公开(公告)号：US20070264736A1

公开(公告)日：2007-11-15

申请号：US11765528

申请日：2007-06-20

Applicant: Chun-Ju Huang

Inventor： Chun-Ju Huang

IPC: H01L21/822

CPC classification number: H01L27/1288 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/66765

Abstract: Array substrates for use in TFT-LCDs and fabrication methods thereof. A transparent conductive layer, a first metal layer, a first insulating layer, a semiconductor layer, a second insulating layer and a sacrificial layer are sequentially formed on a substrate. With a first photomask, a photoresist layer with various thicknesses is formed on part of the sacrificial layer. Using the photoresist layer as an etching mask, a gate line having a gate, a channel layer on the gate, a gate pad at the end portion of the gate line, a pixel electrode and a source pad are defined. An insulating spacer is formed on the sidewalls of the gate and gate line. With a second photomask, a source line, source and drain are formed. The source pad connects the end portion of the source line. An array substrate is thus obtained with only two photomasks.

Abstract translation: 用于TFT-LCD的阵列衬底及其制造方法。 依次在基板上形成透明导电层，第一金属层，第一绝缘层，半导体层，第二绝缘层和牺牲层。 利用第一光掩模，在牺牲层的一部分上形成具有各种厚度的光致抗蚀剂层。 使用光致抗蚀剂层作为蚀刻掩模，限定具有栅极的栅极线，栅极上的沟道层，栅极线的端部处的栅极焊盘，像素电极和源极焊盘。 在栅极和栅极线的侧壁上形成绝缘间隔物。 使用第二光掩模，形成源极线，源极和漏极。 源极焊盘连接源极线的端部。 因此，仅使用两个光掩模获得阵列基板。