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29 条记录 (耗时 0.015 秒)

    Four-layer antireflection coating for deposition in in-like DC sputtering apparatus
    11.
    发明授权
    Four-layer antireflection coating for deposition in in-like DC sputtering apparatus 失效
    用于在类似DC溅射装置中沉积的四层抗反射涂层

    公开(公告)号：US5450238A

    公开(公告)日：1995-09-12

    申请号：US165438

    申请日：1993-12-10

    申请人： Erik J. Bjornard ,  Debra M. Steffenhagen ,  Eric R. Dickey

    发明人： Erik J. Bjornard ,  Debra M. Steffenhagen ,  Eric R. Dickey

    IPC分类号： C03C17/34 ,  G02B1/11 ,  G02B5/28

    CPC分类号： G02B1/116 ,  C03C17/3417

    摘要： An antireflection coating for a substrate including four layers and having optimized photopic reflectance and optimized for deposition by sputtering. The first layer (the layer farthest from the substrate) has a refractive index less than the refractive index of the substrate and a thickness of about one-quarter wavelength. The second layer (the layer adjacent the first layer) has an refractive index greater than about 2.2 and a thickness of about a half wavelength. The third layer has refractive index less than that of the second layer. The fourth layer (the layer adjacent the substrate) has a refractive index less than about 2.0 and greater than that of the third layer. The combined thickness of the third and fourth layers is less than about a quarter wavelength. The first and third layers may include silicon dioxide. The second layer may include titanium dioxide or niobium oxide. The fourth layer may include indium oxide, tin oxide, indium tin oxide, or zinc oxide.

    摘要翻译： 一种用于基板的防反射涂层，包括四层，并具有优化的光反射率，并优化用于通过溅射沉积。 第一层（距离衬底最远的层）具有小于衬底的折射率的折射率和约四分之一波长的厚度。 第二层（与第一层相邻的层）具有大于约2.2的折射率和约半波长的厚度。 第三层的折射率小于第二层的折射率。 第四层（邻近衬底的层）的折射率小于约2.0且大于第三层的折射率。 第三层和第四层的组合厚度小于约四分之一波长。 第一层和第三层可以包括二氧化硅。 第二层可以包括二氧化钛或氧化铌。 第四层可包括氧化铟，氧化锡，氧化铟锡或氧化锌。

    Anode structures for magnetron sputtering apparatus
    13.
    发明授权
    Anode structures for magnetron sputtering apparatus 失效
    MAGNETRON SPUTTERING设备的阳极结构

    公开(公告)号：US5106474A

    公开(公告)日：1992-04-21

    申请号：US616673

    申请日：1990-11-21

    申请人： Eric R. Dickey ,  Erik J. Bjornard ,  James J. Hoffmann

    发明人： Eric R. Dickey ,  Erik J. Bjornard ,  James J. Hoffmann

    IPC分类号： C23C14/35 ,  C23C14/56 ,  H01J37/34

    CPC分类号： H01J37/3438 ,  C23C14/564 ,  H01J37/3405 ,  H01J37/3455 ,  H01J2237/332

    摘要： An in-line sputtering system with rotating cylindrical magnetrons is fitted with a system of anodes having a large surface area. The surface area is equal to or greater than the surface area of the sputtering chambers' internal walls. The anodes may be grounded, allowed to float electrically, or connected to a separate bias power supply. The anode surfaces are protected from contamination by sputtered material or are designed so the electron collecting surface may be replaced during the sputtering process. The anodes may be equipped with a magnet array for improving electron collecting efficiency.

    摘要翻译： 具有旋转圆柱形磁控管的在线溅射系统装配有具有大表面积的阳极系统。 表面积等于或大于溅射室内壁的表面积。 阳极可以接地，允许电气浮动或连接到单独的偏置电源。 保护阳极表面免受溅射材料的污染，或者设计成可以在溅射过程中更换电子收集表面。 阳极可以配备有用于提高电子收集效率的磁体阵列。

    Spring-loaded mount for a rotatable sputtering cathode
    14.
    发明授权
    Spring-loaded mount for a rotatable sputtering cathode 失效
    用于可旋转溅射阴极的弹簧加载座

    公开(公告)号：US5620577A

    公开(公告)日：1997-04-15

    申请号：US590811

    申请日：1996-01-24

    申请人： Clifford L. Taylor

    发明人： Clifford L. Taylor

    IPC分类号： C23C14/34 ,  H01J37/34 ,  C23C14/35

    CPC分类号： H01J37/3435 ,  C23C14/3407 ,  H01J37/3405 ,  H01J37/3441

    摘要： A rotatable magnetron cathode has one end adapted to be attached to a drive shaft and a free end supported by a yoke suspended from spring-loaded supporting devices attached to a sputtering chamber wall. A dark space shield is attached to the cathode where the cathode connects to the drive shaft of its motor so as to rotate with the cathode. Another dark space shield is attached at the free end of the cathode with an insulator bearing in between such that the cathode can rotate without causing the shield at its front to also rotate. An insulator pad is placed between the yoke and a metal cover piece attached to the shield at the front so as to keep the frontal dark space shield in an electrically floating condition.

    摘要翻译： 可旋转的磁控管阴极具有一端，该端部适于附接到驱动轴和由连接到溅射室壁的弹簧加载的支撑装置悬挂的轭架支撑的自由端。 暗阴极附着在阴极上，阴极与电动机的驱动轴连接，以便与阴极一起旋转。 在阴极的自由端处附加另一个暗空间屏蔽，其间具有绝缘体轴承，使得阴极可以旋转而不使其前部的屏蔽也旋转。 绝缘体垫被放置在轭和金属盖片之间，金属盖片在前面附着到护罩上，以便将正面的暗空间屏蔽保持在电浮动状态。

    Shielding for arc suppression in rotating magnetron sputtering systems
    15.
    发明授权
    Shielding for arc suppression in rotating magnetron sputtering systems 失效
    用于旋转磁控溅射系统中的电弧抑制的屏蔽

    公开(公告)号：US5470452A

    公开(公告)日：1995-11-28

    申请号：US158729

    申请日：1993-11-29

    申请人： Eric R. Dickey ,  Erik J. Bjornard

    发明人： Eric R. Dickey ,  Erik J. Bjornard

    IPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/34

    CPC分类号： C23C14/3407 ,  C23C14/3414 ,  H01J37/3405 ,  H01J2237/0206

    摘要： A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

    摘要翻译： 一种用于旋转圆柱形磁控管的阴极体，其中磁控管提供沿着阴极体的长度延伸并沿着其相对窄的区域周向延伸的溅射区。 阴极体包括在其外表面具有目标材料的细长管状构件。 导电材料的套环位于管状构件的至少一端，并从管状构件的一端延伸到侵蚀区域中。 导电材料套筒可围绕套环周向延伸。

    Shutter apparatus for a coating chamber viewport
    20.
    发明授权
    Shutter apparatus for a coating chamber viewport 失效
    用于涂料室视口的快门装置

    公开(公告)号：US5413688A

    公开(公告)日：1995-05-09

    申请号：US193326

    申请日：1994-02-08

    申请人： Daniel T. Crowley

    发明人： Daniel T. Crowley

    IPC分类号： C23C14/52

    CPC分类号： C23C14/52

    摘要： A shutter apparatus capable of protecting the interior surface of an evacuable optical coating chamber viewport from the deposition of off-substrate coating material when in the closed position, and exposing the viewport surface to permit viewing through the viewport into the chamber when in the open position. The movement of the shutter between the open and closed positions is accomplished without breaching the chamber seal.

    摘要翻译： 一种快门装置，其能够在处于关闭位置时保护可抽出的光学涂层室视口的内表面与离开基底涂层材料的沉积，并且当处于打开位置时，使视口表面暴露于通过视口进入腔室 。 快门在打开和关闭位置之间的移动是在不破坏腔室密封的情况下完成的。