公开(公告)号：US20070013642A1

公开(公告)日：2007-01-18

申请号：US11486795

申请日：2006-07-13

Applicant: Gi-Cheon Yoon ,  Hwan-Gerl Hwang ,  Yoo-Seok Kim ,  Jin-Gi Kim ,  In-Ho Lee ,  Hyung Lee ,  Sung-Il Jung

Inventor： Gi-Cheon Yoon ,  Hwan-Gerl Hwang ,  Yoo-Seok Kim ,  Jin-Gi Kim ,  In-Ho Lee ,  Hyung Lee ,  Sung-Il Jung

IPC: G09G3/36

CPC classification number: B65G35/06 ,  B65G2201/022 ,  H01L21/67709 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67766 ,  H01L21/67778

Abstract: A system is provided for transferring a substrate of a flat panel display between the processing stations of a flat panel display manufacturing line. The system includes a transfer device that transfers a transfer container in which a substrate is loaded, a container loading and unloading device that loads and unloads the containers on and from the transfer device, and a substrate loading and unloading device that transfers the substrates between the container and processing equipment located at the respective stations. The transfer device includes a track mounted on a facility floor and a plurality of wheeled carriages that move programmably along the track by means of linear motors. The system enables substrate transfer time to be reduced substantially, yet provides robust protection of the substrates throughout the transfer process.

Abstract translation: 提供一种用于在平板显示器生产线的处理站之间传送平板显示器的基板的系统。 该系统包括：转移装置，其传送装载有基板的转印容器;将容器装载和卸载于转印装置上的容器装卸装置;以及基板装载和卸载装置， 集装箱和加工设备位于各自的车站。 传送装置包括安装在设施地板上的轨道和通过线性马达可沿着轨道可编程移动的多个轮式车厢。 该系统能够显着降低基底转印时间，同时在整个转印过程中提供对基材的强力保护。

公开(公告)号：US20050112507A1

公开(公告)日：2005-05-26

申请号：US10960192

申请日：2004-10-06

Applicant: Gi-Cheon Yoon ,  Geun-Soo An

Inventor： Gi-Cheon Yoon ,  Geun-Soo An

IPC: H01L21/027 ,  G03F7/00 ,  G03F7/30

CPC classification number: G03F7/30 ,  G03F7/3028

Abstract: In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.

Abstract translation: 在形成光致抗蚀剂图案的装置和方法中，光致抗蚀剂涂覆部分用光致抗蚀剂组合物涂覆基板以形成光致抗蚀剂膜。 通过使用曝光部分将光照射到光致抗蚀剂膜上，并且显影部分显影光致抗蚀剂膜。 残留物感测部分感测显影的光致抗蚀剂膜的残余物以产生对应于感测到的残余物的残余物的信息。 残留物除去部分在与残留物信息相对应的残留区域中喷射溶剂以溶解残余物，残渣除去部分吸收由溶剂溶解的残余物。 因此，通过在残留物的区域中喷洒溶剂并吸收由溶剂溶解的残留物来有效地除去残余物。

公开(公告)号：US20050073667A1

公开(公告)日：2005-04-07

申请号：US10861006

申请日：2004-06-04

Applicant: Geun-soo An ,  Gi-cheon Yoon

Inventor： Geun-soo An ,  Gi-cheon Yoon

IPC: H01L21/68 ,  G03B27/58

CPC classification number: G03B27/58 ,  Y10S414/137 ,  Y10S414/14

Abstract: Disclosed herein is an apparatus for conveying substrates, which is capable of efficiently conveying large substrates and has a function to temporarily store the substrate in a buffer unit. The apparatus includes a substrate support unit, a conveying unit, and the buffer unit. The substrate support unit supports the substrate thereon. The conveying unit sequentially conveys the substrate support unit to a plurality of processing units. The buffer unit is provided at a predetermined portion of the conveying unit to move the substrate support unit upward away from the conveying unit in a vertical direction, thus temporarily storing the substrate support unit therein while spacing the substrate support unit apart from the conveying unit. The substrate conveying apparatus thus efficiently conveys the substrates, regardless of sizes of the substrates, while temporarily storing the substrates to buffer a difference in the processing time.

Abstract translation: 本文公开了一种用于输送基板的装置，其能够有效地输送大的基板，并且具有将基板临时存储在缓冲单元中的功能。 该装置包括基板支撑单元，输送单元和缓冲单元。 基板支撑单元在其上支撑基板。 传送单元将基板支撑单元顺序地传送到多个处理单元。 缓冲单元设置在输送单元的预定部分处，以将基板支撑单元沿垂直方向向上移动远离输送单元，从而将基板支撑单元临时存储在其中，同时将基板支撑单元与输送单元隔开。 因此，基板输送装置无论基板的尺寸如何有效地传送基板，同时临时存储基板以缓冲处理时间的差异。

公开(公告)号：US20050063791A1

公开(公告)日：2005-03-24

申请号：US10863064

申请日：2004-06-07

Applicant: Won-Kie Chang ,  Gi-Cheon Yoon ,  Geun-Soo An

Inventor： Won-Kie Chang ,  Gi-Cheon Yoon ,  Geun-Soo An

IPC: G02F1/13 ,  B65G49/05 ,  B65G49/06 ,  B65G51/00 ,  H01L21/677 ,  H01L21/68

CPC classification number: B65G49/065 ,  B65G2207/06 ,  B65G2249/02 ,  B65G2249/04 ,  H01L21/67784

Abstract: An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.

Abstract translation: 提供了一种在线传输系统和方法，用于安全传输和有效处理诸如玻璃基板或半导体器件的基板。 提供一种旋转输送机，其包括多个空气喷嘴，其喷射空气以在多个空气喷嘴上方移动基板，而不会使多个空气喷嘴与基板接触。 至少两个独立的处理单元可操作地联接到旋转输送机。 有利地，由于可以并行处理多个基板，因此提供更高的效率和灵活性。 因为基板可以在空气喷嘴的结构和基板之间没有物理接触的情况下移动，所以转印是牢固，清洁和高效的。