公开(公告)号：US06794422B1

公开(公告)日：2004-09-21

申请号：US10088530

申请日：2002-08-15

Applicant: Bernd Bruchmann ,  Reinhold Schwalm ,  Wolfgang Paulus ,  Rainer Blum

Inventor： Bernd Bruchmann ,  Reinhold Schwalm ,  Wolfgang Paulus ,  Rainer Blum

IPC: C08G1863

CPC classification number: C09D175/16 ,  C08G18/73 ,  Y10T428/31551

Abstract: A polymerizable solid aliphatic polyurethane containing olefinically unsaturated double bonds, having a very narrow melting range within the temperature range from 40 to 200° C., which is preparable from A) at least one linear aliphatic diisocyanate, B) at least one aliphatic compound containing at least two isocyanate-reactive functional groups and/or water, and C) at least one olefinically unsaturated compound containing an isocyanate-reactive functional group, and its use as a powder coating material or for preparing powder coating materials.

Abstract translation: 一种含有烯属不饱和双键的可聚合固体脂族聚氨酯，其熔点范围在40至200℃的范围内非常窄，可由A）至少一种直链脂族二异氰酸酯制备，B）至少一种含有 至少两种异氰酸酯反应性官能团和/或水，和C）至少一种含有异氰酸酯反应性官能团的烯属不饱和化合物，以及其作为粉末涂料或用于制备粉末涂料的用途。

公开(公告)号：US06747088B1

公开(公告)日：2004-06-08

申请号：US10088520

申请日：2002-03-29

Applicant: Reinhold Schwalm ,  Wolfgang Paulus ,  Uwe Meisenburg ,  Erich Beck ,  Bernd Bruchmann ,  Wolfgang Schrof ,  Frank Völlinger

Inventor： Reinhold Schwalm ,  Wolfgang Paulus ,  Uwe Meisenburg ,  Erich Beck ,  Bernd Bruchmann ,  Wolfgang Schrof ,  Frank Völlinger

IPC: C08J300

CPC classification number: C09D175/16 ,  C08G18/0819 ,  C08G18/7837 ,  C08G18/8061 ,  C08G18/807 ,  Y10T428/31551

Abstract: UV- and heat-curable aqueous polyurethane dispersions comprise compounds attached via polyisocyanates and containing UV-polymerizable C═C double bonds, aliphatic diols incorporated by way of isocyanates and having a molecular weight of less than 500 g/mol, compounds attached via isocyanates and containing carboxylic acid or sulfonic acid groups and/or salts thereof, free hydroxyl groups, and compounds containing blocked isocyanate groups. They are suitable for coating heat-stable substrates such as metal substrates and may be used with advantage for automotive clearcoats.

Abstract translation: 紫外线和可热固化的水性聚氨酯分散体包含通过多异氰酸酯连接并含有可UV聚合的C = C双键的化合物，通过异氰酸酯引入并具有小于500g / mol的分子量的脂族二醇，通过异氰酸酯连接的化合物和 含有羧酸或磺酸基团和/或其盐，游离羟基和含有封端异氰酸酯基团的化合物。 它们适合于涂覆诸如金属基底的热稳定基底，并且可以有利地用于汽车清漆。

公开(公告)号：US06447836B1

公开(公告)日：2002-09-10

申请号：US09744436

申请日：2001-01-24

Applicant: Wolfgang Schrof ,  Dieter Horn ,  Reinhold Schwalm ,  Uwe Meisenburg ,  Andreas Pfau

Inventor： Wolfgang Schrof ,  Dieter Horn ,  Reinhold Schwalm ,  Uwe Meisenburg ,  Andreas Pfau

IPC: B05D314

CPC classification number: B05D5/061 ,  B01J19/0046 ,  B01J2219/00364 ,  B01J2219/00378 ,  B01J2219/00443 ,  B01J2219/00479 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00691 ,  B01J2219/00693 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00756 ,  B05D3/06 ,  B05D3/067 ,  B05D3/068 ,  C40B40/14 ,  C40B60/14

Abstract: The present invention relates to a method of and a device for optimizing at least one coating material at at least one point of a substrate surface to which the coating material is applied. The method, which is carried out with the corresponding device, comprises at least the following steps: a) applying said at least one coating material to said at least one point of the substrate surface, b) curing said at least one coating material at said at least one point of the substrate surface, and c) determining the state, especially the curing and/or yellowing and/or gloss, of said coating material at said at least one point of the substrate surface, possessed by said coating material as a consequence of steps a) and b).

Abstract translation: 本发明涉及一种用于在施加涂层材料的基底表面的至少一个点处优化至少一种涂层材料的方法和装置。 用相应的装置进行的方法至少包括以下步骤：a）将所述至少一种涂层材料施加到所述基材表面的所述至少一个点上，b）在所述的至少一个涂层材料上固化所述至少一个涂层材料 衬底表面的至少一个点，以及c）确定所述涂层材料在衬底表面的所述至少一个点处的状态，特别是固化和/或变黄和/或光泽，所述涂层材料具有作为 步骤a）和b）的后果。

公开(公告)号：US06172170B2

公开(公告)日：2001-01-09

申请号：US09472200

申请日：1999-12-27

Applicant: Rainer Königer ,  Reinhold Schwalm ,  Roman Benedikt Raether

Inventor： Rainer Königer ,  Reinhold Schwalm ,  Roman Benedikt Raether

IPC: C08F404

CPC classification number: C08F4/04 ,  C07D231/54 ,  C07D271/12 ,  C07D487/08 ,  C07F7/0814

Abstract: Initiators for free-radical addition polymerization comprising as structural feature the Diels-Alder adduct of an azo group (—N═N—) with a conjugated double bond (diene).

Abstract translation: 包括具有偶合基团（-N = N-）与共轭双键（二烯）的狄尔斯 - 阿尔德加合物的结构特征的自由基加聚的引发剂。

公开(公告)号：USRE35217E

公开(公告)日：1996-04-23

申请号：US240166

申请日：1994-05-09

Applicant: Reinhold Schwalm ,  Horst Binder

Inventor： Reinhold Schwalm ,  Horst Binder

IPC: G03F7/32 ,  G03C5/30

CPC classification number: G03F7/322

Abstract: An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.It is suitable for developing positive-working photoresists.

Abstract translation: 水性显影剂溶液含有通式（I）的化合物，其中R 1至R 5相同或不同，各自为H，OH，羟基烷基，烷氧基或烷基。 适合开发正性光刻胶。

公开(公告)号：US5260410A

公开(公告)日：1993-11-09

申请号：US844977

申请日：1992-03-02

Applicant: Reinhold Schwalm

Inventor： Reinhold Schwalm

IPC: G03F7/039 ,  C08G64/08

CPC classification number: G03F7/039

Abstract: Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.

Abstract translation: 辐射敏感性聚合物在聚合物主链中含有具有非亲核抗衡离子的酸不稳定基团和鎓盐基团，并且适用于半导体结构元素的生产。

公开(公告)号：US5159088A

公开(公告)日：1992-10-27

申请号：US551779

申请日：1990-07-12

Applicant: Reinhold Schwalm

Inventor： Reinhold Schwalm

IPC: C07C381/12 ,  C07F9/32 ,  C08F2/50 ,  G03F7/029 ,  G03F7/039

CPC classification number: C07C381/12 ,  C08F2/50 ,  G03F7/029

Abstract: Novel sulfonium salts suitable for use as photoinitiators for cationic polymerization and for photoresists have the general formula (I) ##STR1## where X is 1, 2 or 3,R is a hydrocarbon radicalR.sup.1 is hydrogen, alkyl, alkoxy, halogen or nitro,R.sup.2 is a monovalent radical containing more than 6 carbon atoms,Y is a single bond or a bridge member andA.sup..crclbar. is a non-nucleophilic counterion.

Abstract translation: 适用于阳离子聚合的光引发剂和光致抗蚀剂的新型锍​​盐具有通式（I）其中X为1,2或3，R为烃基，R 1为氢，烷基，烷氧基，卤素 或硝基，R 2是含有多于6个碳原子的一价基团，Y是单键或桥连构件，A（ - ）是非亲核反离子。

公开(公告)号：US5130392A

公开(公告)日：1992-07-14

申请号：US462716

申请日：1990-01-09

Applicant: Reinhold Schwalm ,  Andreas Boettcher

Inventor： Reinhold Schwalm ,  Andreas Boettcher

IPC: C08F8/00 ,  C08F20/10 ,  C08F20/38 ,  C08F20/52 ,  C08F28/00 ,  C08F30/08 ,  C08F212/14 ,  C08F220/10 ,  C08F220/38 ,  C08F220/58 ,  C08F228/02 ,  C08F230/08 ,  C08F246/00 ,  C08G59/00 ,  C08L63/00 ,  G03F7/039

CPC classification number: G03F7/039 ,  C08F246/00

Abstract: Radiation-sensitive polymers suitable for use in positive- and negative-working recording elements contain not only acid-labile groups but also onium salt groups having nonnucleophilic counterions in one and the same molecule.

Abstract translation: 适用于正负作用记录元件的辐射敏感聚合物不仅含有酸不稳定基团，而且含有在同一分子中具有非亲核抗衡离子的鎓盐基团。

公开(公告)号：US5069998A

公开(公告)日：1991-12-03

申请号：US352419

申请日：1989-05-16

Applicant: Reinhold Schwalm ,  Andreas Boettcher ,  Martin Fischer ,  Horst Binder

Inventor： Reinhold Schwalm ,  Andreas Boettcher ,  Martin Fischer ,  Horst Binder

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0045 ,  Y10S430/111 ,  Y10S430/122

Abstract: A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, and in addition(c) a nonphotosensitive organic compound which contains at least one acid cleavable bond and the solubility of which in an aqueous alkaline developer is increased by the action of acid, or(d) a nonphotosensitive organic compound which contains at least one acid cleavable bond and which by the action of acid decomposes in such a way as to be completely removable by treatment at from 60.degree. to 120.degree. C.

Abstract translation: 用于产生浮雕图案的辐射敏感混合物包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物， 含有至少一个酸可裂解基团，另外是在照射时形成强酸的基团，另外（c）含有至少一个酸可裂解键的非光敏有机化合物，其在碱性显影液中的溶解度增加 酸的作用，或（d）含有至少一个酸可分解键的非光敏有机化合物，其通过酸分解的作用可以通过在60℃至120℃下处理而完全除去。

公开(公告)号：US5069997A

公开(公告)日：1991-12-03

申请号：US352459

申请日：1989-05-16

Applicant: Reinhold Schwalm ,  Horst Binder

Inventor： Reinhold Schwalm ,  Horst Binder

IPC: G03F7/023 ,  C08F8/00 ,  C08F12/22 ,  C08G8/28 ,  C08G8/36 ,  C08K5/372 ,  C08L25/18 ,  C08L61/08 ,  C09D125/18 ,  C09D161/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/039 ,  G03F7/0045

Abstract: Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

Abstract translation: 适用于特别用于产生浮雕图案的正和负工作辐射敏感性混合物包含聚合物粘合剂和其在碱性显影液中的溶解度通过酸的作用而增加并且含有至少一个酸可裂解基团以及另外的基团的有机化合物 其在照射时形成强酸，聚合物粘合剂是含有酚羟基与二氢吡喃或与烷基乙烯基醚的聚合物的反应产物。