公开(公告)号：US5324543A

公开(公告)日：1994-06-28

申请号：US20534

申请日：1993-02-22

申请人： Kazufumi Ogawa ,  Tadashi Ootake ,  Mamoru Soga

发明人： Kazufumi Ogawa ,  Tadashi Ootake ,  Mamoru Soga

IPC分类号： B05D1/20 ,  B05D1/18 ,  B32B7/02 ,  B32B9/00 ,  C08J7/04 ,  C09D4/00 ,  C09K3/00 ,  C09K3/18 ,  B05D5/08

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y40/00 ,  B82Y5/00 ,  C09D4/00 ,  Y10T428/261 ,  Y10T428/3154 ,  Y10T428/31663

摘要： The invention provides a method of forming a monomolecular film of fluorine-containing molecules on a substrate surface such that the film has a uniform thickness with minimal surface irregularities and is substantially pin hole free. The invention also provides for a substrate obtained by using the same method which has excellent water- and oil-repelling, anti-fogging, and anti-contaminating properties. The monomolecular film is formed on the substrate surface either directly or via a given protective film. The monomolecular film coating is characterized by a plurality of different chlorosilane-based surface active materials which are different in molecular length and have a fluorine group. The surface irregularities of the film are generally confined to the molecular level.

摘要翻译： 本发明提供了在基板表面上形成含氟分子的单分子膜的方法，使得该膜具有均匀的厚度，具有最小的表面不规则性并且基本上无针孔。 本发明还提供了通过使用具有优异的防水和防油，防雾和抗污染性能的相同方法获得的基材。 单分子膜直接或通过给定的保护膜形成在基板表面上。 单分子膜涂层的特征在于分子长度不同且具有氟基团的多种不同的氯硅烷系表面活性物质。 膜的表面不规则性通常限于分子水平。

公开(公告)号：US5302416A

公开(公告)日：1994-04-12

申请号：US807636

申请日：1991-12-13

申请人： Kazufumi Ogawa

发明人： Kazufumi Ogawa

IPC分类号： B05D1/18 ,  B05D1/20 ,  G02F1/361 ,  H01B1/12

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B05D1/202 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y40/00 ,  G02F1/3618 ,  H01B1/125

摘要： This invention relates to production of a super long conjugated polymer to be used for a molecular device, etc. According to this invention, an acetylene derivative is previously oriented and formed into a monomolecular film on the surface of a substrate and its acetylenic group is polymerized by a catalyst or by irradiation of an energy beam while keeping the orientation. Since the respective molecules are oriented and aligned on the substrate surface, the polymerization reaction readily proceeds, and after the polymerization the resulting polyacetylene molecules are prevented from the breakage of conjugated bonds caused by thermal agitation or twisting of the polyacetylene molecules. Accordingly, a polyacetylene or polyacene type polymer having long conjugated bonds can be obtained easily.

公开(公告)号：US5256456A

公开(公告)日：1993-10-26

申请号：US972151

申请日：1992-11-05

申请人： Kazufumi Ogawa

发明人： Kazufumi Ogawa

IPC分类号： B05D1/18 ,  G02F1/1337

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y40/00 ,  G02F1/133719 ,  Y10T428/1014 ,  Y10T428/31663

摘要： The invention concerns a liquid crystal alignment film, which comprises of a monomolecular film having straight carbon chains. The straight carbon chains are directly or indirectly chemically adsorbed at one end via a --Si--O-- bond to an electrode, and are crosslinked in a state of orientation in a particular direction.

摘要翻译： 本发明涉及一种液晶取向膜，其包含具有直链碳链的单分子膜。 直链碳链在一端通过-Si-O-键直接或间接地化学吸附到电极上，并且在特定方向的取向状态下交联。

公开(公告)号：US5093154A

公开(公告)日：1992-03-03

申请号：US402183

申请日：1989-09-05

申请人： Motoyoshi Hatada ,  Kazufumi Ogawa ,  Hideharu Tamura

发明人： Motoyoshi Hatada ,  Kazufumi Ogawa ,  Hideharu Tamura

IPC分类号： B05D1/20 ,  B05D1/18 ,  C08F30/08 ,  C09D4/00

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y40/00 ,  C09D4/00

摘要： A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.

摘要翻译： 对硅烷表面活性剂单分子层的单分子层叠膜的制造方法进行说明。 在此过程中，硅烷表面活性剂被化学吸附在基材的亲水表面上，并在活性气体气氛中进行高能束照射或等离子体处理以活化单分子层。 该活化层进一步被硅烷表面活性剂吸附以形成积层膜。 束照射或等离子体处理可以以期望的图案进行。 重复进行束照射或等离子体处理和进一步的吸附，直至得到所需数量的单分子层。

公开(公告)号：US5057339A

公开(公告)日：1991-10-15

申请号：US448237

申请日：1989-12-11

申请人： Kazufumi Ogawa

发明人： Kazufumi Ogawa

IPC分类号： B05D1/18 ,  B05D1/20 ,  G02F1/361 ,  H01B1/12

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B05D1/202 ,  B82Y10/00 ,  B82Y40/00 ,  G02F1/3615 ,  H01B1/125 ,  Y10T428/31536 ,  Y10T428/31663

摘要： A process for producing a metallized polyacetylene-type ultralong conjugated polymer comprising immersing a substrate having a hydrophilic surface in a first nonaqueous organic solution containing a compound containing an acetylenic group (--C.tbd.C--) and ##STR1## group (hereinafter referred to as silane-type surfactant) to deposit a chemisorbed layer of the silane-type surfactant on the substrate by chemisorption, immersing the substrate on which the chemisorbed layer is deposited in an aqueous solution containing a metal ion to replace a hydrogen atom connected to the acetylenic group by the metal atom, and immersing the substrate on which the chemisorbed layer is deposited in a second organic solution containing a metal salt catalyst to polymerize the molecules at the acetylenic group in the chemisorbed layer. A process according to the present invention makes it possible to obtain a metallized polyacetylene-type ultralong conjugated polymer which has excellent electrical conductivity and nonlinear optical effects and which is stable. Further, the present invention gives a metallized polyacene-type ultralong conjugated polymer.

摘要翻译： 一种金属化聚乙炔型超长共轭聚合物的制造方法，其特征在于，将具有亲水性表面的基材浸渍在含有含有炔基的化合物（-C3ONDC-C）和第一组（以下称为 硅烷型表面活性剂），通过化学吸附将硅烷型表面活性剂的化学吸附层沉积在基板上，将其上沉积有化学吸附层的基板浸入含有金属离子的水溶液中以代替与炔属基团连接的氢原子 通过金属原子，并将其上沉积有化学吸附层的基材浸入含有金属盐催化剂的第二有机溶液中以使化学吸附层中炔属基团上的分子聚合。 根据本发明的方法，可以获得具有优异导电性和非线性光学效应并且稳定的金属化聚乙炔型超长共轭聚合物。 此外，本发明提供金属化多并苯型超长共轭聚合物。

公开(公告)号：US4945028A

公开(公告)日：1990-07-31

申请号：US341257

申请日：1989-04-20

申请人： Kazufumi Ogawa

发明人： Kazufumi Ogawa

IPC分类号： G03F7/26

CPC分类号： G03F7/265 ,  B82Y30/00 ,  B82Y10/00 ,  B82Y40/00

摘要： Disclosed is a method for formation of a resist pattern used in the photo lithography steps for preparing semi-conductor devices and more particularly, a method for formation of a superfine resist pattern which comprises selectively exposing a resist surface of a photosensitive high molecular film to light to modify the exposed area to a hydrophilic property, chemically adsorbing a Si-containing reagent selectively to the modified area and then subjecting to O.sub.2 RIE using the Si-adsorbed film as a mask. The method is also characterized by enabling to formation of a finer pattern formation using a monomolecular film or monomolecular built-up film formed by the LB method or the chemical adsorption method in place of the resist described above.

摘要翻译： 公开了一种形成用于制备半导体器件的光刻步骤中的抗蚀剂图案的方法，更具体地，涉及形成超细抗蚀剂图案的方法，其包括将光敏高分子膜的抗蚀剂表面选择性地暴露于光 将曝光区域改性为亲水性，将含Si试剂选择性地吸附到改性区域，然后使用Si吸附膜作为掩模进行O2 RIE处理。 该方法的特征还在于使用通过LB法或化学吸附法形成的单分子膜或单分子组合膜代替上述抗蚀剂形成更精细的图案形成。

公开(公告)号：US4902585A

公开(公告)日：1990-02-20

申请号：US159291

申请日：1988-02-23

申请人： Kazufumi Ogawa ,  Hideharu Tamura

发明人： Kazufumi Ogawa ,  Hideharu Tamura

IPC分类号： G11B5/72 ,  B05D1/18 ,  G11B5/64 ,  G11B5/725 ,  G11B5/73 ,  G11B5/84

CPC分类号： B82Y30/00 ,  B05D1/185 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/725 ,  Y10S428/90

摘要： Disclosed is a recording medium which comprises a base body of the recording medium, a recording layer formed on the base body, and a protective layer formed on the recording layer for protecting the recording layer. The protection layer is made from a silane surface active agent containing fluorine atoms (e.g., CF.sub.3 --(CF.sub.2)m--(CH.sub.2)n--SiCl.sub.3 (m, n: integer) and the agent is polymerized with the recording layer. The recording medium may provide high density recording performance.

公开(公告)号：US4849323A

公开(公告)日：1989-07-18

申请号：US83199

申请日：1987-08-10

申请人： Masayuki Endo ,  Masaru Sasago ,  Kazufumi Ogawa

发明人： Masayuki Endo ,  Masaru Sasago ,  Kazufumi Ogawa

IPC分类号： G03F7/095 ,  G03C1/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

CPC分类号： G03C1/00 ,  G03F7/091

摘要： Disclosed is a pattern forming method using contrast enhanced material for enhancing the resolution and contrast when forming patterns in fabrication of semiconductors or the like. This pattern forming method comprises a step of applying a contrast enhanced material for pattern forming on a photoresist, a step of exposing and a step of developing.The contrast enhanced material is a water-soluble material using a novel diazo compound so that the coefficient A of the contrast may be 10 or more, and when it is combined with g-line exposure to be used in pattern formation, a pattern of 0.5 .mu.m or less may be formed.The diazo compound may be represented, for example, by ##STR1##

摘要翻译： 公开了使用对比度增强材料的图案形成方法，用于在半导体等的制造中形成图案时提高分辨率和对比度。 该图案形成方法包括在光致抗蚀剂上施加用于图案形成的对比度增强材料的步骤，曝光步骤和显影步骤。 对比度增强材料是使用新型重氮化合物的水溶性材料，使得对比度的系数A可以为10以上，并且当与用于图案形成的g线暴露组合时，图案为0.5 可以形成μm以下。 重氮化合物可以例如通过来表示

公开(公告)号：US4841341A

公开(公告)日：1989-06-20

申请号：US61266

申请日：1987-06-12

申请人： Kazufumi Ogawa ,  Masaru Sasago ,  Masayuki Endo ,  Ken Ishihara

发明人： Kazufumi Ogawa ,  Masaru Sasago ,  Masayuki Endo ,  Ken Ishihara

IPC分类号： G03F7/20

CPC分类号： G03F7/70058

摘要： An exposure apparatus for manufacturing semiconductor devices and in particular an excimer laser exposure apparatus includes, an integrator for uniformly distributing the excimer laser beam used as an exposure light source to render the exposure illuminance uniform at an exposure area. The integrator is characterized by a plurality of concentric-circular or parallel stripe-like recesses on one of two main opposing surfaces so that the light entering one main surface is dispersively radiated fromthe other main surface to render the excimer laser light from the light source uniform so as to reduce uneven exposure illuminance in the exposure area.

摘要翻译： 用于制造半导体器件的曝光装置，特别是准分子激光曝光装置包括：用于均匀分布用作曝光光源的准分子激光束的积分器，以使曝光照度在曝光区域均匀。 积分器的特征在于两个主要相对表面中的一个上的多个同心圆形或平行的条形凹槽，使得进入一个主表面的光从另一个主表面散射辐射，使来自光源的准分子激光光线均匀 以减少曝光区域中不均匀的曝光照度。

公开(公告)号：US4388128A

公开(公告)日：1983-06-14

申请号：US242578

申请日：1981-03-11

申请人： Kazufumi Ogawa ,  Shigeru Kondo ,  Yoshiko Yasuda ,  Taketoshi Yonezawa ,  Isamu Kitahiro

发明人： Kazufumi Ogawa ,  Shigeru Kondo ,  Yoshiko Yasuda ,  Taketoshi Yonezawa ,  Isamu Kitahiro

IPC分类号： G03F7/00 ,  H01L31/0216 ,  B29C27/10 ,  B32B31/20 ,  H01L31/18

CPC分类号： G03F7/0007 ,  H01L31/02162 ,  Y10T156/1074

摘要： In a step for bonding a color filter to a solid-state color-image sensor chip with an adhesive which is curable not only by light or more particularly ultraviolet-ray irradiation but also by heating, pre-curing or partial curing is effected by irradiating light rays after the color filter and the chip has been pressed against each other and correctly aligned with each other in a bonding device and then the chip with the partially-bonded color filter is removed from the bonding device and complete curing of the adhesive is accomplished by heating. According to one embodiment of the present invention the bonding step is carried out in an atmosphere containing the oxygen so that the adhesive which has been squeezed out from the space between the color filter and the clip may be prevented from being cured and subsequently removed in a simple manner. According to a further embodiment of the present invention, prior to the bonding step, the color filter and chip are covered with protective layers or films so that surface flaws may be avoided. Thus, the color filters can be bonded to the chips with a higher degree of accuracy and a higher degree of adhesive strength and the mass production of solid-state color-image sensors can be much facilitated.

摘要翻译： 在将滤色器与固态彩色图像传感器芯片接合的步骤中，不仅可以通过光线或更具体的紫外线照射而固化，而且通过加热固化，固化或部分固化可以通过照射 在滤色器之后的光线和芯片已经在接合装置中彼此压靠并且彼此正确地对准，然后将具有部分粘合的滤色器的芯片从接合装置移除并完成粘合剂的完全固化 通过加热。 根据本发明的一个实施方案，粘合步骤在含有氧的气氛中进行，从而可以防止从滤色器和夹子之间的空间挤出的粘合剂被固化并随后在 简单的方式。 根据本发明的另一实施例，在接合步骤之前，滤色器和芯片被保护层或膜覆盖，从而可以避免表面缺陷。 因此，可以以更高的准确度和更高的粘合强度将滤色器结合到芯片，并且可以大大方便固态彩色图像传感器的批量生产。