thereto. The activity detector circuit further includes a controller operative to receive the respective output signals from the plurality of synchronizer circuits and to generate an output signal as a function thereof which is indicative of data to be read from the random access memory array.
Abstract:
The present invention provides a polymer composite membrane having a polymer membrane and a poly(furfuryl alcohol) filling internal pores of the polymer membrane. The polymer composite membrane can have a high proton conductivity and/or a reduced methanol permeability and can be used in fuel cells, electrochemical sensor, and the like. The present invention also provides a method of making a polymer composite membrane, by providing a perfluorosulfonic polymer member, subjecting the perfluorosulfonic polymer member to a furan-based monomer, and polymerizing the furan-based monomer to obtain a polymer composite membrane having a high proton conductivity and/or a reduced methanol permeability.
Abstract:
An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
Abstract:
An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
Abstract:
An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
Abstract:
An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
Abstract:
A mounting frame adapted to mount an I/O device to a compactPCI-based computer includes an outer case member and an inner case member fixed together to define therebetween an interior space for accommodating and retaining the I/O device therein so as to form a modularized I/O system. The I/O module that is formed by fixing the I/O device between the inner case member and the outer case member is secured to the computer casing by means of a suitable device and electrically connected to an interface card arranged in the computer to define an easy-to-replace and easy-to-install modularized structure.
Abstract:
The invention features a virally-immortalized mammalian hepatocyte, which is derived from a normal liver cell, has differentiated hepatocyte-specific metabolic activity, has the ability to proliferate, and is nontumorigenic after prolonged culture.