摘要:
To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness.A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.
摘要:
To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film. A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.
摘要:
A elastic member of weatherstrip has a base portion with nearly U-shaped section, lips extending from ends of the base portion. An edge of a door glass is adapted to be accommodated in an accommodating portion provided in the elastic member. Each of the inner wall of the accommodating portion, and the inner walls and the outer walls of the lips is covered with a surface treatment layer having a predetermined film thickness. In contrast, the outer wall of the base portion is not covered. An embossing for obtaining a surface like a pearskin-finished one with a surface irregularity is preliminarily performed on the outer wall of the base portion and the outer wall of each of the lips, so that the surface has gloss and color close to those of the surface treatment layer.
摘要:
A weather strip is attached to the periphery of an organic glass plate. The organic glass plate is supported by a slide panel. A space is defined between the weather strip and an end face of the periphery of the organic glass plate. The space accommodates thermal expansion of the organic glass plate. A tube is located at a corner of the weather strip. Foreign matter trapped in the space moves from the space to the tube and then is discharged from the space.
摘要:
A lead frame conveying apparatus comprises a driving force converting unit for transmitting to a frame receiving arm a horizontal reciprocating linear motion of an elliptic motion of a timing belt placed over two timing pulleys between the centers of the timing pulleys and converting semicircular motions at both ends of the horizontal reciprocating linear motion into vertical reciprocating linear motions by employing rolling contact for absorbing the horizontal component thereof and transmitting the vertical reciprocating linear motion to the frame receiving arm so as to put the frame receiving arm into a rectangular motion. The apparatus thus requires only one induction motor as a driving device.
摘要:
An apparatus for preventing the oxidation of a lead frame in a bonding system. The apparatus has a first introducing device for introducing a first atmospheric gas toward a bonding portion of the lead frame and a second introducing device for introducing a second atmospheric gas to shield the bonding portion from contact with ambient air simultaneously with the introduction of the first atmospheric gas.