Paper dehumidifying unit for image forming apparatus
    154.
    发明授权
    Paper dehumidifying unit for image forming apparatus 失效
    用于图像形成装置的纸除湿单元

    公开(公告)号:US5600427A

    公开(公告)日:1997-02-04

    申请号:US325932

    申请日:1994-10-19

    CPC分类号: F26B21/10 F26B23/04

    摘要: Two lowermost heating members and one intermediate heating member are provided for a plurality of paper feeding trays disposed in the paper feeding portion of an image forming apparatus and the temperature in the whole paper feeding portion is controlled by supplying power to each of the heating members. The heating member is provided with a heat reflective plate and a heat insulating plate side by side to insulate the heat of a heating element. The heating member is placed close to the tray and the temperature in the whole paper feeding portion is controlled under a convection current of the heat emanated from the heating element in the paper feed. Moreover, a humidity sensor may be installed on the side or within the image forming apparatus to control the power supplied to each heating member.

    摘要翻译: 为设置在图像形成装置的供纸部分中的多个供纸托盘提供两个最下面的加热构件和一个中间加热构件,并且通过向每个加热构件供电来控制整个供纸部分中的温度。 加热部件并排设置有热反射板和绝热板,以使加热元件的热​​绝缘。 加热构件放置在靠近托盘的位置,并且整个送纸部分中的温度被控制在来自供纸装置中的加热元件的热​​量的对流。 此外,湿度传感器可以安装在图像形成装置的侧面或内部,以控制供应到每个加热构件的功率。

    Vibration-damping sheet
    155.
    发明授权
    Vibration-damping sheet 失效
    减震片

    公开(公告)号:US5229216A

    公开(公告)日:1993-07-20

    申请号:US784602

    申请日:1991-10-24

    IPC分类号: F16F9/30 G10K11/16

    摘要: This invention is a light weight vibration-damping sheet comprising an asphalt binder component, a hollow filler component and a surface treated calcium carbonate treated with a higher fatty acid or its salt, such as aluminum stearate, which acts as a hollow filler dispersion agent. As the hollow filler is dispersed uniformly in the asphalt, the sheet forming workability of the composition is greatly improved.

    摘要翻译: 本发明是一种重量轻的减震片,其包含用作中空填料分散剂的沥青粘合剂组分,中空填料组分和用高级脂肪酸或其盐处理的表面处理的碳酸钙,例如硬脂酸铝。 随着中空填料均匀分散在沥青中,组合物的成型加工性大大提高。

    Silicon thin film transistor
    156.
    发明授权
    Silicon thin film transistor 失效
    硅薄膜晶体管

    公开(公告)号:US5122849A

    公开(公告)日:1992-06-16

    申请号:US564818

    申请日:1990-08-08

    IPC分类号: H01L29/786

    摘要: A silicon thin film transistor array includes a plurality of silicon thin film transistors in an array-like form, each silicon thin film transistor including an insulating substrate, a gate electrode formed on the insulating substrate, a gate insulating layer formed on the insulating substrate containing the gate electrode, a pair of first impurity contained silicon layers formed on the gate insulating layer in such a manner as to transversely cross a terminal part of the gate electrode, an intrinsic silicon layer formed on the pair of first impurity contained silicon layers and on the gate insulating layer between the pair of first impurity contained silicon layers in such a manner as to connect the pair of first impurity contained silicon layers, a protective insulation layer formed on the intrinsic silicon layer, and a source electrode and a drain electrode formed at contact parts of the pair of first impurity contained silicon layers; gate wiring for connecting the gate electrodes of the silicon thin film transistors to each other; and source wiring for connecting the source electrodes of the silicon thin film transistors to each other.

    摘要翻译: 硅薄膜晶体管阵列包括阵列状形式的多个硅薄膜晶体管,每个硅薄膜晶体管包括绝缘基板,形成在绝缘基板上的栅电极,形成在绝缘基板上的栅绝缘层, 栅电极,一对第一杂质含有在栅极绝缘层上形成的跨越栅电极的端部的硅层,形成在一对第一杂质上的本征硅层含有硅层和在 一对第一杂质之间的栅极绝缘层包含硅层,以便连接一对第一杂质含硅层,形成在本征硅层上的保护绝缘层,以及形成在源极电极和漏电极 该对第一杂质的接触部分含有硅层; 用于将硅薄膜晶体管的栅电极彼此连接的栅极布线; 以及用于将硅薄膜晶体管的源电极彼此连接的源极布线。

    Silicon thin film transistor
    157.
    发明授权
    Silicon thin film transistor 失效
    硅薄膜晶体管

    公开(公告)号:US5121178A

    公开(公告)日:1992-06-09

    申请号:US564816

    申请日:1990-08-08

    IPC分类号: H01L21/336 H01L29/786

    摘要: A silicon thin film transistor array includes a plurality of silicon thin film transistors in an array-like form, each silicon thin film transistor including an insulating substrate, a gate electrode formed on the insulating substrate, a gate insulating layer formed on the insulating substrate containing the gate electrode, a pair of first impurity contained silicon layers formed on the gate insulating layer in such a manner as to transversely cross a terminal part of the gate electrode, an intrinsic silicon layer formed on the pair of first impurity contained silicon layers and on the gate insulating layer between the pair of first impurity contained silicon layers in such a manner as to connect the pair of first impurity contained silicon layers, a protective insulating layer formed on the intrinsic silicon layer, and a source electrode and a drain electrode formed at contact parts of the pair of first impurity contained silicon layers; gate wiring for connecting the gate electrodes of the silicon thin film transistors to each other; and source wiring for connecting the source electrodes of the silicon thin film transistors to each other.

    Silicon thin film transistor
    158.
    发明授权

    公开(公告)号:US5121177A

    公开(公告)日:1992-06-09

    申请号:US564806

    申请日:1990-08-08

    IPC分类号: H01L21/336 H01L29/786

    摘要: A silicon thin film transistor array includes a plurality of silicon thin film transistors in an array-like form, each silicon thin film transistor including an insulating substrate, a gate electrode formed on the insulating substrate, a gate insulating layer formed on the insulating substrate containing the gate electrode, a pair of first impurity contained silicon layers formed on the gate insulating layer in such a manner as to transversely cross a terminal part of the gate electrode, an intrinsic silicon layer formed on the pair of first impurity contained silicon layers and on the gate insulating layer between the pair of first impurity contained silicon layers in such a manner as to connect the pair of first impurity contained silicon layers, a protective insulation layer formed on the intrinsic silicon layer, and a source electrode and a drain electrode formed at contact parts of the pair of first impurity contained silicon layers; gate wiring for connecting the gate electrodes of the silicon thin film transistors to each other; and source writing for connecting the source electrodes of the silicon thin film transistors to each other.