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公开(公告)号：US20220017790A1
公开(公告)日：2022-01-20
申请号：US17299598
申请日：2019-11-15
发明人： Taichi KITAGAWA , Nobuaki MATSUMOTO , Kohei OTAKE
摘要： An ultraviolet curable silicone adhesive composition which contains (A) an organopolysiloxane represented by formula (1) (wherein each R1 represents a polymerizable group or a monovalent hydrocarbon group having 1-20 carbon atoms, provided that at least one of the R1 moieties represents a polymerizable group; R2 represents an oxygen atom or an alkylene group having 1-20 carbon atoms; and m and n represent numbers satisfying m≥0, n≥1 and 1 (m+n)≥1,000), (B) an organopolysiloxane resin which is composed of (a) an R33SiO1/2 unit (wherein R3 represents a monovalent hydrocarbon group having 1-10 carbon atoms) and (b) an SiO4/2 unit, with the molar ratio of the unit (a) to the unit (b) being 0.6-1.2:1, (C) a fine silica powder and (D) a photopolymerization initiator, and which does not contain a (meth)acrylate compound that does not have a siloxane structure. This ultraviolet curable silicone adhesive composition enables the achievement of a cured product that has good shape retainability and little curing shrinkage, while exhibiting excellent adhesiveness if used as a provisional fixing material.
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公开(公告)号：US20220009949A1
公开(公告)日：2022-01-13
申请号：US17366963
申请日：2021-07-02
发明人： Takeshi NYUUGAKU
摘要： To provide an organosilicon compound having a cyclic silazane structure, represented by the following general formula (1): wherein R1 represents a hydrogen atom, an oxy radical, a hydroxyl group, a substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, R2 represents a substituted or unsubstituted alkylene group having 3 to 6 carbon atoms, R3 and R each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and n represents an integer of 0 to 2.
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公开(公告)号：US20210405528A1
公开(公告)日：2021-12-30
申请号：US17342701
申请日：2021-06-09
发明人： Jun Hatakeyama
IPC分类号： G03F7/004 , G03F7/038 , C08F220/18 , C08F212/14
摘要： A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group (exclusive of iodine or bromine-substituted aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
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公开(公告)号：US20210405520A1
公开(公告)日：2021-12-30
申请号：US17354180
申请日：2021-06-22
发明人： Kouhei SASAMOTO , Hideo KANEKO
IPC分类号： G03F1/26
摘要： In a photomask blank including a transparent substrate and a first inorganic film containing either or both of a transition metal and silicon, and optional a second inorganic film containing either or both of a transition metal and silicon, when an intensity of secondary ions is measured in the thickness direction of the transparent substrate and the inorganic films by TOF-SIMS with using a primary ion source of Bi and a sputtering ion source of Cs, an intensity of secondary ions containing carbon detected at the interface of the transparent substrate and the inorganic film or the inorganic films is higher than both intensities of the secondary ions containing carbon detected, respectively, at the sides remote from the interface.
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公开(公告)号：US20210403611A1
公开(公告)日：2021-12-30
申请号：US17336805
申请日：2021-06-02
摘要： A production method of an addition condensation product includes a step at which an aromatic compound, a carbonyl compound, and a catalyst are mixed in a reaction solvent, and an addition condensation reaction of the aromatic compound and the carbonyl compound is conducted in the temperature range of 60 to 97° C., both inclusive, to obtain the addition condensation product of the aromatic compound and the carbonyl compound. At the step to obtain the addition condensation product, 1 mole of the aromatic compound is mixed with 0.1 to 0.999 mole, both inclusive, of the carbonyl compound as the mole ratio. A ratio of the aromatic compound dimer to the aromatic compound multimer is in the range of 1:75 to 1:1,000.
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公开(公告)号：US11208532B2
公开(公告)日：2021-12-28
申请号：US16527444
申请日：2019-07-31
发明人： Tomoyuki Mizunashi
摘要： An addition-curable silicone resin composition which exhibits good adhesion to a substrate and has good compatibility with an inorganic filler, as well as a cured product thereof and a highly reliable semiconductor device encapsulated with the cured product, are provided. The addition-curable silicone resin composition includes (A) a linear or branched organopolysiloxane having at least one alkenyl group, said organopolysiloxane comprising at least one unit selected from R1R2SiO2/2 and R1R22SiO1/2 units, and at least one unit selected from R2′2SiO2/2, R2′3SiO1/2 and R2′SiO3/2 units, wherein a percentage of a total number of the R1R2SiO2/2 and R1R22SiO1/2 units, relative to a total number of all siloxane units, is from 0.001% to 50%, and wherein R1 is, independently at each occurrence, a hydroxy group or an alkoxy group of 1 to 30 carbon atoms; R2 is, independently at each occurrence, a group selected from a substituted or unsubstituted saturated hydrocarbon group of 1 to 12 carbon atoms, a substituted or unsubstituted aromatic hydrocarbon group of 6 to 12 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, and the groups as defined for R1; and R2′ is a groups selected from the groups as defined for R2 other than those as defined for R1, with the proviso that at least one of R2 and R2′ is an alkenyl group; (B) an organohydrogenpolysiloxane having at least two hydrosilyl groups, in an amount such that the ratio of the number of hydrosilyl groups in component (B) to a total number of alkenyl groups in component (A) is from 0.1 to 4; and (C) a catalytic amount of a hydrosilylation catalyst.
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公开(公告)号：US11208509B2
公开(公告)日：2021-12-28
申请号：US16886856
申请日：2020-05-29
IPC分类号： C08F20/58 , H01B1/12 , C08F20/38 , C08F220/38 , C08F212/14 , C08F220/58 , C08F220/36 , C08L25/18 , C08L33/26 , C08F12/30 , C08F12/20 , C08F12/24 , C08F12/22
摘要： A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0
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公开(公告)号：US11204553B2
公开(公告)日：2021-12-21
申请号：US16528905
申请日：2019-08-01
发明人： Jun Hatakeyama , Masaki Ohashi
摘要： A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated aromatic ring-bearing carboxylic acid, and an acid generator exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
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公开(公告)号：US11203670B2
公开(公告)日：2021-12-21
申请号：US16850428
申请日：2020-04-16
发明人： Masato Kawakami , Ayumu Kiyomori
IPC分类号： C09D183/16 , C08G77/62 , C08G77/06 , C08L83/16
摘要： A bissilylamino group-containing organic polysilazane compound having an average composition represented by general formula (1) below: wherein R1 is a monovalent hydrocarbon group, R2 is a divalent hydrocarbon group, R3 and R4 are a monovalent hydrocarbon group, R3 and R4 optionally bond each other to form a ring structure together with a silicon atom to which R3 and R4 are bonded and a nitrogen atom to which the silicon atom is directly bonded, R5 is a monovalent hydrocarbon group, p is 0 or 1, q is 0, 1, or 2, and a and b are numbers which satisfy 0
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公开(公告)号：US20210384385A1
公开(公告)日：2021-12-09
申请号：US17285781
申请日：2019-10-15
发明人： Yoshihiro NOJIMA , Shinji AOKI , Kazuya TOBISHIMA
IPC分类号： H01L33/50 , G02F1/13357 , G02F1/1335 , C08L27/12 , C09K11/56 , C09K11/88 , C09K11/70
摘要： A resin composition containing a base resin and quantum dots that are crystalline nanoparticle phosphors, the base resin containing a fluorine-containing resin. This provides a resin composition capable of enhancing the stability of quantum dots.
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