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    Array substrates for use in liquid crystal displays and fabrication methods thereof
    1.
    发明授权
    Array substrates for use in liquid crystal displays and fabrication methods thereof 有权
    用于液晶显示器的阵列基板及其制造方法

    公开(公告)号：US07718994B2

    公开(公告)日：2010-05-18

    申请号：US11765528

    申请日：2007-06-20

    Applicant: Chun-Ju Huang

    Inventor： Chun-Ju Huang

    IPC: H01L31/00 ,  G02F1/1343

    CPC classification number: H01L27/1288 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/66765

    Abstract: Array substrates for use in TFT-LCDs and fabrication methods thereof. A transparent conductive layer, a first metal layer, a first insulating layer, a semiconductor layer, a second insulating layer and a sacrificial layer are sequentially formed on a substrate. With a first photomask, a photoresist layer with various thicknesses is formed on part of the sacrificial layer. Using the photoresist layer as an etching mask, a gate line having a gate, a channel layer on the gate, a gate pad at the end portion of the gate line, a pixel electrode and a source pad are defined. An insulating spacer is formed on the sidewalls of the gate and gate line. With a second photomask, a source line, source and drain are formed. The source pad connects the end portion of the source line. An array substrate is thus obtained with only two photomasks.

    Abstract translation: 用于TFT-LCD的阵列衬底及其制造方法。 依次在基板上形成透明导电层，第一金属层，第一绝缘层，半导体层，第二绝缘层和牺牲层。 利用第一光掩模，在牺牲层的一部分上形成具有各种厚度的光致抗蚀剂层。 使用光致抗蚀剂层作为蚀刻掩模，限定具有栅极的栅极线，栅极上的沟道层，栅极线的端部处的栅极焊盘，像素电极和源极焊盘。 在栅极和栅极线的侧壁上形成绝缘间隔物。 使用第二光掩模，形成源极线，源极和漏极。 源极焊盘连接源极线的端部。 因此，仅使用两个光掩模获得阵列基板。

    ARRAY SUBSTRATES FOR USE IN LIQUID CRYSTAL DISPLAYS AND FABRICATION METHODS THEREOF
    2.
    发明申请
    ARRAY SUBSTRATES FOR USE IN LIQUID CRYSTAL DISPLAYS AND FABRICATION METHODS THEREOF 有权
    用于液晶显示器的阵列基板及其制造方法

    公开(公告)号：US20070264736A1

    公开(公告)日：2007-11-15

    申请号：US11765528

    申请日：2007-06-20

    Applicant: Chun-Ju Huang

    Inventor： Chun-Ju Huang

    IPC: H01L21/822

    CPC classification number: H01L27/1288 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/66765

    Abstract: Array substrates for use in TFT-LCDs and fabrication methods thereof. A transparent conductive layer, a first metal layer, a first insulating layer, a semiconductor layer, a second insulating layer and a sacrificial layer are sequentially formed on a substrate. With a first photomask, a photoresist layer with various thicknesses is formed on part of the sacrificial layer. Using the photoresist layer as an etching mask, a gate line having a gate, a channel layer on the gate, a gate pad at the end portion of the gate line, a pixel electrode and a source pad are defined. An insulating spacer is formed on the sidewalls of the gate and gate line. With a second photomask, a source line, source and drain are formed. The source pad connects the end portion of the source line. An array substrate is thus obtained with only two photomasks.

    Abstract translation: 用于TFT-LCD的阵列衬底及其制造方法。 依次在基板上形成透明导电层，第一金属层，第一绝缘层，半导体层，第二绝缘层和牺牲层。 利用第一光掩模，在牺牲层的一部分上形成具有各种厚度的光致抗蚀剂层。 使用光致抗蚀剂层作为蚀刻掩模，限定具有栅极的栅极线，栅极上的沟道层，栅极线的端部处的栅极焊盘，像素电极和源极焊盘。 在栅极和栅极线的侧壁上形成绝缘间隔物。 使用第二光掩模，形成源极线，源极和漏极。 源极焊盘连接源极线的端部。 因此，仅使用两个光掩模获得阵列基板。

    Array substrates for use in liquid crystal displays and fabrication methods thereof
    4.
    发明授权
    Array substrates for use in liquid crystal displays and fabrication methods thereof 有权
    用于液晶显示器的阵列基板及其制造方法

    公开(公告)号：US07241648B2

    公开(公告)日：2007-07-10

    申请号：US11068146

    申请日：2005-02-28

    Applicant: Chun-Ju Huang

    Inventor： Chun-Ju Huang

    IPC: H01L21/00

    CPC classification number: H01L27/1288 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/66765

    Abstract: Array substrates for use in TFT-LCDs and fabrication methods thereof. A transparent conductive layer, a first metal layer, a first insulating layer, a semiconductor layer, a second insulating layer and a sacrificial layer are sequentially formed on a substrate. With a first photomask, a photoresist layer with various thicknesses is formed on part of the sacrificial layer. Using the photoresist layer as an etching mask, a gate line having a gate, a channel layer on the gate, a gate pad at the end portion of the gate line, a pixel electrode and a source pad are defined. An insulating spacer is formed on the sidewalls of the gate and gate line. With a second photomask, a source line, source and drain are formed. The source pad connects the end portion of the source line. An array substrate is thus obtained with only two photomasks.

    Abstract translation: 用于TFT-LCD的阵列衬底及其制造方法。 依次在基板上形成透明导电层，第一金属层，第一绝缘层，半导体层，第二绝缘层和牺牲层。 利用第一光掩模，在牺牲层的一部分上形成具有各种厚度的光致抗蚀剂层。 使用光致抗蚀剂层作为蚀刻掩模，限定具有栅极的栅极线，栅极上的沟道层，栅极线的端部处的栅极焊盘，像素电极和源极焊盘。 在栅极和栅极线的侧壁上形成绝缘间隔物。 使用第二光掩模，形成源极线，源极和漏极。 源极焊盘连接源极线的端部。 因此，仅使用两个光掩模获得阵列基板。

    Photomask method for making the same capacitor cell area near outmost cell arrays
    5.
    发明授权
    Photomask method for making the same capacitor cell area near outmost cell arrays 有权
    用于使相邻电容器单元区域靠近最外面的单元阵列的光掩模方法

    公开(公告)号：US06446252B1

    公开(公告)日：2002-09-03

    申请号：US09635649

    申请日：2000-08-10

    Applicant: Wen-shiang Liao ,  Ching-Ying Lee ,  Chun-Ju Huang ,  Chao-Ming Koh

    Inventor： Wen-shiang Liao ,  Ching-Ying Lee ,  Chun-Ju Huang ,  Chao-Ming Koh

    IPC: G06F1750

    CPC classification number: G03F1/36 ,  G03F7/70441

    Abstract: A method for manufacturing a photomask of cylindrical capacitor arrays surrounded by a corrugated protection trench is provided. First, a capacitor array layout is generated, next, the capacitor array patterns are copied to protection trench area with exact the same shape and pitch, finally, the protection trench is finished by filling connecting patterns between gaps of the capacitor arrays. A corrugated close loop protection trench pattern can hence be developed upon photoresist through the exposing and is developing of a photo stepper.

    Abstract translation: 提供了一种制造由波纹状保护沟围绕的圆柱形电容器阵列的光掩模的方法。 首先，产生电容器阵列布局，接下来，电容器阵列图案被复制到具有完全相同形状和间距的保护沟槽区域，最后，通过填充电容器阵列的间隙之间的连接图案来完成保护沟槽。 因此，可以通过曝光在光致抗蚀剂上显影波纹闭环保护沟槽图案，并且正在显影照相步进机。

    Rapid-mounting security monitoring and controlling system
    9.
    发明授权
    Rapid-mounting security monitoring and controlling system 有权
    快速安装监控系统

    公开(公告)号：US07193511B2

    公开(公告)日：2007-03-20

    申请号：US10856821

    申请日：2004-06-01

    Applicant: Chun-Ju Huang

    Inventor： Chun-Ju Huang

    IPC: G08B29/00

    CPC classification number: H04N7/181 ,  G08B13/19645 ,  G08B13/19663 ,  H04N7/106

    Abstract: A rapid-mounting security monitoring and controlling system is disclosed. Co-axial cable is used to transmit power supply, images, sound, and to control detected signals so as to rapidly installation of wirings for the security monitoring and controlling system. The complexity of wiring installation is improved and the installation cost and the material cost are greatly reduced.

    Abstract translation: 公开了一种快速安装的安全监控系统。 同轴电缆用于传输电源，图像，声音，并控制检测信号，从而快速安装安全监控系统的布线。 提高了布线安装的复杂性，大大降低了安装成本和材料成本。

    Method for preparing YAG fluorescent powder
    10.
    发明申请
    Method for preparing YAG fluorescent powder 审中-公开
    制备YAG荧光粉的方法

    公开(公告)号：US20060145124A1

    公开(公告)日：2006-07-06

    申请号：US11319542

    申请日：2005-12-29

    Applicant: Ching-Sung Hsiao ,  Ting-Wei Huang ,  Ming-Shiann Shih ,  Jau-Chyn Huang ,  Chun-Ju Huang ,  Ming-Shyong Tsai

    Inventor： Ching-Sung Hsiao ,  Ting-Wei Huang ,  Ming-Shiann Shih ,  Jau-Chyn Huang ,  Chun-Ju Huang ,  Ming-Shyong Tsai

    IPC: C09K11/08

    CPC classification number: C09K11/7774

    Abstract: The present invention relates to a process of making YAG fluorescence powder which comprises steps of: (a) providing a first solution of anions and a second solution of cations; (b) mixing the first solution of anions and the second solution of cations drop by drop and forming a precipitate; (c) collecting the precipitate and drying it; (d) annealing the precipitate under a pre-determined temperature until powder occurs; (e) sintering the annealed powder with a plasma torch for at least once; and (f) collecting the sintered powder.

    Abstract translation: 本发明涉及一种制备YAG荧光粉的方法，其包括以下步骤：（a）提供阴离子的第一溶液和阳离子的第二溶液; （b）将阴离子的第一溶液和第二阳离子溶液逐滴混合并形成沉淀物; （c）收集沉淀并干燥; （d）在预定温度下对沉淀物进行退火直到发生粉末; （e）用等离子体焰炬烧结退火的粉末至少一次; 和（f）收集烧结粉末。

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